Browsing by author "Schuhmacher, Jörg"
Now showing items 1-15 of 15
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A study of growth mechanism of TiN and WCN barrier films deposited by atomic layer deposition on different substrates
Satta, Alessandra; Schuhmacher, Jörg; Whelan, Caroline; Vandervorst, Wilfried; Brongersma, Sywert; Beyer, Gerald; Brijs, Bert; Conard, Thierry; Maex, Karen; Vantomme, Andre; Viitanen, M.M.; Brongersma, H.H. (2002) -
Atomic layer deposition of barriers for interconnect
Besling, Wim; Satta, Alessandra; Schuhmacher, Jörg; Abell, Thomas; Sutcliffe, Victor; Martin Hoyas, Ana; Beyer, Gerald; Gravesteijn, Dirk; Maex, Karen (2002) -
Characterization of PVD TaN and ALD WNxCy copper diffusion barriers on a porous CVD low-k material
Travaly, Youssef; Kemeling, N.; Maenhoudt, Mireille; Peeters, S.; Tokei, Zsolt; Abell, Thomas; Schuhmacher, Jörg; Turturro, S.; Vos, Ingrid; Eugene, Lino; Matsuki, N.; Fukazawa, A.; Goundar, K.; Satoh, K.; Kato, M.; Kaneko, S.; Vertommen, Johan; Sprey, Hessel; Van Hove, Marleen; Jonas, A.; Maex, Karen (2004) -
Characterization of TiN films deposited by atomic layer deposition
Besling, W.F.A.; Satta, Alessandra; Schuhmacher, Jörg; Beyer, Gerald; Maex, Karen; Kilpela, Olli; Sprey, Hessel (2002) -
Development of sub-10-nm atomic layer deposition barriers for Cu/low-k interconnects
Beyer, Gerald; Satta, Alessandra; Schuhmacher, Jörg; Maex, Karen; Besling, Wim; Kilpela, Olli; Sprey, Hessel; Tempel, Georg (2002) -
Galvanic corrosion testing of WCxNy barrier metal in H202 based slurries
Ernur, Didem; Schuhmacher, Jörg; Terzieva, Valentina; Shamiryan, Denis; Maex, Karen (2003) -
Growth mechanism and continuity of atomic layer deposited TiN films on thermal SiO2
Satta, Alessandra; Schuhmacher, Jörg; Whelan, Caroline; Vandervorst, Wilfried; Brongersma, Sywert; Beyer, Gerald; Maex, Karen; Vantomme, Andre; Viitanen, M.M.; Brongersma, H.H.; Besling, Wim (2002) -
Impact of ALCVD and PVD titanium nitride deposition on metal gate capacitors
Lujan, Guilherme; Schram, Tom; Pantisano, Luigi; Hooker, Jacob; Kubicek, Stefan; Röhr, Erika; Schuhmacher, Jörg; Kilpela, Olli; Sprey, Hessel; De Gendt, Stefan; De Meyer, Kristin (2002) -
Integration of ALD WCN into a dual damascene oxide module
Schuhmacher, Jörg; Beyer, Gerald; Vos, Ingrid; Sutcliffe, Victor; Tokei, Zsolt; Besling, W.; Maex, Karen (2003) -
Nucleation and growth dependence of ALD WNC on substrate surface condition
Abell, Thomas; Schuhmacher, Jörg; Travaly, Youssef; Maex, Karen (2004) -
Nucleation and growth of TiN films deposited by atomic layer deposition
Satta, Alessandra; Brongersma, Sywert; Schuhmacher, Jörg; Conard, Thierry; Beyer, Gerald; Maex, Karen; Viitanen, M.M.; Brongersma, H.H.; Besling, W.; Kilpela, Olli; Sprey, Hessel; Vantomme, Andre (2002) -
Plasma treatments of a low-k dielectric polymer surface
Martin Hoyas, Ana; Schuhmacher, Jörg; Whelan, Caroline; Schaekers, Marc; Celis, Jean-Pierre; Maex, Karen (2003) -
Precursor penetration and sealing of porous CVD SiCOH low k dielectric for atomic layer deposition of WCxNy
Abell, Thomas; Shamiryan, Denis; Schuhmacher, Jörg; Besling, W.; Sutcliffe, V.; Maex, Karen (2003) -
Process and properties of ALD tungsten nitride carbide barrier films for interconnects
Schuhmacher, Jörg; Travaly, Youssef; Beyer, Gerald; Stokhof, Maarten; Schaekers, Marc; Maex, Karen (2004) -
Process and properties of ALD tungsten nitride carbide barrier films for interconnects
Schuhmacher, Jörg; Tokei, Zsolt; Beyer, Gerald; Li, Yunlong; Stokhof, Maarten; Schaekers, Marc; Maex, Karen (2003)