Browsing by author "Kmieciak, Malgorzata"

CMOS integration of dual work function phase controlled Ni FUSI with simultaneous integration of nMOS (NiSi) and pMOS (Ni-rich silicide) gates on HfSiON

Lauwers, Anne; Veloso, Anabela; Hoffmann, Thomas Y.; Van Dal, Mark; Vrancken, Christa; Brus, Stephan; Locorotondo, Sabrina; de Marneffe, Jean-Francois; Sijmus, Bram; Kubicek, Stefan; Chiarella, Thomas; Kmieciak, Malgorzata; Opsomer, Karl; Niwa, Masaaki; Mitsuhashi, Riichirou; Kottantharayil, Anil; Yu, HongYu; Demeurisse, Caroline; Verbeeck, Rita; de Potter de ten Broeck, Muriel; Absil, Philippe; Maex, Karen; Jurczak, Gosia; Biesemans, Serge; Kittl, Jorge (2005-12)

Dopant profiling in NixSi1-x gates with SIMS

Janssens, Tom; Kmieciak, Malgorzata; Kittl, Jorge; Fouchier, Marc; Lauwers, Anne; Kottantharayil, Anil; Vandervorst, Wilfried (2005)

Influence of activation annealing and silicidation process on dopant redistribution and pile-up at the NixSiy/SiO2 interface

Kmieciak, Malgorzata; Kittl, Jorge; Janssens, Tom; Lauwers, Anne; Vandervorst, Wilfried; Kottantharayil, Anil; Schram, Tom; Veloso, Anabela; Van Dal, Mark; Maex, Karen; Vantomme, Andre (2005-05)

Investigation of Ni fully silicided gates for sub-45 nm CMOS technologies

Kmieciak, Malgorzata; Kittl, Jorge; Chamirian, Oxana; Veloso, Anabela; Lauwers, Anne; Schram, Tom; Maex, Karen; Vantomme, Andre (2004-08)

Materials issues of Ni fully silicided (FUSI) gates for CMOS applications

Kittl, Jorge; Lauwers, Anne; Kmieciak, Malgorzata; Demeurisse, Caroline; Kottantharayil, Anil; Veloso, Anabela; Van Dal, Mark; Schram, Tom; Brijs, Bert; Kaiser, M.; Kubicek, Stefan; Cunniffe, John; Verbeeck, Rita; Vrancken, Christa; Biesemans, Serge; Maex, Karen (2005-05)

Mechanisms of arsenic segregation to the Ni2Si/SiO2 interface during Ni2Si formation

Kmieciak, Malgorzata; Janssens, Tom; Lauwers, Anne; Vantomme, Andre; Vandervorst, Wilfried; Maex, Karen; Kittl, Jorge (2005)

Ni fully silicided gates for 45 nm CMOS applications

Kittl, Jorge; Lauwers, Anne; Kmieciak, Malgorzata; Van Dal, Mark; Veloso, Anabela; Kottantharayil, Anil; Pourtois, Geoffrey; Demeurisse, Caroline; Schram, Tom; Brijs, Bert; de Potter de ten Broeck, Muriel; Vrancken, Christa; Maex, Karen (2005-08)

Ni-based silicides for 45 nm CMOS and beyond

Lauwers, Anne; Kittl, Jorge; Van Dal, Mark; Chamirian, Oxana; Kmieciak, Malgorzata; de Potter de ten Broeck, Muriel; Lindsay, Richard; Raymakers, Toon; Pagès, Xavier; Mebarki, Bencherki; Mandrekar, Tushar; Maex, Karen (2004)

Scalability of Ni FUSI gate processes: phase and Vt control to 30 nm gate lengths

Kittl, Jorge; Veloso, Anabela; Lauwers, Anne; Kottantharayil, Anil; Demeurisse, Caroline; Kubicek, Stefan; Niwa, Masaaki; Van Dal, Mark; Richard, Olivier; Kmieciak, Malgorzata; Jurczak, Gosia; Vrancken, Christa; Chiarella, Thomas; Brus, Stephan; Maex, Karen; Biesemans, Serge (2005)

Silicides - Recent advances and prospects

Kittl, Jorge; Lauwers, Anne; Chamirian, Oxana; Kmieciak, Malgorzata; Van Dal, Mark; Veloso, Anabela; Kottantharayil, Anil; Pourtois, Geoffrey; de Potter de ten Broeck, Muriel; Maex, Karen (2005)

Silicides for advanced CMOS devices

Lauwers, Anne; Kittl, Jorge; Van Dal, Mark; Chamirian, Oxana; Kmieciak, Malgorzata; Torregiani, Cristina; Liu, J.; Benedetti, Alessandro; Richard, Olivier; Bender, Hugo; van Berkum, J.G.M.; Kaiser, M.; Veloso, Anabela; Kottantharayil, Anil; de Potter de ten Broeck, Muriel; Maex, Karen (2005)