Authors
Kmieciak, Malgorzata;
Kittl, Jorge;
Janssens, Tom;
Lauwers, Anne;
Vandervorst, Wilfried;
Kottantharayil, Anil;
Schram, Tom;
Veloso, Anabela;
Van Dal, Mark;
Maex, Karen;
Vantomme, Andre
Conference
Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment
Title
Influence of activation annealing and silicidation process on dopant redistribution and pile-up at the NixSiy/SiO2 interface
Publication type
Proceedings paper
