Browsing by author "Waeterloos, Joost"
Now showing items 1-20 of 26
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A feasibility study of dual damascene porous SiLK resin with spin-on hard masks
Hoofman, Romano; Michelon, Julien; Verheijden, G.J.A.M.; Waeterloos, Joost; Caluwaerts, Rudy; Schmidt, M.O.; Demeurisse, Caroline; Vandeweyer, Tom; Demuynck, Steven; Tokei, Zsolt; Beyer, Gerald (2004) -
Barrier process development for damascene integration of porous SiLK resin films
Tokei, Zsolt; Waeterloos, Joost; Iacopi, Francesca; Caluwaerts, Rudy; Struyf, Herbert; Van Aelst, Joke; Maex, Karen (2002) -
Barrier studies on porous silk semiconductor dielectric
Tokei, Zsolt; Iacopi, Francesca; Richard, Olivier; Waeterloos, Joost; Rozeveld, S.; Beach, E.; Mebarki, Bencherki; Mandrekar, T.; Guggilla, S.; Maex, Karen (2003) -
Characterization and integration of low permittivity dielectrics
Waeterloos, Joost (1999-06) -
Characterization and process integration of a low-k spin-on dielectric
Ballantyne, Catherine; Forester, Lynn; Waeterloos, Joost (1996) -
Copper-SiLK* semiconductor dielectric interface: XPS surface analysis and RF plasma treatment of the resin
Lemaire, J. J.; Rajagopal, A.; Gregoire, C.; Pireaux, J. J.; Baklanov, Mikhaïl; Vanhaelemeersch, Serge; Maex, Karen; Waeterloos, Joost (1999) -
Damascene integration feasability of porous SiLK resin films
Waeterloos, Joost; Struyf, Herbert; Van Aelst, Joke; Das, Arabinda; Caluwaerts, Rudy; Alaerts, Carine; Boullart, Werner; Tokei, Zsolt; Van Hove, Marleen; Maex, Karen (2002) -
Etch process development for FLARE(tm) for dual damascene architecture using a N2/O2 plasma
Thompson, Heike; Vanhaelemeersch, Serge; Maex, Karen; Van Ammel, Annemie; Beyer, Gerald; Coenegrachts, Bart; Vervoort, Iwan; Waeterloos, Joost; Struyf, Herbert; Palmans, Roger; Forester, Lynn (1999) -
Growth and characterization of atomic layer deposited WC0.7N0.3 on polymer films
Martin Hoyas, Ana; Schuhmacher, Jorg; Shamiryan, Denis; Waeterloos, Joost; Besling, W.; Celis, Jean-Pierre; Maex, Karen (2004) -
Increasing DOF for VIA lithography using a non-CMP based architecture
Grozev, Grozdan; Waeterloos, Joost; Ronse, Kurt; Van den hove, Luc; Tzviatkov, Plamen (1997) -
Integrating a hydrogen silsesquioxane spin-on dielectric in a quarter micron technology
Waeterloos, Joost; Meynen, Herman; Coenegrachts, Bart; Gao, Teng; Grillaert, Joost; Van den hove, Luc (1997) -
Integration feasibility of porous SiLK semiconductor dielectric
Waeterloos, Joost; Struyf, Herbert; Van Aelst, Joke; Castillo, D. W.; Lucero, S.; Caluwaerts, Rudy; Alaerts, Carine; Mannaert, Geert; Boullart, Werner; Sleeckx, Erik; Schaekers, Marc; Tokei, Zsolt; Vervoort, Iwan; Steenbergen, Johnny; Sijmus, Bram; Vos, I.; Meuris, Marc; Iacopi, Francesca; Donaton, R (2001) -
Integration of a low permittivity spin-on embedded hardmask for Cu/SiLK resin dual damascene
Waeterloos, Joost; Shaffer, E. O.; Stokich, T.; Hetzner, J.; Price, D.; Booms, L.; Donaton, R. A.; Beyer, Gerald; Coenegrachts, Bart; Caluwaerts, Rudy; Struyf, Herbert; Tokei, Zsolt; Vervoort, Iwan; Sjjmus, B.; Vos, I.; Maex, Karen; Komiya, Takayuki; Iwashita, J. M. (2001) -
Integration of non-etchback low-k methy silsequioxane polymer using electron beam cure
Gao, Teng; Coenegrachts, Bart; Waeterloos, Joost; Van Hove, Marleen; Maex, Karen; Yang, Jiping; Wang, Sharon; Forester, Lynn (1999) -
Integration of unlanded via in a non-etchback SOG direct-on-metal approach in 0.25 micron CMOS process
Gao, Teng; Coenegrachts, Bart; Waeterloos, Joost; Beyer, Gerald; Meynen, Herman; Van Hove, Marleen; Maex, Karen (1998) -
Integration of unlanded via in a non-etchback SOG direct-on-metal approach in 0.25 micron CMOS process
Gao, Teng; Coenegrachts, Bart; Waeterloos, Joost; Beyer, Gerald; Meynen, Herman; Van Hove, Marleen; Maex, Karen (1998) -
Low-k organic spin-on materials in a non-etchback interconnect strategy
Waeterloos, Joost; Meynen, Herman; Coenegrachts, Bart; Grillaert, Joost; Van den hove, Luc (1996) -
Mechanical analysis of a SiLK/Cu dual damascene interconnect system
Waeterloos, Joost; Shaffer, E.; Stokich, T.; Alves Donaton, Ricardo; Maex, Karen (2001) -
Minimizing within die non uniformity in CMP by optimising polishing parameters and consumables
Grillaert, Joost; Meynen, Herman; Waeterloos, Joost; Coenegrachts, Bart; Van den hove, Luc (1997) -
Post patterning meso porosity creation: a potential solution for pore sealing
Caluwaerts, Rudy; Van Hove, Marleen; Beyer, Gerald; Hoofman, Romano; Struyf, Herbert; Brom - Verheyden, Greja; Waeterloos, Joost; Tokei, Zsolt; Iacopi, Francesca; Carbonell, Laure; Le, Quoc Toan; Das, Arabinda; Vos, Ingrid; Demuynck, Steven; Maex, Karen (2003)