Browsing by author "Chanson, Romain"
Now showing items 1-13 of 13
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A Novel Volatile Film for Dielectric Plasma Damage Protection
de Marneffe, Jean-Francois; Rezvanov, Askar; Chanson, Romain; Babaei Gavan, Khashayar; Fujikawa, M.; Yamaguchi, T.; Nozawa, S.; Kikuchi, Y.; Maekawa, K. (2019) -
Cryo-etching for integration in micro-electronic : Silicon deep etch for contact and low-k integration in Back end of line (BEOL)
Chanson, Romain; Lefaucheux, Philippe; Dussart, Remi; Shen, Peng; Urabe, Keiichiro; Dussarat, Christian; Maekawa, Kaoru; yatsuda, koichi; Tahara, Shigeru; de Marneffe, Jean-Francois (2017) -
Damage-free plasma etching of porous organo-silicate low-k using micro-capillary condensation above -50° C
Chanson, Romain; Zhang, Liping; Naumove, Sergei; Mankelevich, Yu.; Tillocher, Thomas; Lefaucheux, Phillipe; Dussart, Remi; De Gendt, Stefan; de Marneffe, Jean-Francois (2018) -
Gas Phase Pore Stuffing (GPPS)
Fujikawa, M; Yamaguchi, T; Nozawa, S; Niino, R; Chanson, Romain; Babaei Gavan, Khashayar; Lazzarino, Frederic; de Marneffe, Jean-Francois (2018) -
Gas phase pore stuffing for the protection of organo-silicate glass dielectric materials
Fujikawa, Makoto; de Marneffe, Jean-Francois; Chanson, Romain; Babaei Gavan, Khashayar; Rezvanov, Askar; Lazzarino, Frederic; Tokei, Zsolt; Yamaguchi, T.; Nozawa, N.; Sato, Nagisa (2018) -
Low damage ULK etching by means of high boiling point organic condensation
Chanson, Romain; Holtzer, Nicolas; Lefaucheux, Philippe; Dussart, Rémi; SHEN, Peng; URABE, Keiichiro; Dussarat, Christian; Maekawa, Kaoru; yatsuda, koichi; Tahara, Shigeru; de Marneffe, Jean-Francois (2017) -
Low damage ultra-low-k patterning using a high boiling point organic (HBPO) combined with NF3
Chanson, Romain; Tahara, Shigeru; Vanstreels, Kris; de Marneffe, Jean-Francois (2018) -
Low-k cryo-etching : comparison of four different High Boiling Point Organic (HBPO)
Chanson, Romain; Lefaucheux, P.L.; Dussart, R.; Tillocher, T.; Shen, P.; Urabe, K.; Dussarat, C.; Maekawa, K.; Yatsuda, K.; Tahara, S.; de Marneffe, Jean-Francois (2017) -
Low-k integration: Gas screening for cryogenic etching and damage mitigation
Chanson, Romain; Dussart, Remi; Tillocher, Thomas; Lefaucheux, Philippe; Dussarrat, Christian; de Marneffe, Jean-Francois (2019) -
Low-k material cryoetch using high boiling point organic compounds to reduce plasma induced damage
Chanson, Romain; Tillocher, Thomas; Lefaucheux, Philippe; Dussart, Remi; Zhang, Liping; de Marneffe, Jean-Francois; Shen, P; Dussarrat, Chrsitian; Maekawa, Kaoru; yatsuda, koichi; Tahara, Shigeru (2018) -
Low-k protection from F radicals and VUV photons using a multilayer pore grafting approach
Zotovich, Alexey; Rezvanov, Askar; Chanson, Romain; Zhang, L.; Hacker, N.; Kurchikov, K.; Klimin, S.; Zyryanov, S. M.; Lopaev, Dimitri; Gornev, E.; Clemente, I.; Miakonkikh, A.; Maslakov, K. (2018) -
Novel volatile film for the protection of organo-silicate glass dielectric materials
Fujikawa, Makoto; Yamaguchi, Tatsuya; Nozawa, S.; Kikuchi, Y.; Maekawa, Kaoru; Kawasaki, H.; Chanson, Romain; de Marneffe, Jean-Francois (2019) -
Use of a thermally degradable chemical vapor deposited polymer film for low damage plasma processing of highly porous dielectrics
de Marneffe, Jean-Francois; Yamaguchi, Tatsuya; Fujikawa, Makoto; Rezvanov, Askar; Chanson, Romain; Zhang, Jianran; Babaei Gavan, Khashayar; El Otell, Ziad; Nozawa, S.; Kikuchi, Y.; Maekawa, Kaoru (2019)