Browsing by author "Winroth, Gustaf"
Now showing items 1-20 of 21
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193nm immersion lithography for high performance silicon photonic circuits
Selvaraja, Shankar; Absil, Philippe; Van Campenhout, Joris; Winroth, Gustaf; Murdoch, Gayle; Locorotondo, Sabrina; Milenin, Alexey; Delvaux, Christie; Ong, Patrick; Sterckx, Gunther; Lepage, Guy; Pathak, Shibnath; Bogaerts, Wim; Van Thourhout, Dries; Xie, Weiqiang (2014) -
A comparison of positive- and negative tone contact hole process flows using the IMEC NXE 3100
Younkin, Todd; Winroth, Gustaf; Gronheid, Roel (2012) -
Advanced 300-mm waferscale patterning for silicon photonics devices with record low loss and phase errors
Selvaraja, Shankar; Murdoch, Gayle; Milenin, Alexey; Delvaux, Christie; Ong, Patrick; Pathak, Shibnath; Vermeulen, Diedrik; Sterckx, Gunther; Winroth, Gustaf; Verheyen, Peter; Lepage, Guy; Bogaerts, Wim; Baets, Roel; Van Campenhout, Joris; Absil, Philippe (2012) -
Critical material properties for pattern collapse mitigation
Winroth, Gustaf; Younkin, Todd R.; Blackwell, James M.; Gronheid, Roel (2012) -
Critical material properties for pattern collapse mitigation
Winroth, Gustaf; Younkin, Todd; Blackwell, James M.; Gronheid, Roel (2012) -
Double patterning with dual hard mask for 28nm node devices and below
Hody, Hubert; Paraschiv, Vasile; Vecchio, Emma; Locorotondo, Sabrina; Winroth, Gustaf; Athimulam, Raja; Boullart, Werner (2013) -
Double patterning with dual hard mask for 28nm node devices and below
Hody, Hubert; Paraschiv, Vasile; Vecchio, Emma; Locorotondo, Sabrina; Winroth, Gustaf; Athimulam, Raja; Boullart, Werner (2013) -
Highly uniform and low-loss passive silicon photonics devices using a 300mm CMOS platform
Selvaraja, Shankar; De Heyn, Peter; Winroth, Gustaf; Ong, Patrick; Lepage, Guy; Cailler, Celine; Rigny, Arnaud; Bourdelle, Konstantin; Bogaerts, Wim; Van Thourhout, Dries; Van Campenhout, Joris; Absil, Philippe (2014) -
Mechanism of pattern collapse improvement using TBAH development
Gronheid, Roel; Winroth, Gustaf (2010) -
Modelling the lithography of ion implantation resists on topography
Winroth, Gustaf; Vaglio Pret, Alessandro; Ercken, Monique; Robertson, Stewart; Biafore, John J. (2014) -
Molecular Layer Deposition of organic-inorganic hybrid materials for implant BARC applications
Rodriguez, Leonard; Adelmann, Christoph; Sutens, Ben; Winroth, Gustaf; Delabie, Annelies; Gronheid, Roel; Van Elshocht, Sven (2013) -
Precuring implant photoresists for shrink and patterning control
Winroth, Gustaf; Rosseel, Erik; Delvaux, Christie; Altamirano Sanchez, Efrain; Ercken, Monique (2013) -
Precuring implant photoresists for shrink and patterning control
Winroth, Gustaf; Rosseel, Erik; Delvaux, Christie; Altamirano Sanchez, Efrain; Ercken, Monique (2013) -
Process optimization enabled by novel quantitative pattern collapse metrology
Winroth, Gustaf; Gronheid, Roel (2011) -
Quantification of shot noise contributions to contact hole local CD non-uniformity
Gronheid, Roel; Winroth, Gustaf; Vaglio Pret, Alessandro; Younkin, Todd (2012) -
Quantitative pattern collapse metrology for 193nm immersion lithography
Winroth, Gustaf; Gronheid, Roel; Lin, Chua; Neishi, Katsumi; Harukawa, Ryota; Marcuccilli, Gino (2011) -
Relationship between film thickness loss and polymer deprotection for extreme ultraviolet and ArF photoresists
Winroth, Gustaf; Younkin, Todd; Blackwell, James M.; Gronheid, Roel (2012) -
Roughness and variability in EUV lithography: Who is to blame? (Part 1)
Vaglio Pret, Alessandro; Gronheid, Roel; Younkin, Todd; Winroth, Gustaf; Biafore, John; Anno, Yusuke; Hoshiko, Kenji; Constantoudis, Vassilios (2013) -
Strength analysis of EUV-exposed photo resists by AFM at 40 nm half pitch
Winroth, Gustaf; Gronheid, Roel; Kim, Tae-Gon; Mertens, Paul (2012) -
Understanding EUV resist dissolution characteristics and its impact to RLS limitations
Fonseca, Carlos; Head, Brian H.; Shite, Hideo; Nafus, Kathleen; Gronheid, Roel; Winroth, Gustaf (2011)