Browsing by author "Schiffelers, Guido"
Now showing items 1-16 of 16
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A new concept to qualify pattern shift on EUV scanners
Van den berg, Pim; Van Look, Lieve; Van Swaaij, Gijs; Van Rhee, Tasja; Schiffelers, Guido; Gielis, Joost (2019) -
Assist features: placement, impact and relevance
Mochi, Iacopo; Philipsen, Vicky; Gallagher, Emily; Hendrickx, Eric; Lyakhova, Kateryna; Wittebrood, Friso; Schiffelers, Guido; Fliervoet, Timon; Wang, Shibing; Hsu, Stephen; Plachecki, Vince; Baron, Stan; Laenens, Bart (2016) -
Edge placement error analysis for N7 logic patterning options
van Setten, Eelco; Psara, Eleni; Wittebrood, Friso; Oorschot, Dorothe; van Dijk, Joep; Schiffelers, Guido; Finders, Jo; Dusa, Mircea; Philipsen, Vicky; Hendrickx, Eric (2015) -
EUV vote-taking lithography for mitigation of printing mask defects, CDU improvement, and stochastic failure reduction
Bekaert, Joost; De Bisschop, Peter; Beral, Christophe; Hendrickx, Eric; van de Kerkhof, Mark A..; Bouten, Sander; Kupers, Michiel; Schiffelers, Guido; Verduijn, Erik; Brunner, Timothy (2018) -
EUV vote-taking lithography: Crazy.... or not ?
Bekaert, Joost; De Bisschop, Peter; Beral, Christophe; Hendrickx, Eric; van de Kerkhof, Mark A.; Bouten, Sander; Kupers, Michiel; Schiffelers, Guido; Verduijn, Erik; Brunner, Timothy (2018) -
Experimental verification of phase induced mask 3D effects in EUV imaging
Wittebrood, Friso; de Winter, Laurens; Last, Thorsten; Van Look, Lieve; Philipsen, Vicky; Finders, Jo; Schiffelers, Guido; Hendrickx, Eric (2015) -
Impact of local variability on defect-aware process windows
Maslow, Mark John; Yaegashi, Hidetami; Frommhold, Andreas; Schiffelers, Guido; Wahlisch, Felix; Rispens, Gijsbert; Slachter, Bram; Yoshida, Keisuke; Hara, Arisa; Oikawa, Noriaki; Pathak, Abhinav; Cerbu, Dorin; Hendrickx, Eric; Bekaert, Joost (2019) -
Impact of sequential infiltration synthesis (SIS) on roughness and stochastic nano-failures for EUVL patterning
Vanelderen, Pieter; Blanco, Victor; Mao, Ming; Tomczak, Yoann; De Roest, David; Kissoon, Nicola; Rincon Delgadillo, Paulina; Rispens, Gijsbert; Schiffelers, Guido; Pathak, Abhinav; Lazzarino, Frederic; De Simone, Danilo; De Poortere, Etienne; Mc Manus, Moyra; Piumi, Daniele; Hendrickx, Eric; Vandenberghe, Geert (2019) -
Improving exposure latitude and aligning best focus through pitch by curing M3D effects with controlled aberrations
Franke, Joern-Holger; Bekaert, Joost; Blanco, Victor; Van Look, Lieve; Wahlisch, Felix; Lyakhova, Kateryna; Van Adrichem, Paul; Maslow, Mark John; Schiffelers, Guido; Hendrickx, Eric (2019) -
Mask 3D effect mitigation by source optimization and assist feature placement
Van Look, Lieve; Mochi, Iacopo; Philipsen, Vicky; Gallagher, Emily; Hendrickx, Eric; McIntyre, Greg; Wittebrood, Friso; Lyakhova, Kateryna; de Winter, Laurens; Last, Thorsten; Fliervoet, Timon; Schiffelers, Guido; Finders, Jo; Van Adrichem, Paul; Lyons, Adam; Laenens, Bart; Liddle, Jack; Neumann, Jens Timo (2016) -
NXE:3300 insertion for N7 : status and challenges
Philipsen, Vicky; Mochi, Iacopo; Van Look, Lieve; Lorusso, Gian; Luong, Vu; Hendrickx, Eric; Wittebrood, Friso; Schiffelers, Guido; van Setten, Eelco; Fliervoet, Timon; Dusa, Mircea (2015) -
Optimization and stability of CD variability in pitch 40 nm contact holes on NXE:3300
Van Look, Lieve; Bekaert, Joost; Frommhold, Andreas; Hendrickx, Eric; Rispens, Gijsbert; Schiffelers, Guido (2018) -
Roughness decomposition: an on-wafer methodology to discriminate mask, metrology, and shot noise contributions
Lorusso, Gian; Rispens, Gijsbert; Rutigliani, Vito; Van Roey, Frieda; Frommhold, Andreas; Schiffelers, Guido (2019) -
Single exposure EUV block downscaling for metal pitches below 32nm
Franke, Joern-Holger; Colsters, Paul; Bekaert, Joost; Hendrickx, Eric; Wittebrood, F.; Pathak, Abhinav; Schiffelers, Guido (2017) -
Tool-to-tool optical proximity effect matching
Van Look, Lieve; Bekaert, Joost; De Bisschop, Peter; Van de Kerkhove, Jeroen; Vandenberghe, Geert; Schreel, Koen; Menger, Jasper; Schiffelers, Guido; Knols, Edwin; Willekers, Rob (2008) -
Understanding of Out-of-Band DUV light in EUV lithography: controlling impact on imaging and mitigation strategies
Davydova, Natalia; Kottumakulal, Ram; Hageman, J.; McNamara, J.; Hoefnagels, Rik; Vaenkatesan, V.; van Dijk, Andre; Ricken, K.; de Winter, L.; De Kruif, Robert; Jonckheere, Rik; Hollink, T.; Schiffelers, Guido; van Setten, Eelco; Colsters, P.; Liebregts, W.; Pellens1, Rudy; van Dijk, Joep (2015)