Browsing by author "Schreutelkamp, Rob"
Now showing items 1-20 of 30
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A new method for measuring the saturation velocity of submicron CMOS transistors
Schreutelkamp, Rob; Deferm, Ludo (1995) -
A systematic study of trade-offs in engineering a locally strained pMOSFET
Nouri, Faran; Verheyen, Peter; Washington, Lori; Moroz, Victor; De Wolf, Ingrid; Kawaguchi, S.; Biesemans, Serge; Schreutelkamp, Rob; Kim, Y.; Shen, M.; Xu, X.; Rooyackers, Rita; Jurczak, Gosia; Eneman, Geert; De Meyer, Kristin; Smith, L.; Pramanik, D.; Forstner, H.; Thirupapuliyur, S.; Higashi, G. (2004) -
Advanced 2D/3D simulations for laser annealed device using an atomic kinetic monte carlo approach and scanning spreading resistance microscopy (SRRM)
Noda, T.; Eyben, Pierre; Vandervorst, Wilfried; Vrancken, Christa; Rosseel, Erik; Ortolland, Claude; Clarysse, Trudo; Goossens, Jozefien; De Keersgieter, An; Felch, S.; Schreutelkamp, Rob; Absil, Philippe; Jurczak, Gosia; De Meyer, Kristin; Biesemans, Serge; Hoffmann, Thomas Y. (2008) -
Advanced USJ for high-k / metal gate CMOS devices
Absil, Philippe; Ortolland, Claude; Aoulaiche, Marc; Rosseel, Erik; Verheyen, Peter; Vrancken, Christa; Horiguchi, Naoto; Noda, Tajii; Felch, Susan; Schreutelkamp, Rob; Hoffmann, Thomas Y. (2008) -
Analysis of As, P diffusion and defect evolution during sub-millisecond non-melt laser annealing based on an atomistic kinetic Monte Carlo approach
Noda, Taiji; Vandervorst, Wilfried; Felch, S.; Parihar, V.; Cuperus, Aldert; Mcintosh, R.; Vrancken, Christa; Rosseel, Erik; Bender, Hugo; Van Daele, Benny; Niwa, Masaaki; Umimoto, H.; Schreutelkamp, Rob; Absil, Philippe; Jurczak, Gosia; De Meyer, Kristin; Biesemans, Serge; Hoffmann, Thomas Y. (2007) -
Characterizing immersion lithography micro bridge defects using advanced features of teh SEMVision G3 STAR FIB
Van Den Heuvel, Dieter; Santoro, Gaetano; Gronheid, Roel; Braggin, Jennifer; Rosslee, Craig; Leray, Philippe; Cheng, Shaunee; Schreutelkamp, Rob; Hillel, Noam (2009) -
Combined Delta L and series resistance extraction of LDD MOSFETs at 77K
Schreutelkamp, Rob; Martino, Joao Antonio; Simoen, Eddy; Deferm, Ludo; Claeys, Cor (1995) -
Demonstration of scaled 0.099μm² FinFET 6T-SRAM cell using full-field EUV lithography for (Sub-)22nm node single-patterning technology
Veloso, Anabela; Demuynck, Steven; Ercken, Monique; Goethals, Mieke; Locorotondo, Sabrina; Lazzarino, Frederic; Altamirano Sanchez, Efrain; Huffman, Craig; De Keersgieter, An; Brus, Stephan; Demand, Marc; Struyf, Herbert; De Backer, Johan; Hermans, Jan; Delvaux, Christie; Baudemprez, Bart; Vandeweyer, Tom; Van Roey, Frieda; Baerts, Christina; Goossens, Danny; Dekkers, Harold; Ong, Patrick; Heylen, Nancy; Kellens, Kristof; Volders, Henny; Hikavyy, Andriy; Vrancken, Christa; Rakowski, Michal; Verhaegen, Staf; Dusa, Mircea; Romijn, Leon; Pigneret, Charles; van Dijk, Andre; Schreutelkamp, Rob; Cockburn, Andrew; Gravey, Virginie; Meiling, H.; Hultermans, B.; Lok, S.; Shah, K.; Rajagopalan, R.; Gelatos, J.; Richard, Olivier; Bender, Hugo; Vandenberghe, Geert; Beyer, Gerald; Absil, Philippe; Hoffmann, Thomas Y.; Ronse, Kurt; Biesemans, Serge (2009-12) -
Development of ALD HfZrOx with TDEAH, TDEAZ and H2O
Shi, Xiaoping; Tielens, Hilde; Takeoka, Shinji; Nakabayashi, Takashi; Nyns, Laura; Adelmann, Christoph; Delabie, Annelies; Schram, Tom; Ragnarsson, Lars-Ake; Schaekers, Marc; Date, Lucien; Schreutelkamp, Rob; Van Elshocht, Sven (2010) -
Development of ALD HfZrOx with TDEAH/TDEAZ and H2O
Shi, Xiaoping; Tielens, Hilde; Takeoka, Shinji; Nakabayashi, Takashi; Nyns, Laura; Adelmann, Christoph; Delabie, Annelies; Schram, Tom; Ragnarsson, Lars-Ake; Schaekers, Marc; Date, Lucien; Schreutelkamp, Rob; Van Elshocht, Sven (2011) -
Full-field EUV and immersion lithography integration in 0.186μm² FinFET 6T-SRAM cell
Veloso, Anabela; Demuynck, Steven; Ercken, Monique; Goethals, Mieke; Demand, Marc; de Marneffe, Jean-Francois; Altamirano Sanchez, Efrain; De Keersgieter, An; Delvaux, Christie; De Backer, Johan; Brus, Stephan; Hermans, Jan; Baudemprez, Bart; Van Roey, Frieda; Lorusso, Gian; Baerts, Christina; Goossens, Danny; Vrancken, Christa; Mertens, Sofie; Versluijs, Janko; Truffert, Vincent; Huffman, Craig; Laidler, David; Heylen, Nancy; Ong, Patrick; Parvais, Bertrand; Rakowski, Michal; Verhaegen, Staf; Hikavyy, Andriy; Meiling, H.; Hultermans, B.; Romijn, L.; Pigneret, C.; Lok, S.; Van Dijk, A.; Shah, K.; Noori, A.; Gelatos, J.; Arghavani, R.; Schreutelkamp, Rob; Boelen, Pieter; Richard, Olivier; Bender, Hugo; Witters, Liesbeth; Collaert, Nadine; Rooyackers, Rita; Absil, Philippe; Lauwers, Anne; Jurczak, Gosia; Hoffmann, Thomas Y.; Vanhaelemeersch, Serge; Cartuyvels, Rudi; Ronse, Kurt; Biesemans, Serge (2008) -
Further optimization of plasma nitridation of ultra-thin oxides for 65 nm node MOSFETS
Kraus, Philip; Chua, Tai Chen; Rothschild, Aude; Cubaynes, Florence; Veloso, Anabela; Mertens, Sofie; Date, Lucien; Bauer, Thomas; Ahmed, Khaled; Nouri, Faran; Schreutelkamp, Rob; Schaekers, Marc (2004) -
Further optimization of plasma nitridation of ultra-thin oxides for 65-nm node MOSFETS
Kraus, P.A.; Chua, T.C.; Ahmed, K.Z.; Campbell, J.; Nouri, F.; Cruise, J.; Rothschild, Aude; Veloso, Anabela; Mertens, Sofie; Schaekers, Marc; Cubaynes, F.N.; Date, Lucien; Schreutelkamp, Rob; Bauer, T.M. (2004) -
Impact of precursor chemistry on atomic layer deposition of lutetium aluminates
Nyns, Laura; Shi, Xiaoping; Tielens, Hilde; Van Elshocht, Sven; Date, Lucien; Schreutelkamp, Rob (2012) -
Impact of silicidation on the excess noise behaviour of MOS transistors
Vandamme, Ewout; Vandamme, L.K.J.; Claeys, Cor; Simoen, Eddy; Schreutelkamp, Rob (1995) -
Impact of sub-melt laser annealing on Si1-xGex source/drain defectivity
Rosseel, Erik; Lu, J.P; Hikavyy, Andriy; Verheyen, Peter; Hoffmann, Thomas Y.; Richard, Olivier; Geypen, Jef; Bender, Hugo; Loo, Roger; Absil, Philippe; Mc Intosh, R.; Felch, S.; Schreutelkamp, Rob (2007) -
Improvement of the CMOS characteristics of bulk Si FinFETs by high temperature ion implantation
Kikuchi, Yoshiaki; Hopf, Toby; Mannaert, Geert; Tao, Zheng; Waite, A.; Cournoyer, J.; Borniquel, J.; Schreutelkamp, Rob; Ritzenthaler, Romain; Kim, Min-Soo; Kubicek, Stefan; Chew, Soon Aik; Devriendt, Katia; Schram, Tom; Demuynck, Steven; Variam, N.; Horiguchi, Naoto; Mocuta, Dan (2016) -
Laser annealed junctions: process integration sequence optimization for advanced CMOS technologies
Hoffmann, Thomas Y.; Noda, Taiji; Felch, S.; Severi, Simone; Parihar, V.; Forstner, H.; Vrancken, Christa; de Potter de ten Broeck, Muriel; Van Daele, Benny; Bender, Hugo; Niwa, Masaaki; Schreutelkamp, Rob; Vandervorst, Wilfried; Biesemans, Serge; Absil, Philippe (2007) -
Laser-annealed junctions with advanced CMOS gate stacks for 32nm node: perspectives on device performance and manufacturability
Ortolland, Claude; Noda, Taiji; Chiarella, Thomas; Kubicek, Stefan; Kerner, Christoph; Vandervorst, Wilfried; Opdebeeck, Ann; Vrancken, Christa; Horiguchi, Naoto; de Potter de ten Broeck, Muriel; Aoulaiche, Marc; Rosseel, Erik; Felch, S.B.; Absil, Philippe; Schreutelkamp, Rob; Biesemans, Serge; Hoffmann, Thomas Y. (2008) -
Layout impact on the performance of a locally strained PMOSFET
Eneman, Geert; Verheyen, Peter; Rooyackers, Rita; Nouri, Faran; Washington, Lori; Degraeve, Robin; Kaczer, Ben; Moroz, Victor; De Keersgieter, An; Schreutelkamp, Rob; Kawaguchi, M.; Kim, Y.; Samoilov, A.; Smith, L.; Absil, Philippe; De Meyer, Kristin; Jurczak, Gosia; Biesemans, Serge (2005)