Browsing by author "Vanhaelemeersch, Serge"
Now showing items 61-80 of 121
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Integrations of Cu and low-k dielectrics: effect of hard mask dry etch and post-CMP clean on electrical performance of damascene structures
Donaton, R. A.; Coenegrachts, Bart; Maenhoudt, Mireille; Pollentier, Ivan; Struyf, Herbert; Vanhaelemeersch, Serge; Grillaert, Joost; Fyen, Wim; Beyer, Gerald; Stucchi, Michele; Richard, Emmanuel; Vervoort, Iwan; De Roest, David; Maex, Karen (2000) -
Interaction of a variety of ashing plasma with MSQ low-k dielectric
Le, Quoc Toan; Patz, M.; Struyf, Herbert; Baklanov, Mikhaïl; Boullart, Werner; Vanhaelemeersch, Serge; Maex, Karen (2004) -
Limitation of HF-based chemistry for deep-submicron contact hole cleaning on silicides
Baklanov, Mikhaïl; Kondoh, Eiichi; Alves Donaton, Ricardo; Vanhaelemeersch, Serge; Maex, Karen (1998) -
Lithography as a critical step for low-k dual damascene: from 248nm to 193nm
Ronse, Kurt; Maenhoudt, Mireille; Pollentier, Ivan; Wiaux, Vincent; Struyf, Herbert; Lepage, Muriel; Vanhaelemeersch, Serge (2000) -
Low damage etch approach of a new porous SiOC(H) Low-k dielectric
Van Aelst, Joke; Struyf, Herbert; Dupont, Tania; Hendrickx, Dirk; Travaly, Youssef; Boullart, Werner; Vanhaelemeersch, Serge (2005) -
Low temperature oxidation and selective etching of chemical vapor deposition a-SiC:H films
Baklanov, Mikhaïl; Van Hove, Marleen; Mannaert, Geert; Vanhaelemeersch, Serge; Bender, Hugo; Conard, Thierry; Maex, Karen (2000) -
Low temperature oxidation and selective etching of CVD SiC films
Baklanov, Mikhaïl; Mannaert, Geert; Vanhaelemeersch, Serge; Maex, Karen (1999) -
Low-damage damascene patterning of SiOC(H) low-k dielectrics
Struyf, Herbert; Hendrickx, Dirk; Van Olmen, Jan; Iacopi, Francesca; Richard, Olivier; Travaly, Youssef; Van Hove, Marleen; Boullart, Werner; Vanhaelemeersch, Serge (2005-06) -
Low-k materials etch and strip optimization for sub 0.25µm technology
Gao, Teng; Gray, William; Van Hove, Marleen; Rosseel, Erik; Struyf, Herbert; Meynen, Herman; Vanhaelemeersch, Serge; Maex, Karen (1999) -
Mass metrology for controlling and understanding processes
Vecchio, Emma; Kunnen, Eddy; Redolfi, Augusto; Everaert, Jean-Luc; Delabie, Annelies; Shi, Xiaoping; Vanhaelemeersch, Serge; Cunnane, Liam; Kiermasz, Adrian (2007) -
Material characteristics and damascene patterning of a fluoropolymer low-k film
Struyf, Herbert; Donaton, R. A.; Lepage, Muriel; Lanckmans, Filip; Vereecke, Guy; Maex, Karen; Vanhaelemeersch, Serge; Scheid, D. (2000) -
Minimizing plasma damage and in situ sealing of ultra low-k dielectric films by using of oxygen free fluorcarbon plasma
Mannaert, Geert; Baklanov, Mikhaïl; Le, Quoc Toan; Travaly, Youssef; Boullart, Werner; Vanhaelemeersch, Serge (2005) -
Minimizing plasma damage and in situ sealing of ultra low-k dielectric films by using oxygen-free fluorocarbon plasma
Mannaert, Geert; Baklanov, Mikhaïl; Le, Quoc Toan; Travaly, Youssef; Boullart, Werner; Vanhaelemeersch, Serge; Jonas, A.M. (2005) -
Minimizing plasma damage of CVD low-k materials by tuning a two step etch sequence.
Van Aelst, Joke; Baklanov, Mikhaïl; Le, Quoc Toan; Struyf, Herbert; Boullart, Werner; Vanhaelemeersch, Serge (2004) -
Modification of low-k SiCOH film porosity by a HF solution
Shamiryan, Denis; Baklanov, Mikhaïl; Vereecke, Guy; Vanhaelemeersch, Serge; Maex, Karen (2001) -
Monitoring plasma nitridation of HfSiOx by corona charge measurements
Everaert, Jean-Luc; Shi, Xiaoping; Rothschild, Aude; Schaekers, Marc; Rosseel, Erik; Pavelka, Tibor; Don, Eric; Vanhaelemeersch, Serge (2007) -
Novel patterning shrink technique enabling sub-50nm trench and contact integration
Demuynck, Steven; Tokei, Zsolt; Zhao, Chao; de Marneffe, Jean-Francois; Struyf, Herbert; Boullart, Werner; Op de Beeck, Maaike; Carbonell, Laure; Heylen, Nancy; Vaes, Jan; Beyer, Gerald; Vanhaelemeersch, Serge; Zhu, Helen; Cirigliano, Peter; Kim, J. S.; Vertommen, Johan; Coenegrachts, Bart; Sadjadi, R.; Pavel, E.; Athayde, A. (2007) -
Optimization of etching and stripping chemistries for Z3MS TM low-k
Lepage, Muriel; Shamiryan, Denis; Baklanov, Mikhaïl; Struyf, Herbert; Mannaert, Geert; Vanhaelemeersch, Serge; Weidner, Ken; Meynen, Herman (2001) -
Photon induced low temperature etching of copper and/or formation of copper nanowires
Dictus, Dries; Shamiryan, Denis; Paraschiv, Vasile; Boullart, Werner; Baklanov, Michail; De Gendt, Stefan; Vinckier, Chris; Vanhaelemeersch, Serge (2008) -
Physical and electrical characterization of silsesquioxane-based ultra-low k dielectric films
Alves Donaton, Ricardo; Iacopi, Francesca; Baklanov, Mikhaïl; Shamiryan, Denis; Coenegrachts, Bart; Struyf, Herbert; Lepage, Muriel; Meuris, Marc; Van Hove, Marleen; Gray, William; Meynen, Herman; De Roest, David; Vanhaelemeersch, Serge; Maex, Karen (2000)