Browsing by author "Cornelissen, Ingrid"
Now showing items 1-20 of 30
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A detailed study on the growth of thin oxide layers on silicon using ozonated solutions
De Smedt, Frank; Vinckier, Chris; Cornelissen, Ingrid; De Gendt, Stefan; Heyns, Marc (2000) -
A mechanism for the silicon oxide growth by ozonated solutions
De Smedt, Frank; Vinckier, Chris; De Gendt, Stefan; Cornelissen, Ingrid; Heyns, Marc (1999) -
A mechanism for the silicon oxide growth by ozonated solutions
De Smedt, Frank; Vinckier, Chris; De Gendt, Stefan; Cornelissen, Ingrid; Heyns, Marc (2000) -
A novel resist and post-etch residue removal process using ozonated chemistries
De Gendt, Stefan; Snee, Peter; Cornelissen, Ingrid; Lux, Marcel; Vos, Rita; Mertens, Paul; Knotter, D. M.; Heyns, Marc (1998) -
A novel resist and post-etch residue removal process using ozonated chemistry
De Gendt, Stefan; Snee, Peter; Cornelissen, Ingrid; Lux, Marcel; Vos, Rita; Mertens, Paul; Knotter, Martin; Meuris, Marc; Heyns, Marc (1998) -
A novel resist and post-etch residue removal process using ozonated chemistry
De Gendt, Stefan; Snee, Peter; Cornelissen, Ingrid; Lux, Marcel; Vos, Rita; Mertens, Paul; Knotter, D. M.; Meuris, Marc; Heyns, Marc (1999) -
A wet chemical method for the determination of thickness of SiO2 layers below the nanometer level
De Smedt, Frank; Stevens, G.; De Gendt, Stefan; Cornelissen, Ingrid; Arnauts, Sophia; Meuris, Marc; Heyns, Marc; Vinckier, Chris (1999) -
Advanced cleaning and ultra-thin oxide technology
Heyns, Marc; Cornelissen, Ingrid; De Gendt, Stefan; Degraeve, Robin; Knotter, D. M.; Mertens, Paul; Mertens, S.; Meuris, Marc; Nigam, Tanya; Rotondaro, Antonio; Schaekers, Marc; Teerlinck, Ivo; Vos, Rita; Wolke, K. (1998) -
Advanced cleaning for the growth of ultrathin gate oxide
Mertens, Paul; Bearda, Twan; Houssa, Michel; Loewenstein, Lee; Cornelissen, Ingrid; De Gendt, Stefan; Kenis, Karine; Teerlinck, Ivo; Vos, Rita; Meuris, Marc; Heyns, Marc (1999) -
Advanced cleaning strategies for ultra-clean silicon surfaces
Heyns, Marc; Bearda, Twan; Cornelissen, Ingrid; De Gendt, Stefan; Loewenstein, Lee; Mertens, Paul; Mertens, Sofie; Meuris, Marc; Schaekers, Marc; Teerlinck, Ivo; Vos, Rita; Wolke, K. (1999) -
Advances in understanding wet cleaning technology and the effect of metal contamination
Heyns, Marc; Bearda, Twan; Cornelissen, Ingrid; De Gendt, Stefan; Loewenstein, Lee; Mertens, Paul; Mertens, S.; Meuris, Marc; Schaekers, Marc; Teerlinck, Ivo; Vos, Rita; Wolke, K. (1999) -
Application of moist ozone gasphase for removal of resist and organic contamination in a novel tank-type processor
Haug, Rainer; Cornelissen, Ingrid; Claes, Martine; De Gendt, Stefan; Wolke, K.; Meuris, Marc; Heyns, Marc (1999) -
Comparison of RCA and IMEC clean (HF last) type cleaning sequences in full production environment
Wolke, K.; Schenkl, M.; Silvestre, P.; Bellandi, E.; Alessandri, M.; Cornelissen, Ingrid; Meuris, Marc (1996) -
Cost-effective cleaning and high-quality thin gate oxides
Heyns, Marc; Bearda, Twan; Cornelissen, Ingrid; De Gendt, Stefan; Degraeve, Robin; Groeseneken, Guido; Kenens, Conny; Knotter, D. M.; Loewenstein, Lee; Mertens, Paul; Mertens, S.; Meuris, Marc; Nigam, Tanya; Schaekers, Marc; Teerlinck, Ivo; Vandervorst, Wilfried; Vos, Rita; Wolke, K. (1999) -
Cost-effective cleaning for advanced Si-processing
Heyns, Marc; Bearda, Twan; Cornelissen, Ingrid; De Gendt, Stefan; Knotter, D. M.; Loewenstein, Lee; Lux, Marcel; Mertens, Paul; Mertens, S.; Meuris, Marc; Schaekers, Marc; Snee, Peter; Teerlinck, Ivo; Vos, Rita (1998) -
Developments in cleaning technology for critical layers
Heyns, Marc; Arnauts, Sophia; Bearda, Twan; Claes, M.; Cornelissen, Ingrid; De Gendt, Stefan; Doumen, Geert; Fyen, Wim; Loewenstein, Lee; Lux, Marcel; Mertens, Paul; Mertens, S.; Meuris, Marc; Onsia, Bart; Röhr, Erika; Schaekers, Marc; Teerlinck, Ivo; Van Doorne, Patrick; Van Hoeymissen, Jan; Vereecke, Guy; Vos, Rita; Wolke, K. (2000) -
Implementation of the IMEC-Clean in advanced CMOS manufacturing
Meuris, Marc; Arnauts, Sophia; Cornelissen, Ingrid; Kenis, Karine; Lux, Marcel; De Gendt, Stefan; Mertens, Paul; Teerlinck, Ivo; Vos, Rita; Loewenstein, Lee; Heyns, Marc; Wolke, K. (1999) -
Important parameters influencing the rince efficiency of silicon wafers
Meuris, Marc; Opdebeeck, Ann; Cornelissen, Ingrid; Rotondaro, Antonio; Mertens, Paul; Heyns, Marc (1995) -
New technologies for reducing chemical costs and environmental impact
Heyns, Marc; Cornelissen, Ingrid; Mertens, Paul; Mertens, S.; Meuris, Marc; Rotondaro, Antonio; Schaekers, Marc; Teerlinck, Ivo; Vos, Rita; Wolke, K. (1998) -
Optimisation of dHF-based cleaning recipes: to remove or not to remove a particle?
Vos, Rita; Cornelissen, Ingrid; Meuris, Marc; Mertens, Paul; Heyns, Marc (2000)