Browsing by author "Wiaux, Vincent"

15nm half-pitch patterning: EUV + SELF-aligned double patterning

Versluijs, Janko; Souriau, Laurent; Hellin, David; Orain, Isabelle; Kimura, Yoshie; Kunnen, Eddy; Dekkers, Harold; Shi, Xiaoping; Albert, Johan; Wiaux, Vincent; Xu, Kaidong (2012)

15nm HP patterning with EUV and SADP: key contributors for improvement of LWR, LER, and CDU

Xu, Kaidong; Souriau, Laurent; Hellin, David; Versluijs, Janko; Wong, Patrick; Vangoidsenhoven, Diziana; Vandenbroeck, Nadia; Dekkers, Harold; Shi, Xiaoping; Albert, Johan; Tan, Chi Lim; Vertommen, Johan; Coenegrachts, Bart; Orain, I.; Kimura, Y.; Wiaux, Vincent; Boullart, Werner (2013)

15nm HP patterning with EUV lithography and SADP

Souriau, Laurent; Hellin, David; Kunnen, Eddy; Versluijs, Janko; Dekkers, Harold; Albert, Johan; Orain, Isabelle; Yoshie, Kimura; Xu, Kaidong; Vertommen, Johan; Wiaux, Vincent; Boullart, Werner (2012)

248nm and 193nm lithography for damascene patterning

Maenhoudt, Mireille; Pollentier, Ivan; Wiaux, Vincent; Vangoidsenhoven, Diziana; Ronse, Kurt (2001)

30-nm half-pitch metal patterning using MotifTM critical dimension shrink technique and double patterning

Versluijs, Janko; de Marneffe, Jean-Francois; Goossens, Danny; Vandeweyer, Tom; Wiaux, Vincent; Struyf, Herbert; Maenhoudt, Mireille; Brouri, Mohand; Vertommen, Johan; Kim, Ji Soo; Zhu, Helen; Sadjadi, Reza (2009)

30nm half-pitch metal patterning using MotifTM CD shrink technique and double patterning

Versluijs, Janko; de Marneffe, Jean-Francois; Goossens, Danny; Op de Beeck, Maaike; Vandeweyer, Tom; Wiaux, Vincent; Struyf, Herbert; Maenhoudt, Mireille; Brouri, Mohand; Vertommen, Johan; Kim, Ji Soo; Zhu, Helen; Sadjadi, Reza (2008)

A 0.314mm2 6T-SRAM cell built with tall triple-gate devices for 45nm node applications using 0.75NA 193nm lithography

Nackaerts, Axel; Ercken, Monique; Demuynck, Steven; Lauwers, Anne; Baerts, Christina; Bender, Hugo; Boullart, Werner; Collaert, Nadine; Degroote, Bart; Delvaux, Christie; de Marneffe, Jean-Francois; Dixit, Abhisek; De Meyer, Kristin; Hendrickx, Eric; Heylen, Nancy; Jaenen, Patrick; Laidler, David; Locorotondo, Sabrina; Maenhoudt, Mireille; Moelants, Myriam; Pollentier, Ivan; Ronse, Kurt; Rooyackers, Rita; Van Aelst, Joke; Vandenberghe, Geert; Vandervorst, Wilfried; Vandeweyer, Tom; Vanhaelemeersch, Serge; Van Hove, Marleen; Van Olmen, Jan; Verhaegen, Staf; Versluijs, Janko; Vrancken, Christa; Wiaux, Vincent; Jurczak, Gosia; Biesemans, Serge (2004-12)

A compact photonic horizontal spot-size converter realized in silicon-on-insulator

Luyssaert, Bert; Vandersteegen, Peter; Taillaert, D.; Dumon, Pieter; Bogaerts, Wim; Bienstman, Peter; Van Thourhout, D.; Wiaux, Vincent; Beckx, Stephan; Baets, Roel (2005-01)

A methodology for double patterning compliant split and design

Wiaux, Vincent; Verhaegen, Staf; Iwamoto, Fumio; Maenhoudt, Mireille; Matsuda, Takashi; Postnikov, Sergey; Vandenberghe, Geert (2008)

A study of high NA EUV pattern stitching using rigorous stochastic lithography simulation

Robertson, Stewart; Schramm, Robert; Pret, Alessandro Vaglio; Wiaux, Vincent (2023)

Advanced optical lithography: double patterning options for 32 and 22nm node

Vandeweyer, Tom; Maenhoudt, Mireille; Vangoidsenhoven, Diziana; Gronheid, Roel; Versluijs, Janko; Miller, Andy; Bekaert, Joost; Truffert, Vincent; Wiaux, Vincent (2009)

Alternative double patterning processes: ready for (sub) 32nm hp

Wong, Patrick; Maenhoudt, Mireille; Vangoidsenhoven, Diziana; Wiaux, Vincent (2009)

ArF immersion lithography for low k1 lines and contacts

Vandenberghe, Geert; Hendrickx, Eric; Wiaux, Vincent (2004-08)

Arf solutions for low-k1 back-end imaging

Wiaux, Vincent; Montgomery, Patrick; Vandenberghe, Geert; Monnoyer, Philippe; Ronse, Kurt; Conley,; Litt,; Lucas,; Finders, Jo; Socha,; Van Den Broeke, (2003)

Assessment of OPC effectiveness using two-dimensional metrics

Wiaux, Vincent; Philipsen, Vicky; Jonckheere, Rik; Vandenberghe, Geert; Verhaegen, Staf; Hoffmann, Thomas; Ronse, Kurt; Howard, William B.; Maurer, Wilhelm; Preil, Moshe E. (2002)

Bandwidth engineering of photonic crystal waveguide bends

Borel, P.I.; Frandsen, L.H.; Harpoeth, A.; Leon, J.B.; Liu, H.; Kristensen, M.; Bogaerts, Wim; Dumon, Pieter; Baets, Roel; Wiaux, Vincent; Wouters, Johan M. D.; Beckx, Stephan (2004)

BARC process optimatization for hyper NA tools and influence of polarization on CD swing and standing waves

Op de Beeck, Maaike; Hermans, Jan; Foubert, Philippe; Wiaux, Vincent; Hendrickx, Eric (2005)

Basic structures for photonic integrated circuits in silicon-on-insulator

Bogaerts, Wim; Taillaert, Dirk; Luyssaert, Bert; Dumon, Pieter; Van Campenhout, Jan; Bienstman, P.; Van Thourhout, Dries; Baets, Roel; Wiaux, Vincent; Beckx, Stephan (2004)

Cascaded Mach-Zehnder filters in silicon-on-insulator photonic wires fabricated with deep UV lithography

Dumon, Pieter; Bogaerts, Wim; Van Thourhout, Dries; Taillaert, Dirk; Wiaux, Vincent; Beckx, Stephan; Wouters, Johan M. D.; Baets, Roel (2004)

Challenges in patterning 45nm node multiple-gate devices and SRAM cells

Ercken, Monique; Delvaux, Christie; Baerts, Christina; Locorotondo, Sabrina; Degroote, Bart; Wiaux, Vincent; Nackaerts, Axel; Rooyackers, Rita; Verhaegen, Staf; Pollentier, Ivan (2004)