Browsing by author "De Backer, Johan"
Now showing items 1-10 of 10
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Applying design-based metrology for calibrating an OPC model for FinFET pattering
Vandeweyer, Tom; Lorusso, Gian; Delvaux, Christie; De Backer, Johan; Jandhyala, Radhika; Azordegan, Amir; Abott, Gordon; Kaliblotzky, Zeev; Ercken, Monique (2005) -
Challenges building a 22nm node 6T-SRAM cell using immersion lithography
Ercken, Monique; Altamirano Sanchez, Efrain; Baerts, Christina; Brus, Stephan; De Backer, Johan; Demand, Marc; Delvaux, Christie; Horiguchi, Naoto; Locorotondo, Sabrina; Vandeweyer, Tom; Veloso, Anabela; Verhaegen, Staf (2009) -
Challenges in setting up the patterning processes for a 16nm node SRAM cell
Ercken, Monique; Vandeweyer, Tom; Versluijs, Janko; Truffert, Vincent; De Backer, Johan; Delvaux, Christie; Baerts, Christina (2010) -
Challenges in using optical lithography for the building of a 22 nm node 6T=-SRAM cell
Ercken, Monique; Altamirano Sanchez, Efrain; Baerts, Christina; Brus, Stephan; De Backer, Johan; Delvaux, Christie; Demand, Marc; Horiguchi, Naoto; Locorotondo, Sabrina; Vandeweyer, Tom; Veloso, Anabela; Verhaegen, Staf (2010) -
Demonstration of scaled 0.099μm² FinFET 6T-SRAM cell using full-field EUV lithography for (Sub-)22nm node single-patterning technology
Veloso, Anabela; Demuynck, Steven; Ercken, Monique; Goethals, Mieke; Locorotondo, Sabrina; Lazzarino, Frederic; Altamirano Sanchez, Efrain; Huffman, Craig; De Keersgieter, An; Brus, Stephan; Demand, Marc; Struyf, Herbert; De Backer, Johan; Hermans, Jan; Delvaux, Christie; Baudemprez, Bart; Vandeweyer, Tom; Van Roey, Frieda; Baerts, Christina; Goossens, Danny; Dekkers, Harold; Ong, Patrick; Heylen, Nancy; Kellens, Kristof; Volders, Henny; Hikavyy, Andriy; Vrancken, Christa; Rakowski, Michal; Verhaegen, Staf; Dusa, Mircea; Romijn, Leon; Pigneret, Charles; van Dijk, Andre; Schreutelkamp, Rob; Cockburn, Andrew; Gravey, Virginie; Meiling, H.; Hultermans, B.; Lok, S.; Shah, K.; Rajagopalan, R.; Gelatos, J.; Richard, Olivier; Bender, Hugo; Vandenberghe, Geert; Beyer, Gerald; Absil, Philippe; Hoffmann, Thomas Y.; Ronse, Kurt; Biesemans, Serge (2009-12) -
Double hard mask strategy for patterning 0.186 micron2 SRAM cells using FinFET technology
Demand, Marc; Veloso, Anabela; Brus, Stephan; Delvaux, Christie; De Backer, Johan; Ercken, Monique; Boullart, Werner (2008) -
Full-field EUV and immersion lithography integration in 0.186μm² FinFET 6T-SRAM cell
Veloso, Anabela; Demuynck, Steven; Ercken, Monique; Goethals, Mieke; Demand, Marc; de Marneffe, Jean-Francois; Altamirano Sanchez, Efrain; De Keersgieter, An; Delvaux, Christie; De Backer, Johan; Brus, Stephan; Hermans, Jan; Baudemprez, Bart; Van Roey, Frieda; Lorusso, Gian; Baerts, Christina; Goossens, Danny; Vrancken, Christa; Mertens, Sofie; Versluijs, Janko; Truffert, Vincent; Huffman, Craig; Laidler, David; Heylen, Nancy; Ong, Patrick; Parvais, Bertrand; Rakowski, Michal; Verhaegen, Staf; Hikavyy, Andriy; Meiling, H.; Hultermans, B.; Romijn, L.; Pigneret, C.; Lok, S.; Van Dijk, A.; Shah, K.; Noori, A.; Gelatos, J.; Arghavani, R.; Schreutelkamp, Rob; Boelen, Pieter; Richard, Olivier; Bender, Hugo; Witters, Liesbeth; Collaert, Nadine; Rooyackers, Rita; Absil, Philippe; Lauwers, Anne; Jurczak, Gosia; Hoffmann, Thomas Y.; Vanhaelemeersch, Serge; Cartuyvels, Rudi; Ronse, Kurt; Biesemans, Serge (2008) -
High yield sub-0.1μm² 6T-SRAM Cells, featuring high-k/metal-gate Finfet devices, double gate patterning, a novel Fin etch strategy, full-field EUV lithography and optimized junction design & layout
Horiguchi, Naoto; Demuynck, Steven; Ercken, Monique; Locorotondo, Sabrina; Lazzarino, Frederic; Altamirano Sanchez, Efrain; Huffman, Craig; Brus, Stephan; Demand, Marc; Struyf, Herbert; De Backer, Johan; Hermans, Jan; Delvaux, Christie; Vandeweyer, Tom; Baerts, Christina; Mannaert, Geert; Truffert, Vincent; Verluijs, j; Alaerts, Wilfried; Dekkers, Harold; Ong, Patrick; Heylen, Nancy; Kellens, Kristof; Volders, Henny; Hikavyy, Andriy; Vrancken, Christa; Rakowski, Michal; Verhaegen, Staf; Vandenberghe, Geert; Beyer, Gerald; Lauwers, Anne; Absil, Philippe; Hoffmann, Thomas Y.; Ronse, Kurt; Biesemans, Serge (2010) -
Measurement and evaluation of water uptake by resists, top coats and stacks and correlation with watermark defects
Foubert, Philippe; Kocsis, Michael; Gronheid, Roel; Kishimura, Shinji; Soyano, Akimasa; Nafus, Kathleen; Stepanenko, Nickolay; De Backer, Johan; Vandenbroeck, Nadia; Ercken, Monique (2007) -
Patterning challenges in setting up a 16nm node 6T-SRAM device using EUV lithography
Vandeweyer, Tom; De Backer, Johan; Versluijs, Janko; Truffert, Vincent; Verhaegen, Staf; Ercken, Monique; Dusa, Mircea (2011)