Browsing by author "Franke, Joern-Holger"
Now showing items 1-20 of 22
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Dual monopole exposure strategy to improve extreme ultraviolet imaging
Franke, Joern-Holger; Brunner, Timothy A.; Hendrickx, Eric (2022) -
Elucidating the role of imaging metrics for variability and after etch defectivity
Franke, Joern-Holger; Frommhold, Andreas; Dauendorffer, Arnaud; Nafus, Kathleen; Rispens, Gijsbert; Maslow, Mark (2022) -
EPE analysis of sub-N10 BEOL structures with Coventor's SEMulator3D
Franke, Joern-Holger; Murdoch, Gayle; Halder, Sandip (2017) -
EUV single exposure Tip-to-Tip variability control through PEB process optimization in BEOL layers
Roy, Syamashree; Caron, Elke; Santos, Andreia; Franke, Joern-Holger; Vandereyken, Jelle; Halder, Sandip (2023) -
Evaluation of Lines and Spaces printing and general understanding of imaging with dark field low-n mask
Kovalevich, Tatiana; Van Look, Lieve; Franke, Joern-Holger; Philipsen, Vicky (2023) -
Experimental verification of high-NA imaging simulations using SHARP
Davydova, Natalia; Liu, Fei; Benk, Markus; van Setten, Eelco; Bottiglieri, Gerardo; van Oosten, Anton; McNamara, John; Wiaux, Vincent; Franke, Joern-Holger; Goldberg, Kenneth; Nam, D. S.; Zekry, Joseph; Naulleau, Patrick; Fliervoet, Timon; Carpaij, Rene (2020) -
Extending 0.33NA EUVL to 28 nm pitch using alternative mask and controlled aberrations
Rio, D.; Van Adrichem, P.; Delorme, M.; Lyakhova, K.; Spence, C.; Franke, Joern-Holger (2021) -
Fundamental understanding and experimental verification of bright versus dark field imaging
Davydova, Natalia; Finders, Jo; van Lare, Claire; McNamara, John; Van Setten, Eelco; Zekry, Joseph; Fliervoet, Timon; Carpaij, Rene; Franke, Joern-Holger; Frommhold, Andreas; Verch, Andreas; Kersteen, Grizelda; Capelli, Renzo (2020) -
Hyper NA EUV lithography: an imaging perspective
Lee, Inhwan; Franke, Joern-Holger; Philipsen, Vicky; Ronse, Kurt; De Gendt, Stefan; Hendrickx, Eric (2023) -
Image contrast metrology for EUV lithography
Brunner, Timothy A.; Truffert, Vincent; Ausschnitt, Kit; Kissoon, Nicola N.; Duriau, Edouard; Jonckers, Tom; van Look, Lieve; Franke, Joern-Holger (2022-09-29) -
Imaging validation for LS of dark field low-n vs Ta-based absorber masks
Kovalevich, Tatiana; Van Look, Lieve; Moussa, Alain; Franke, Joern-Holger; Philipsen, Vicky (2023) -
Improving exposure latitude and aligning best focus through pitch by curing M3D effects with controlled aberrations
Franke, Joern-Holger; Bekaert, Joost; Blanco, Victor; Van Look, Lieve; Wahlisch, Felix; Lyakhova, Kateryna; Van Adrichem, Paul; Maslow, Mark John; Schiffelers, Guido; Hendrickx, Eric (2019) -
Metal layer single EUV expose at pitch 28nm: how bright field and NTD resist advantages align
Franke, Joern-Holger; Frommhold, Andreas; Davydova, Natalia; Aubert, Remko; Nair, Vineet Vijayakrishnan; Kovalevich, Tatiana; Rio, David; Bekaert, Joost; Wang, Erik; Rispens, Gijsbert; Maslow, Mark; Hendrickx, Eric (2021) -
Pupil optimization for after etch defectivity: what imaging metrics matter?
Frommhold, Andreas; Franke, Joern-Holger; Maslow, Mark J.; Nafus, Kathleen; Rispens, Gijsbert (2021) -
SAQP and EUV block patterning of BEOL metal layers on IMEC's iN7 platform
Bekaert, Joost; Di Lorenzo, Paolo; Mao, Ming; Decoster, Stefan; Lariviere, Stephane; Franke, Joern-Holger; Blanco, Victor; Kutrzeba Kotowska, Bogumila; Lazzarino, Frederic; Gallagher, Emily; Hendrickx, Eric; Leray, Philippe; Kim, Ryan Ryoung han; McIntyre, Greg; Colsters, Paul; Wittebrood, Friso; van Dijk, Joep; Maslow, Mark; Timoshkov, Vadim; Kiers, Ton (2017) -
Self-aligned block and fully self-aligned via for iN5 metal 2 self-aligned quadruple patterning
Vincent, Benjamin; Franke, Joern-Holger; Juncker, Aurelie; Lazzarino, Frederic; Murdoch, Gayle; Halder, Sandip; Ervin, Joseph (2018) -
Self-aligned block and fully self-aligned via for iN5 Metal 2 Self-aligned quadruple patterning
Vincent, Benjamin; Franke, Joern-Holger; Juncker, Aurelie; Lazzarino, Frederic; Murdoch, Gayle; Halder, Sandip; Ervin, Joseph (2018) -
Single exposure EUV block downscaling for metal pitches below 32nm
Franke, Joern-Holger; Colsters, Paul; Bekaert, Joost; Hendrickx, Eric; Wittebrood, F.; Pathak, Abhinav; Schiffelers, Guido (2017) -
The imec iN7 EUV platform: M2-Block and Via patterning developments
Bekaert, Joost; Franke, Joern-Holger; Mao, Ming; Lariviere, Stephane; Decoster, Stefan; Di Lorenzo, Paolo; Kutrzeba Kotowska, Bogumila; Blanco, Victor; Hendrickx, Eric; Gallagher, Emily; Leray, Philippe; Kim, Ryan Ryoung han; McIntyre, Greg; Colsters, Paul; Wittebrood, Friso; van Dijk, Joep; Timoshkov, Vadim; Kiers, Ton; Maslow, Mark (2016) -
Tomorrow's pitches on today's 0.33 NA scanner: pupil and imaging conditions to print P24 L/S and P28 contact holes
Franke, Joern-Holger; Bekaert, Joost; Wiaux, Vincent; Nair, Vineet Vijayakrishnan; Hendrickx, Eric; Davydova, Natalia; van Dijk, Andre; Wang, Erik; Maslow, Mark (2020)