Browsing by author "Kesters, Els"
Now showing items 21-40 of 117
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Characterization of modification of 193-nm photoresist by HBr plasma
Vereecke, Guy; Claes, Martine; Le, Quoc Toan; Kesters, Els; Struyf, Herbert; Carleer, Robert; Adriaensens, Peter (2011) -
Characterization of patterned porous dielectrics after plasma patterning and subsequent wet processing
Le, Quoc Toan; Kesters, Els; Decoster, Stefan; Chan, BT; Holsteyns, Frank; De Gendt, Stefan (2015) -
Characterization of patterned porous low-k dielectrics: surface sealing and residue removal by wet processing/cleaning
Le, Quoc Toan; Kesters, Els; Decoster, Stefan; Chan, BT; Nguyen, Mai Phuong; Conard, Thierry; Vanleenhove, Anja; Holsteyns, Frank; De Gendt, Stefan (2016) -
Characterization of post-etch photoresists used in metal hardmask and photoresist mask patterning schemes
Kesters, Els; Claes, Martine; Lux, Marcel; Le, Quoc Toan; Vereecke, Guy; Franquet, Alexis; Conard, Thierry; Mertens, Paul; Adriaensens, Peter; Carleer, Robert; Biebuyck, J.J.; Van Veltem, P.; Bebelman, Sabine (2007) -
Characterization of post-etched photoresist and residues by various analytical techniques
Franquet, Alexis; Claes, Martine; Conard, Thierry; Kesters, Els; Vereecke, Guy; Vandervorst, Wilfried (2007-11) -
Characterization of post-etched photoresist and residues by various analytical techniques
Franquet, Alexis; Claes, Martine; Conard, Thierry; Kesters, Els; Vereecke, Guy; Vandervorst, Wilfried (2008) -
Chemical and structural modifications in a 193-nm photoresist after low-k dry etch
Kesters, Els; Claes, Martine; Le, Quoc Toan; Lux, Marcel; Franquet, Alexis; Vereecke, Guy; Mertens, Paul; Frank, Martin M.; Carleer, Robert; Adriaensens, Peter; Biebuyck, J.J.; Bebelman, Sabine (2008) -
Cleaning of post-etch photoresist layer on patterned surface using organic solvent combined with physical forces
Le, Quoc Toan; Chiodarelli, Nicolo; Blum, Ivan; Kesters, Els; Lux, Marcel; Claes, Martine; Vereecke, Guy; Mertens, Paul (2007-04) -
Co and Ru dual damascene compatible metallization studies
van der Veen, Marleen; Heylen, Nancy; Lariviere, Stephane; Vega Gonzalez, Victor; Kesters, Els; Le, Quoc Toan; Teugels, Lieve; Chew, Soon Aik; Philipsen, Harold; Hung, Joey; Adelmann, Christoph; Vanstreels, Kris; Jourdan, Nicolas; Holsteyns, Frank; Struyf, Herbert; Wilson, Chris; Tokei, Zsolt (2019) -
Cobalt pre-metallization clean and functional water rinse in BEOL interconnect
Kesters, Els; Le, Quoc Toan; van der Veen, Marleen; Akanishi, Yuya; Hideaki, Iino; Mizutani, Atsushi; Holsteyns, Frank (2019) -
Controlled cobalt recess for advanced interconnect metallization
Pacco, Antoine; Akanishi, Yuya; Le, Quoc Toan; Kesters, Els; Murdoch, Gayle; Holsteyns, Frank (2019) -
Corrosion of Co in BEOL interconnects in dilute HF solution
Akanishi, Yuya; Kesters, Els; Le, Quoc Toan; Holsteyns, Frank (2018) -
Damage-free removal of nano-sized particles, heading towards a red brick wall
Mertens, Paul; Fyen, Wim; Vereecke, Guy; Xu, Kaidong; Lauerhaas, J.; Holsteyns, Frank; Van Doorne, Patrick; Kesters, Els; Vos, Rita (2003) -
Development of a Cu and W compatible PERR clean in BEOL advanced interconnect patterning
Kesters, Els; Le, Quoc Toan; Decoster, Stefan; Vega Gonzalez, Victor; Holsteyns, Frank; De Gendt, Stefan (2015) -
Development of Metal Free Wet Etching Chemical for Ruthenium Interconnect
Kesters, Els; Ohashi, Takuya; Wada, Y; Sugawara, M; Kumagai, T; Le, Quoc Toan; Rip, Jens; Oniki, Yusuke; Holsteyns, Frank (2019) -
Effect of chemical solution on the stability of low-k films
Kesters, Els; Le, Quoc Toan; Baklanov, Mikhaïl; Boullart, Werner; Mertens, Paul (2004) -
Effect of chemical solution on the stability of low-k films
Kesters, Els; Le, Quoc Toan; Baklanov, Mikhaïl; Boullart, Werner; Mertens, Paul (2005) -
Effect of chemical solutions and surface wettability on the stability of advanced porous low-k materials
Le, Quoc Toan; Vereecke, Guy; Bertha, Anne; Kesters, Els; Lux, Marcel; Struyf, Herbert (2011) -
Effect of cleaning chemistries on cobalt: surface chemistries
Le, Quoc Toan; Kesters, Els; Akanishi, Yuya; van der Veen, Marleen; Mizutani, Atsushi; Holsteyns, Frank (2018) -
Effect of downstream plasma treatment on dissolution of fluorocarbon polymer in organic solvents
Le, Quoc Toan; Kesters, Els; Devonport, Joshua; Holsteyns, Frank; De Gendt, Stefan (2014)