Browsing by author "Van den hove, Luc"
Now showing items 41-60 of 107
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IC innovation - the heartbeat of yesterday, today, tomorrow
Van den hove, Luc (2017) -
IC innovation - the heartbeat of yesterday, today, tomorrow
Van den hove, Luc (2017) -
Imec - key player in Leuven Mindgate - drives innovation engine towards the internet of everything
Van den hove, Luc (2015) -
IMEC's Lab-to-Fab enablement for advnced collaborative research in nanoelectronics
Van den hove, Luc (2014) -
Impact of SEM accuracy on the CD control during gate patterning process of 0.25μm and sub-0.25μm generations
Finders, Jo; Ronse, Kurt; Van den hove, Luc; Van Driessche, Veerle; Tzviatkov, Plamen (1997) -
Improvement of the focus-exposure latitude using optimised illumination and mask design
Pforr, Rainer; Ronse, Kurt; Jaenen, Patrick; Jonckheere, Rik; Van den hove, Luc; van Oorschot, P.; Luehrman, P. (1994) -
Increasing DOF for VIA lithography using a non-CMP based architecture
Grozev, Grozdan; Waeterloos, Joost; Ronse, Kurt; Van den hove, Luc; Tzviatkov, Plamen (1997) -
Innovation through global partnerships
Van den hove, Luc; Vandenberghe, Geert (2010) -
Integrating a hydrogen silsesquioxane spin-on dielectric in a quarter micron technology
Waeterloos, Joost; Meynen, Herman; Coenegrachts, Bart; Gao, Teng; Grillaert, Joost; Van den hove, Luc (1997) -
Interlevel dielectric engineering for improved device performance in half-micron CMOS
Forester, Lynn; Collins, Tom; Van den Bosch, Geert; Meynen, Herman; Coenegrachts, Bart; Van den hove, Luc (1994) -
Leading-edge technology vital for future competitiveness
Van den hove, Luc (2012) -
Lithographic evaluation of a new wet silylation process using safe solvents and the commercial photoresist AZ 5214E
Gogolides, E.; Baik, Ki-Ho; Yannakopolou, K.; Van den hove, Luc (1994) -
Lithographic strategies for 0.35µm poly gates for random logic applications
Op de Beeck, Maaike; Van Driessche, Veerle; Van den hove, Luc; Dijkstra, H. (1994) -
Lithography for sub-90nm applications
Van den hove, Luc; Goethals, Mieke; Ronse, Kurt; Van Bavel, Mieke; Vandenberghe, Geert (2002) -
Lithography options for sub -90nm imaging "status 157nm lithography"
Van den hove, Luc; Ronse, Kurt (2003) -
Low-k organic spin-on materials in a non-etchback interconnect strategy
Waeterloos, Joost; Meynen, Herman; Coenegrachts, Bart; Grillaert, Joost; Van den hove, Luc (1996) -
Manufacturable DUV lithography processes for 0.25 μm technology contact and via layers
Baker, Daniel; Op de Beeck, Maaike; Botermans, Harry; Van den hove, Luc (1997) -
Minimizing within die non uniformity in CMP by optimising polishing parameters and consumables
Grillaert, Joost; Meynen, Herman; Waeterloos, Joost; Coenegrachts, Bart; Van den hove, Luc (1997) -
Molybdenum Silicide Based Attenuated Phase-Shift Masks
Jonckheere, Rik; Ronse, Kurt; Popa, Ovidiu; Van den hove, Luc (1994) -
NA/sigma optimisation strategies for an advanced DUV stepper applied to 0.25 mm and sub-0.25 mm critical levels
Op de Beeck, Maaike; Ronse, Kurt; Ghandehari, Kouros; Jaenen, Patrick; Botermans, Harry; Finders, Jo; Lilygren, John; Baker, Daniel; Vandenberghe, Geert; De Bisschop, Peter; Maenhoudt, Mireille; Van den hove, Luc (1997)