Browsing imec Publications by imec author "7c3b4eaa6513454d090fce891196afe70cb87447"
Now showing items 1-20 of 40
-
At the Extreme of 3D-NAND Scaling: 25 nm Z-Pitch with 10 nm Word Line Cells
Rachidi, Sana; Arreghini, Antonio; Verreck, Devin; Donadio, Gabriele Luca; Banerjee, Kaustuv; Katcko, Kostantine; Oniki, Yusuke; Van den Bosch, Geert; Rosmeulen, Maarten (2022) -
Challenges and solutions of replacement metal gate patterning to enable gate-all-around device scaling
Oniki, Yusuke; Ragnarsson, Lars-Ake; Hideaki, Iino; Cott, Daire; Chan, BT; Sebaai, Farid; Hopf, Toby; Dekkers, Harold; Dentoni Litta, Eugenio; Altamirano Sanchez, Efrain; Holsteyns, Frank; Horiguchi, Naoto (2021) -
Comparison of Electrical Performance of Co-Integrated Forksheets and Nanosheets Transistors for the 2nm Technological Node and Beyond
Ritzenthaler, Romain; Mertens, Hans; Eneman, Geert; Simoen, Eddy; Bury, Erik; Eyben, Pierre; Bufler, Fabian; Oniki, Yusuke; Briggs, Basoene; Chan, BT; Hikavyy, Andriy; Mannaert, Geert; Parvais, Bertrand; Vaisman Chasin, Adrian; Mitard, Jerome; Dentoni Litta, Eugenio; Samavedam, Sri; Horiguchi, Naoto (2021) -
Controlled isotropic etches for Gate-All-Around (GAA) device architectures
Muraki, Yusuke; Oniki, Yusuke; Kenis, Karine; Altamirano Sanchez, Efrain; Holsteyns, Frank; Kal, Subhadeep; Alix, Cheryl; Kumar, Kaushik; Mosden, Aelan (2020) -
Development of Metal Free Wet Etching Chemical for Ruthenium Interconnect
Kesters, Els; Ohashi, Takuya; Wada, Y; Sugawara, M; Kumagai, T; Le, Quoc Toan; Rip, Jens; Oniki, Yusuke; Holsteyns, Frank (2019) -
Dipole-First Gate Stack as a Scalable and Thermal Budget Flexible Multi-Vt Solution for Nanosheet/CFET Devices
Arimura, Hiroaki; Ragnarsson, Lars-Ake; Oniki, Yusuke; Franco, Jacopo; Vandooren, Anne; Brus, Stephan; Leonhardt, A.; Sippola, P.; Ivanova, T.; Verni, G. Alessio; Chang, R-J; Xie, Q.; Givens, M.; Mitard, Jerome; Biesemans, Serge; Dentoni Litta, Eugenio; Horiguchi, Naoto (2021) -
Disruptive Technology Elements, and Rapid and Accurate Block-Level Performance Evaluation for 3nm and Beyond
Na, Myung Hee; Jang, Doyoung; Baert, Rogier; Sarkar, Satadru; Patli, Sudhir; Zografos, Odysseas; Chehab, Bilal; Spessot, Alessio; Sisto, Giuliano; Schuddinck, Pieter; Mertens, Hans; Oniki, Yusuke; Hellings, Geert; Dentoni Litta, Eugenio; Ryckaert, Julien; Horiguchi, Naoto (2021) -
Dry removal of a surface functionalization chemistry used for pattern collapse prevention
Vereecke, Guy; Komori, Kana; Nakano, Yuta; Sebaai, Farid; Xu, XiuMei; Oniki, Yusuke; Holsteyns, Frank (2018) -
Enabling CMOS scaling towards 3nm and beyond
Mocuta, Anda; Weckx, Pieter; Demuynck, Steven; Radisic, Alex; Oniki, Yusuke; Ryckaert, Julien (2018) -
Enabling complimentary FET (CFET) fabrication: selective, isotropic etch of Group IV semiconductors
Kal, Subhadeep; Oniki, Yusuke; Falugh, Matthew; Pereira, Cheryl; Wang, Qi; Holsteyns, Frank; Smith, Jeffrey; Mosden, Aelan; Kumar, Kaushik; Boemmels, Juergen; Ryckaert, Julien; Biolsi, Peter; Hurd, Trace Q (2019) -
Enhanced light coupling into nanostructured arrays as an enabler for advanced Raman-based metrology
Nuytten, Thomas; Bogdanowicz, Janusz; Gawlik, Andrzej; Oniki, Yusuke; Kenis, Karine; Muraki, Yusuke; Charley, Anne-Laure; Fleischmann, Claudia; De Wolf, Ingrid; van der Heide, Paul (2021) -
FinFETs with Thermally Stable RMG Gate Stack for Future DRAM Peripheral Circuits
Capogreco, Elena; Arimura, Hiroaki; Ritzenthaler, Romain; Brus, Stephan; Oniki, Yusuke; Dupuy, Emmanuel; Sebaai, Farid; Radisic, Dunja; Chan, BT; Zhou, Daisy; Machkaoutsan, V.; Yoon, S.; Itokawa, H.; Yamaguchi, M.; Gao, Z.; Fazan, P.; Chen, Y.; Subramanian, Sujith; Ragnarsson, Lars-Ake; Spessot, Alessio; Dentoni Litta, Eugenio (2022) -
First demonstration of ruthenium and molybdenum word lines integrated into 40nm ptch 3D NAND memory devices
Ajaykumar, Arjun; Breuil, Laurent; Katcko, Kostantine; Schleicher, Filip; Sebaai, Farid; Oniki, Yusuke; Ramesh, Siva; Arreghini, Antonio; Nyns, Laura; Soulie, Jean-Philippe; Stiers, Jimmy; Rosmeulen, Maarten; Van den Bosch, Geert (2021) -
First demonstration of Two Metal Level Semi-damascene Interconnects with Fully Self-aligned Vias at 18MP
Murdoch, Gayle; O'Toole, Martin; Marti, Giulio; Pokhrel, Ankit; Tsvetanova, Diana; Decoster, Stefan; Kundu, Souvik; Oniki, Yusuke; Thiam, Arame; Le, Quoc Toan; Varela Pedreira, Olalla; Lesniewska, Alicja; Martinez Alanis, Gerardo Tadeo; Park, Seongho; Tokei, Zsolt (2022-06-15) -
Forksheet FETs for Advanced CMOS Scaling: Forksheet-Nanosheet Co-Integration and Dual Work Function Metal Gates at 17nm N-P Space
Mertens, Hans; Ritzenthaler, Romain; Oniki, Yusuke; Briggs, Basoene; Chan, BT; Hikavyy, Andriy; Hopf, Toby; Mannaert, Geert; Tao, Zheng; Sebaai, Farid; Peter, Antony; Vandersmissen, Kevin; Dupuy, Emmanuel; Rosseel, Erik; Batuk, Dmitry; Geypen, Jef; Martinez Alanis, Gerardo Tadeo; Abigail, Daniel_; Grieten, Eva; D'have, Koen; Mitard, Jerome; Subramanian, Sujith; Ragnarsson, Lars-Ake; Weckx, Pieter; Chehab, Bilal; Hellings, Geert; Ryckaert, Julien; Dentoni Litta, Eugenio; Horiguchi, Naoto (2021) -
Forksheet FETs with Bottom Dielectric Isolation, Self-Aligned Gate Cut, and Isolation between Adjacent Source-Drain Structures
Mertens, Hans; Ritzenthaler, Romain; Oniki, Yusuke; Puttarame Gowda, Pallavi; Mannaert, Geert; Sebaai, Farid; Hikavyy, Andriy; Rosseel, Erik; Dupuy, Emmanuel; Peter, Antony; Vandersmissen, Kevin; Radisic, Dunja; Briggs, Basoene; Batuk, Dmitry; Geypen, Jef; Martinez Alanis, Gerardo Tadeo; Seidel, Felix; Richard, Olivier; Chan, BT; Mitard, Jerome; Dentoni Litta, Eugenio; Horiguchi, Naoto (2022) -
Functional water solutions to enable advanced wet cleaning process for next generation semiconductor device manufacturing
Iino, Hideaki; Tanaka, Yoichi; Gan, Nobuko; Fukui, Takeo; Akanishi, Yuya; Iwahata, Shota; Oniki, Yusuke; Altamirano Sanchez, Efrain; Holsteyns, Frank (2021) -
Functional water solutions to enable wet cleaning process for leading edge semiconductor device manufacturing
Kesters, Els; Hideaki, Iino; Yuichi, Ogawa; Oniki, Yusuke; Le, Quoc Toan; Holsteyns, Frank (2019) -
Insights into Scaled Logic Devices Connected from Both Wafer Sides
Veloso, Anabela; Eneman, Geert; Matagne, Philippe; Vermeersch, Bjorn; Jourdain, Anne; Arimura, Hiroaki; O'Sullivan, Barry; Chen, Rongmei; De Keersgieter, An; Simoen, Eddy; Radisic, Dunja; Oniki, Yusuke; Lafitte, A.; Brus, Stephan; Beyne, Eric; Dentoni Litta, Eugenio; Horiguchi, Naoto (2022)