Browsing Conference contributions by imec author "ef81b9280b113989bed4db9958d4caa89e57b8a3"
Now showing items 21-40 of 107
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Characterization of low-k dielectric etch residue on the sidewall by chemical force microscope
Kim, Tae-Gon; Le, Quoc Toan; Suhard, Samuel; Lux, Marcel; Vereecke, Guy; Claes, Martine; Struyf, Herbert; De Gendt, Stefan; Mertens, Paul; Heyns, Marc (2010) -
Characterization of modification of 193-nm photoresist by HBr plasma
Vereecke, Guy; Claes, Martine; Le, Quoc Toan; Kesters, Els; Struyf, Herbert; Carleer, Robert; Adriaensens, Peter (2011) -
Characterization of patterned porous dielectrics after plasma patterning and subsequent wet processing
Le, Quoc Toan; Kesters, Els; Decoster, Stefan; Chan, BT; Holsteyns, Frank; De Gendt, Stefan (2015) -
Cleaning and etching solutions for the prospective use of Molybdenum in next generation interconnect fabrication.
Pacco, Antoine; Le, Quoc Toan; Akanishi, Yuya; Altamirano Sanchez, Efrain (2020) -
Cleaning of post-etch photoresist layer on patterned surface using organic solvent combined with physical forces
Le, Quoc Toan; Chiodarelli, Nicolo; Blum, Ivan; Kesters, Els; Lux, Marcel; Claes, Martine; Vereecke, Guy; Mertens, Paul (2007-04) -
Co and Ru dual damascene compatible metallization studies
van der Veen, Marleen; Heylen, Nancy; Lariviere, Stephane; Vega Gonzalez, Victor; Kesters, Els; Le, Quoc Toan; Teugels, Lieve; Chew, Soon Aik; Philipsen, Harold; Hung, Joey; Adelmann, Christoph; Vanstreels, Kris; Jourdan, Nicolas; Holsteyns, Frank; Struyf, Herbert; Wilson, Chris; Tokei, Zsolt (2019) -
Cobalt pre-metallization clean and functional water rinse in BEOL interconnect
Kesters, Els; Le, Quoc Toan; van der Veen, Marleen; Akanishi, Yuya; Hideaki, Iino; Mizutani, Atsushi; Holsteyns, Frank (2019) -
Contact patterning scheme for organo-siloxane Low-k material as pre-metal dielectric
de Marneffe, Jean-Francois; Le, Quoc Toan; Conard, Thierry; Demuynck, Steven; Struyf, Herbert; Baklanov, Mikhaïl; Boullart, Werner (2005) -
Controlled cobalt recess for advanced interconnect metallization
Pacco, Antoine; Akanishi, Yuya; Murdoch, Gayle; Le, Quoc Toan; Holsteyns, Frank (2019) -
Corrosion of Co in BEOL interconnects in dilute HF solution
Akanishi, Yuya; Kesters, Els; Le, Quoc Toan; Holsteyns, Frank (2018) -
Development of a Cu and W compatible PERR clean in BEOL advanced interconnect patterning
Kesters, Els; Le, Quoc Toan; Decoster, Stefan; Vega Gonzalez, Victor; Holsteyns, Frank; De Gendt, Stefan (2015) -
Development of a new post-etch photoresist stripper for copper BEOL process
Du, Bing; Kneer, Emil; Townsend, P.H.; Le, Quoc Toan; Hendrickx, Dirk; Vereecke, Guy (2007) -
Development of Metal Free Wet Etching Chemical for Ruthenium Interconnect
Kesters, Els; Ohashi, Takuya; Wada, Y; Sugawara, M; Kumagai, T; Le, Quoc Toan; Rip, Jens; Oniki, Yusuke; Holsteyns, Frank (2019) -
Effect of chemical solution on the stability of low-k films
Kesters, Els; Le, Quoc Toan; Baklanov, Mikhaïl; Boullart, Werner; Mertens, Paul (2005) -
Effect of chemical solutions and surface wettability on the stability of advanced porous low-k materials
Le, Quoc Toan; Vereecke, Guy; Bertha, Anne; Kesters, Els; Lux, Marcel; Struyf, Herbert (2011) -
Effect of cleaning chemistries on cobalt: surface chemistries
Le, Quoc Toan; Kesters, Els; Akanishi, Yuya; van der Veen, Marleen; Mizutani, Atsushi; Holsteyns, Frank (2018) -
Effect of downstream plasma treatment on dissolution of fluorocarbon polymer in organic solvents
Le, Quoc Toan; Kesters, Els; Devonport, Joshua; Holsteyns, Frank; De Gendt, Stefan (2014) -
Effect of radical scavenger and UV irradiation on removal of photoresist and BARC using water/ozone in Cu/low-k interconnect
Le, Quoc Toan; Lux, Marcel; Kesters, Els; Prager, Lutz; Vereecke, Guy (2009) -
Effect of radical scavenger and UV irradiation on removal of photoresist and BARC using water/ozone in Cu/low-k interconnect
Le, Quoc Toan; Lux, Marcel; Kesters, Els; Vereecke, Guy (2009) -
Effect of surface chemistry on Ruthenium wet etching
Le, Quoc Toan; Kesters, Els; Doms, Mathias; Altamirano Sanchez, Efrain (2021)