Browsing Conference contributions by imec author "ef81b9280b113989bed4db9958d4caa89e57b8a3"
Now showing items 61-80 of 107
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Minimizing plasma damage and in situ sealing of ultra low-k dielectric films by using of oxygen free fluorcarbon plasma
Mannaert, Geert; Baklanov, Mikhaïl; Le, Quoc Toan; Travaly, Youssef; Boullart, Werner; Vanhaelemeersch, Serge (2005) -
Minimizing plasma damage of CVD low-k materials by tuning a two step etch sequence.
Van Aelst, Joke; Baklanov, Mikhaïl; Le, Quoc Toan; Struyf, Herbert; Boullart, Werner; Vanhaelemeersch, Serge (2004) -
Modification of 193-nm photoresist by UV irradiation for post-etch wet strip applications
Kesters, Els; Le, Quoc Toan; Lux, Marcel; Prager, Lutz; Vereecke, Guy (2009) -
Modification of post-etch residues by UV for wet removal
Le, Quoc Toan; Drieskens, Frederik; de Marneffe, Jean-Francois; Conard, Thierry; Lux, Marcel; Struyf, Herbert; Vereecke, Guy (2010) -
Modifications of porous low-k by plasma treatments and wet cleans
Xu, Kaidong; Vereecke, Guy; Kesters, Els; Le, Quoc Toan; Lux, Marcel; Henry, Sally-Ann; Kraus, Harald; Archer, L.; Mertens, Paul; Kovacs, F; Dalmer, M; Gaulhofer, E; Luo, S.J.; Han, Q.Y.; Berry, I. (2007) -
Monitoring and qualification using comprehensive surface haze
Holsteyns, Frank; Roels, Jan; Kenis, Karine; Le, Quoc Toan; Mertens, Paul (2003) -
New cleaning solutions for all-wet-post etch residue removal on Cu BEOL for sub 45nm nodes
Klipp, Andreas; Vereecke, Guy; Le, Quoc Toan; Claes, Martine (2009) -
Optimization of post etch cobalt compatible clean by pH and oxidizer
Iino, H.; Ogawa, Y.; Masaoka, T.; Le, Quoc Toan; Kesters, Els; Rip, Jens; Oniki, Yusuke; Akanishi, Y.; Iwasaki, Akihisa; Holsteyns, Frank (2018) -
Overcoming barrier integrity issues of I-PVD deposited Ta(N) barriers on inorganic porous low-k's
Iacopi, Francesca; Tokei, Zsolt; Shamiryan, Denis; Le, Quoc Toan; Malhouitre, Stéphane; Van Hove, Marleen; Maex, Karen (2002) -
Particle removal from Si substrates in organic solvents using megasonic energy
Barbagini, Francesca; Janssens, Tom; Bearda, Twan; Armini, Silvia; Van Hoeymissen, Jan; Le, Quoc Toan; Mertens, Paul; Fransaer, Jan (2007) -
Patterning of Ru metal lines at 18 nm pitch
Decoster, Stefan; Kundu, Souvik; Lazzarino, Frederic; Lariviere, Stephane; O'Toole, Martin; Murdoch, Gayle; van der Veen, Marleen; Heylen, Nancy; Le, Quoc Toan (2022) -
Photoresist characterization and wet strip after low-k dry etch
Claes, Martine; Le, Quoc Toan; Keldermans, J.; Kesters, Els; Lux, Marcel; Franquet, Alexis; Vereecke, Guy; Mertens, Paul; Frank, Martin M.; Carleer, R.; Adriaensens, P.; Vanderzande, Dirk (2008) -
Plasma-induced 193-nm resist deformation: problems and a possible solution
Struyf, Herbert; Dupont, Tania; Le, Quoc Toan; Boullart, Werner; Vanhaelemeersch, Serge (2004) -
Porosity and critical properties of silica-based low-dielectric-constant materials
Baklanov, Mikhaïl; Travaly, Youssef; Le, Quoc Toan; Shamiryan, Denis; Vanhaelemeersch, Serge (2005-05) -
Porous dielectric materials for back-end-of-line interconnect
Le, Quoc Toan; Kesters, Els; Holsteyns, Frank (2016) -
Post ion-implant photoresist removal via wet chemical cleans combined with physical force pretreatments
Totir, George; Frank, Martin M.; Vos, Rita; Arnauts, Sophia; Bearda, Twan; Kenis, Karine; Delande, Tinne; Le, Quoc Toan; Kesters, Els; Vereecke, Guy; Mannaert, Geert; Lux, Marcel; Hoflijk, Ilse; Conard, Thierry; Banerjee,; Malhouitre, Stephane; Leunissen, Peter; Mertens, Paul (2007) -
Post patterning meso porosity creation: a potential solution for pore sealing
Caluwaerts, Rudy; Van Hove, Marleen; Beyer, Gerald; Hoofman, Romano; Struyf, Herbert; Brom - Verheyden, Greja; Waeterloos, Joost; Tokei, Zsolt; Iacopi, Francesca; Carbonell, Laure; Le, Quoc Toan; Das, Arabinda; Vos, Ingrid; Demuynck, Steven; Maex, Karen (2003) -
Post-etch sidewall residues in metal hard mask/porous low-k single damascene structures: Characterization and wet removal
Le, Quoc Toan; de Marneffe, Jean-Francois; Conard, Thierry; Lux, Marcel; Vereecke, Guy (2010) -
PR and BARC wet strip in BEOL patterning using a UV-enabled aqueous process
Kesters, Els; Le, Quoc Toan; Lux, Marcel; Vereecke, Guy; Struyf, Herbert; De Gendt, Stefan (2011) -
PR and BARC wet strip in BEOl patterning using a UV-enabled aqueous process
Kesters, Els; Le, Quoc Toan; Lux, Marcel; Vereecke, Guy; Struyf, Herbert; De Gendt, Stefan (2011)