Browsing Articles by imec author "9d8d0492b545e613b7b5c336e809dc5442e43536"
Now showing items 1-11 of 11
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Comparison between Vacuum Ultra-Violet emission of CF4/Ar and CF3I/Ar plasmas in CCP chamber for low-k etching
Zotovich, Alexey; El Otell, Ziad; de Marneffe, Jean-Francois; Proshina, Olga; Lopaev, Dimitri; Rakhimova, Tatyana; Baklanov, Mikhaïl (2016) -
Development of a novel wafer-probe for in situ measurements of thin film properties
El Otell, Ziad; Marinov, Daniil; Samara, Vladimir; Bowden, Mark; de Marneffe, Jean-Francois; Verdonck, Patrick; Braithwaite, Nicholas St. J. (2015) -
Extraction and neutralization of positive and negative ions from a pulsed electronegative inductively coupled plasma
Marinov, Daniil; El Otell, Ziad; Bowden, Mark; Braithwaite, Nicholas (2015) -
High-throughput process chain for single electron transistor devices based on field-emission scanning probe lithography and Smart Nanoimprint technology
Lenk, Claudia; Krivoshapkina, Yana; Hofmann, Martin; Lenk, Steve; Tzvetan, Ivanov; Rangelow, Ivo; Ahmad, Ahmad; Reum, Alexander; Holz, M; Glinsner, Thomas; Eibelhuber, Martin; Treiblmayr, Dominik; Schamberger, Barbara; Chan, BT; El Otell, Ziad; de Marneffe, Jean-Francois (2019) -
Improved plasma resistance for porous low-k dielectrics by pore stuffing approach
Zhang, Liping; de Marneffe, Jean-Francois; Heyne, Markus; Naumov, Sergej; Sun, Yiting; Zotovich, Alexey; El Otell, Ziad; Vaida, Selim; De Gendt, Stefan; Baklanov, Mikhaïl (2015) -
Line edge and width roughness smoothing by plasma treatment
De Schepper, Peter; Hansen, Terje; Altamirano Sanchez, Efrain; Vaglio Pret, Alessandro; El Otell, Ziad; Boullart, Werner; De Gendt, Stefan (2014) -
Method for in-situ etch uniformity monitoring using plasma emission interferometry
Samara, Vladimir; de Marneffe, Jean-Francois; El Otell, Ziad; Economou, Demetre (2015) -
Pattern roughness mitigation of 22 nm lines and spaces: The impact of H2 plasma treatment
De Schepper, Peter; Vaglio Pret, Alessandro; El Otell, Ziad; Hansen, Terje; Altamirano Sanchez, Efrain; De Gendt, Stefan (2015) -
The influence of H2 plasma treatment on LWR mitigation: the importance of EUV photoresist composition
De Schepper, Peter; El Otell, Ziad; Vaglio Pret, Alessandro; Altamirano Sanchez, Efrain; De Gendt, Stefan (2015) -
Use of a thermally degradable chemical vapor deposited polymer film for low damage plasma processing of highly porous dielectrics
de Marneffe, Jean-Francois; Yamaguchi, Tatsuya; Fujikawa, Makoto; Rezvanov, Askar; Chanson, Romain; Zhang, Jianran; Babaei Gavan, Khashayar; El Otell, Ziad; Nozawa, S.; Kikuchi, Y.; Maekawa, Kaoru (2019) -
Vacuum ultra-violet emission of CF4 & CF3I containing plasmas and their effect on low-k materials
El Otell, Ziad; Samara, Vladimir; Zotovich, Alexey; Hansen, Terje; de Marneffe, Jean-Francois; Baklanov, Mikhaïl (2015)