Browsing Presentations by imec author "be9343d76409d1a61d9b83307a9acf0b6f1a30c7"

3D FinFET gate etch for advanced CMOS scaling

Dupuy, Emmanuel; Altamirano Sanchez, Efrain; Marinov, Daniil; Hody, Hubert; Mertens, Hans; Siew, Yong Kong; Demuynck, Steven; Horiguchi, Naoto (2019)

Challenges for smoothing EUV photoresist line-width-roughness: plasma treatment from 40 to 22 nm half pitches

Altamirano Sanchez, Efrain; De Schepper, Peter; Hansen, Terje; Boullart, Werner (2013)

Controlled isotropic etches for Gate-All-Around (GAA) device architectures

Muraki, Yusuke; Oniki, Yusuke; Kenis, Karine; Altamirano Sanchez, Efrain; Holsteyns, Frank; Kal, Subhadeep; Alix, Cheryl; Kumar, Kaushik; Mosden, Aelan (2020)

Dry-etch Fin patterning on SOI: transition from 32 to 22nm node on a 6T-SRAM cell

Altamirano Sanchez, Efrain; Ercken, Monique; Veloso, Anabela; Demand, Marc; Boullart, Werner (2009)

Etch challenges on single and dual SOI fins patterning for CFET at 25nm fin pitch

Chan, BT; Boemmels, Juergen; Ryckaert, Julien; Zhang, Liping; Tao, Zheng; Altamirano Sanchez, Efrain; de Marneffe, Jean-Francois (2019)

Fin bending in dimensional scaling

Zhang, Liping; Hellin, David; Sepulveda Marquez, Alfonso; Altamirano Sanchez, Efrain; Lazzarino, Frederic; Morin, Pierre; Wang, Shouhua; Hopf, Toby; Kenis, Karine; Lorant, Christophe; Sebaai, Farid; Batuk, Dmitry; Briggs, Basoene; Mertens, Hans; Demuynck, Steven (2020)

Plasma influence on the attenuation of line width roughness of EUV photoresist lines ranging from 40 to 22 nm half pitch

Altamirano Sanchez, Efrain; De Schepper, Peter; Hansen, Terje; Boullart, Werner (2013)

Plasma smoothing of extreme ultraviolet photoresist: LWR reduction at 30nm half pitch

Altamirano Sanchez, Efrain; Vaglio Pret, Alessandro; Gronheid, Roel; Demand, Marc; Boullart, Werner (2011)

Spacer self aligned double patterning: process control

Vandeweyer, Tom; Altamirano Sanchez, Efrain; Vangoidsenhoven, Diziana; Murdoch, Gayle; Groenendijk, Remco; Hepp, Birgitt; Mos, Evert; Finders, Jo; Vleeming, Bert; Dusa, Mircea; Maenhoudt, Mireille (2009)

Towards the understanding of CH3F/O2 chemistry

Altamirano Sanchez, Efrain; Kunnen, Eddy; Boullart, Werner (2007)

Wafer bevel protection during deep reactive ion etching

Charavel, Remy; Gassot, Pierre; de Backer, E.; Altamirano Sanchez, Efrain; Van Aelst, Joke; Devriendt, Katia; Van Wichelen, Koen (2010)