Browsing by Author "Constantoudis, Vassilios"
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Publication Challenges in LER/CDU metrology in DSA: placement error and cross-line correlations
Proceedings paper2016, Metrology, Inspection, and Process Control for Microlithography XXX, 20/02/2016, p.97781XPublication Challenges in line edge roughness metrology in directed self-assembly lithography: placement errors and cross-line correlations
Journal article2017, Journal of Micro/Nanolithography MEMS and MOEMS, (16) 2, p.24001Publication Computational nanometrology of line edge roughness: recent challenges and advances
Proceedings paper2017, EMLC2017, 27/06/2017Publication Computational nanometrology of line edge roughness: recent challenges and advances
Oral presentation2017, 43rd International Conference on Micro and Nanoengineering - MNEPublication Computational nanometrology of line-edge roughness: noise effectd, cross-line correlations and the role of etch transfer
Proceedings paper2018, Advanced Etch Technology for Nanopatterning VII, 25/02/2018, p.105890YPublication Contact edge roughness and CD uniformity in EUV: effect of photo acid generator and sensitizer
Publication Contact edge roughness: effects of dose and PAG concentration in EUV lithography
Publication Contact-edge roughness (CER) characterization and modeling: effect of dose on CER and crtitical dimension uniformity
Publication Critical dimension uniformity and contact edge roughness in extreme ultraviolet lithography: effect of photoacid generator, sensitizer and quencher
Publication Deep learning nanometrology of line edge roughness
Publication Exploration of a low-temperature PEALD technology to trim and smooth 193i photoresist
Proceedings paper2017, Advances in Patterning Materials and Processes XXXIV, 26/02/2017, p.101460KPublication Line width roughness accuracy analysis during pattern transfer in self-aligned quadruple patterning process
Proceedings paper2016, Metrology, Inspection, and Process Control for Microlithography XXX, 21/02/2016, p.97780VPublication Need for LWR metrology standardization: the imec roughness protocol
Journal article2018, Journal of Micro/Nanolithography MEMS and MOEMS, 17, p.41009Publication Roughness and variability in EUV lithography: Who is to blame? (Part 1)
Proceedings paper2013, Extreme Ultraviolet (EUV) Lithography IV, 24/02/2013, p.86792OPublication The need for LWR metrology standardization: the imec roughness protocol
Proceedings paper2018, Metrology, Inspection, and Process Control for Microlithography XXXII, 25/02/2018, p.105850D