Browsing by Author "Davydova, Natalia"
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Publication Actinic characterization and modeling of the EUV mask stack
Proceedings paper2013, 29th European Mask and Lithography Conference, 25/06/2013, p.88860BPublication Alternative EUV mask technology for mask 3D effect compensation
Proceedings paper2014, International Symposium on Extreme Ultraviolet Lithography - EUVL, 27/10/2014Publication Alternative EUV mask technology to compensate for mask 3D effects
Proceedings paper2015, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII, 20/04/2015, p.96580IPublication Critical pattern behavior at nanometer scale vicinity of black border
Oral presentation2019, 17th Fraunhofer IISB Lithography Simulation WorkshopPublication Deep ultraviolet out-of-band contribution in extreme ultraviolet lithography: predictions and experiments
Proceedings paper2011, Extreme Utltraviolet (EUV) Lithography II, 27/02/2011, p.79692OPublication Experimental validation of novel EUV mask technology to reduce mask 3D effects
Proceedings paper2015, 31st European Mask and Lithography Conference, 22/06/2015, p.966109Publication Experimental validation of novel mask technology to reduce mask 3D effects
Proceedings paper2015, Photomask Technology 2015, 29/09/2015, p.96350ZPublication Experimental verification of high-NA imaging simulations using SHARP
Publication Feasibility study of the approach to Flare, shadowing, optical and process corrections for EUVL OPC
Proceedings paper2009-09, Photomask Technology 2009, 14/09/2009, p.74882NPublication Fundamental understanding and experimental verification of bright versus dark field imaging
Publication Imaging impact of multilayer tuning in EUV masks, experimental validation
Proceedings paper2014, Photomask Technology 2014, BACUS, 16/09/2014, p.92350JPublication Impact of an etched EUV mask black border on imaging and overlay
Publication Impact of mask stack on high NA EUV imaging
Oral presentation2012, International Symposium on Extreme Ultraviolet Lithography - EUVLPublication Metal layer single EUV expose at pitch 28nm: how bright field and NTD resist advantages align
Proceedings paper2021, Conference on Extreme Ultraviolet (EUV) Lithography XII, FEB 22-26, 2021, p.116090RPublication Stitching enablement for anamorphic imaging: a ~1μm exclusion band and its implications
Proceedings paper2020, Extreme Ultraviolet Lithography 2020, 21/09/2020, p.1151713Publication Stitching for High NA: zooming in on CDU budget
Proceedings paper2023, International Conference on Extreme Ultraviolet Lithography, OCT 02-05, 2023, p.Art. 1275002Publication Tomorrow's pitches on today's 0.33 NA scanner: pupil and imaging conditions to print P24 L/S and P28 contact holes
Proceedings paper2020, Extreme Ultraviolet Lithography 2020, 21/09/2020, p.1151716Publication Understanding of Out-of-Band DUV light in EUV lithography: controlling impact on imaging and mitigation strategies
Proceedings paper2015, 31st European Mask and Lithography Conference, 22/06/2015, p.96610B