Browsing by Author "Fliervoet, Timon"
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Publication Actinic characterization and modeling of the EUV mask stack
Proceedings paper2013, 29th European Mask and Lithography Conference, 25/06/2013, p.88860BPublication Alternative EUV mask technology for mask 3D effect compensation
Proceedings paper2014, International Symposium on Extreme Ultraviolet Lithography - EUVL, 27/10/2014Publication Alternative EUV mask technology to compensate for mask 3D effects
Proceedings paper2015, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII, 20/04/2015, p.96580IPublication Assist features: placement, impact and relevance
Proceedings paper2016, Extreme Ultraviolet (EUV) Lithography VII, 21/02/2016, p.97761SPublication Dense lines created by spacer DPT scheme: process control by local dose adjustment using advanced scanner control
Proceedings paper2009, Optical Microlithography XXII, 23/02/2009, p.72740RPublication Experimental validation of novel EUV mask technology to reduce mask 3D effects
Proceedings paper2015, 31st European Mask and Lithography Conference, 22/06/2015, p.966109Publication Experimental validation of novel mask technology to reduce mask 3D effects
Proceedings paper2015, Photomask Technology 2015, 29/09/2015, p.96350ZPublication Experimental verification of high-NA imaging simulations using SHARP
Publication Fundamental understanding and experimental verification of bright versus dark field imaging
Publication Impact of mask stack on high NA EUV imaging
Oral presentation2012, International Symposium on Extreme Ultraviolet Lithography - EUVLPublication Influence of etch process on contact hole local critical dimension uniformity in extreme-ultraviolet lithography
Proceedings paper2015, Advances in Patterning Materials and Processes XXXII, 22/02/2015, p.94250KPublication LENS - Lithography enhancement towards nano scale
Oral presentation2010, European Nanoelectronics ForumPublication Mask 3D effect mitigation by source optimization and assist feature placement
Proceedings paper2016, International Symposium on Extreme Ultraviolet Lithography - EUVL, 24/10/2016Publication NXE:3300 insertion for N7 : status and challenges
Proceedings paper2015, International Symposium on Extreme Ultraviolet Lithography - EUVL, 5/10/2015Publication Single exposure EUV patterning for BEOL metal layers on the imec iN7 platform
Proceedings paper2017, Extreme Ultraviolet (EUV) Lithography VIII, 26/02/2017, p.1014318