Browsing by Author "Gronheid, Roel"
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Publication 157-nm photoresist process optimization for a full-field scanner
Proceedings paper2004-03, Optical Microlithography XVII, 22/02/2004, p.1658-1668Publication 157nm resist process performance and integration challenges on a full field scanner
Journal article2004, Journal of Photopolymer Science and Technology, (17) 4, p.655-674Publication 28nm pitch of line/space pattern transfer into silicon substrates with chemo-epitaxy directed self-assembly (DSA) process flow
Oral presentation2013, 39th International Conference on Micro and Nano Engineering - MNEPublication 2D and 3D photoresist line roughness characterization
Journal article2013, Microelectronic Engineering, 110, p.100-107Publication 2D and 3D photoresist line roughness characterization
Oral presentation2012, 38th International Micro & Nano Engineering Conference - MNEPublication A comparison of positive- and negative tone contact hole process flows using the IMEC NXE 3100
Proceedings paper2012, International Symposium on Extreme Ultraviolet Lithography - EUVL, 30/09/2012Publication A novel method for characterizing resist performance
Proceedings paper2007, Advances in Resist Materials and Processing Technology XXIV, 25/02/2007, p.65190VPublication A novel method for characterizing resist performance
Journal article2008, Journal of Micro/Nanolithography, MEMS, and MOEMS, (7) 2, p.23002Publication Addressing the challenges of Directed Self Assembly implementation
Proceedings paper2011, International Symposium on Lithography Extensions, 20/10/2011Publication Advanced lithography materials as key scaling enablers
Proceedings paper2014, 27th International Microprocesses and Nanotechnology Conference - MNC, 4/11/2014, p.7A-8-2Publication Advanced optical lithography: double patterning options for 32 and 22nm node
Oral presentation2009, 2nd International Workshop on Plasma Etch and Strip in Microelectronics - PESMPublication Advances and challenges in dual-tone development process optimization
Proceedings paper2009, Optical Microlithography XXII, 22/02/2009, p.72740IPublication Advances in dual-tone development for pitch frequency doubling
Proceedings paper2010, Optical Microlithography XXIII, 21/02/2010, p.76400EPublication Advances in process optimization for dual-tone development as a double patterning technique
Proceedings paper2008, 5th International Symposium on Immersion Lithography Extensions, 22/09/2008Publication All track directed self-assembly of block copolymers: process flow and origin of defects
Proceedings paper2012, Alternative Lithographic Technologies IV, 12/02/2012, p.83230DPublication Alternative process schemes for double patterning that eliminate the intermediate etch step
Proceedings paper2008, Optical Microlithography XXI, 24/02/2008, p.69240PPublication Analysis of the effect of point-of-use filtration on microbridging defectivity
Proceedings paper2009, Advances in Resist Materials and Processing Technology XXVI, 22/02/2009, p.72730SPublication Assessment of challenges in EUV resist outgassing and contamination characterization
Journal article2012, Journal of Photopolymer Science and Technology, (25) 5, p.609-616Publication Assessment of resist outgassing related EUV optics contamination for CAR and non-CAR material chemistries
Proceedings paper2011, Advances in Resist Materials and Processing Technology XXVIII, 27/02/2011, p.797208Publication Calibration and application of a DSA Compact model for grapho-epitaxy hole processes using contour-based metrology