Browsing by Author "Haukka, S."

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Carter, Richard

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Caymax, Matty

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Oral presentation

2001, International Forum on Semiconductor Technology - IFST; 7-8 March 2001; Antwerpen, Belgium.

Publication

Atomic layer deposition of hafnium silicate from HfCl4, SiCl4, and H2O

Fedorenko, Yanina

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Swerts, Johan

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Maes, Jan

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Tois, E.

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Haukka, S.

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Wang, C.G

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Wilk, G.

Journal article

2007, Electrochemical and Solid-State Letters, (10) 5, p.H149-H152

Publication

Characterisation of AlCVD Al2O3-ZrO2 nanolaminates, link between electrical and structural properties

Besling, Wim

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Young, Edward

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Zhao, Chao

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Carter, Richard

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Vandervorst, Wilfried

Journal article

2002, Journal of Non-Crystalline Solids, (303) 1, p.123-133

Publication

Characterization of ALCVD Al2O3-ZrO2 nanolaminates, link between electrical and structural properties

Besling, Wim

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Young, Edward

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Zhao, Chao

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Vandervorst, Wilfried

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Caymax, Matty

Oral presentation

2001, Symposium Q of the E-MRS Spring Meeting 2001: High-k Gate Dielectrics; June 5-8, 2001; Strasbourg, France.

Publication

Crystallization behaviour of ZrO2/Al2O3-based high-k gate stacks

Zhao, Chao

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Houssa, Michel

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Carter, Richard

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Oral presentation

2001, Symposium Q of the E-MRS Spring Meeting 2001: High-k Gate Dielectrics; June 5-8, 2001; Strasbourg, France.

Publication

Enhancement of ALCVD(TM) TiN growth on Si-O-C and a-SiC:H films by O2-based plasma treatments

Satta, Alessandra

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Baklanov, Mikhaïl

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Vantomme, Andre

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Journal article

2002, Microelectronic Engineering, (60) 1_2, p.59-69

Publication

High k dielectric materials prepared by atomic layer CVD

Heyns, Marc

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Carter, Richard

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Caymax, Matty

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Oral presentation

2001, 12th INFOS Conference - Insulating Films on Semiconductors; June 2001; Udine, Italy.

Publication

In situ crystallisation in ZrO2 thin films during high temperature X-ray diffraction

Zhao, Chao

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Roebben, G.

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Young, Edward

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Haukka, S.

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Houssa, Michel

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Naili, Mohamed

Journal article

2001, Microelectronics Reliability, (41) 7, p.995-998

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Miscibility of amorphous ZrO2-Al2O3 binary alloy

Zhao, Chao

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Journal article

2002, Applied Physics Letters, (80) 13, p.2374-2376

Publication

MONA - merging optics and nanotechnologies: the nanophotonics technology roadmap

Fulbert, L.

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Baets, Roel

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Scavennec, A.

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Fotheringham, U.

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Beccard, R.

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Krastev, K.

Proceedings paper

2007-04, Proceedings of the European Conference on Integrated Optics - ECIO 7), 25/04/2007, p.paper nr WF1 (3

Publication

Properties of TiN thin films deposited by ALCVD as barriers for Cu metallization

Satta, Alessandra

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Beyer, Gerald

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Maex, Karen

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Elers, K.

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Haukka, S.

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Vantomme, Andre

Proceedings paper

2001, Materials, Technology, and Reliability for Advanced Interconnects and Low-k Dielectrics, 23/04/2000, p.D6.5.1-D6.5.6

Publication

Properties of TiN thin films deposited by ALCVD as barriers for Cu metallization

Satta, Alessandra

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Beyer, Gerald

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Maex, Karen

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Elers, K.

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Haukka, S.

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Vantomme, Andre

Oral presentation

2000, MRS Spring Meeting 2000. Symposium D: Materials, Technology, and Reliability for Advanced Interconnects and Low-k Dielectrics

Publication

Stabilization of amorphous structures in ALCVD high-k oxide layers

Zhao, Chao

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Young, Edward

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Carter, Richard

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Tsai, Wilman

Oral presentation

2001, IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on

Publication

Thermostability of amorphous zirconium aluminate high-K layers

Zhao, Chao

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Young, Edward

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Roebben, G.

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Haukka, S.

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