Browsing by Author "Hurd, Trace"
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Publication Advanced ULSI applications: dilute HCl and SC1
Hurd, TraceProceedings paper1995, Proceedings of SEMICON/West 1995 Technical Seminar: Cleaning Technology for the Submicron Era, 11/07/1995, p.69-74Publication Chemistry of the silicon oxide surface: adsorption from SC1 solutions
Oral presentation1998, 4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSSPublication Chemistry of the silicon oxide surface: adsorption from SC1 solutions
Proceedings paper1999, Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon, 21/09/1998, p.53-58Publication Cleaning of metal contamination
Proceedings paper1994, Contamination Control and Defect Reduction in Semiconductor Manufacturing III, 23/05/1994, p.241-252Publication Cleaning technology for highly reliable gate oxides
Proceedings paper1994, Proceedings of the International Conference on Advanced Microelectronic Devices and Processing - AMDP, 03/03/1994, p.59-66Publication Comparison of HCl gas-phase cleaning with conventional and dilute wet chemistries
Proceedings paper1996, Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 9/10/1995, p.142-149Publication Development of an environmentally-friendly HCl gas-phase clean
Proceedings paper1995, Proceedings IES 41st Annual Technical Meeting, 30/04/1995, p.487-494Publication H2O2 decomposition and its impact on silicon surface roughening and gate oxide integrity
Journal article1995, Japanese Journal of Applied Physics. Part 1, (34) 2B, p.727-731Publication How clean is clean enough?
Proceedings paper1995, Proceedings of SEMICON/West 1995 Technical Seminar: Cleaning Technology for the Submicron Era, 11/07/1995, p.7Publication Impact of Fe and Cu contamination on the minority carrier lifetime of silicon substrates
Journal article1996, Journal of the Electrochemical Society, (143) 9, p.3014-3019Publication Impact of the electrochemical properties of silicon wafer surfaces on copper outplating from HF solutions
Proceedings paper1996, Proceedings of the Fourth International Symposium on Cleaning technology in Semiconductor Device Manufacturing, 9/10/1995, p.284-291Publication Just-Clean- Enough technology for the 21st century
Oral presentation1995, SEMICON EuropePublication Limitations of minority carrier lifetime as a parameter for evaluating iron contamination in silicon
Meeting abstract1994, 186th Electrochemical Society Fall Meeting: Symposium on High Purity Silicon III, 9/10/1994, p.625Publication Metal interactions with silica (SiO2) surfaces: adsorption and ion exchange
Proceedings paper1996, Proceedings of the Fourth International Symposium on Cleaning technology in Semiconductor Device Manufacturing, 9/10/1995, p.277-283Publication Metal removal without particle addition: optimization of the dilute HCl clean
Proceedings paper1994, Proceedings of the 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 19/09/1994, p.41-45Publication New drying techology for advanced cleaning in IC manufacturing
Proceedings paper1994, Vacuum and Semiconductor Processing Conference, 15/06/1994Publication Outplating of metallic contaminants on silicon wafers from diluted acid solutions
Proceedings paper1995, Ultraclean Semiconductor Processing Technology and Surface Chemical Cleaning and Passivation, 17/04/1995, p.183-188Publication Physico chemical aspects of hydrogen peroxide based silicon wafer cleaning solutions
Proceedings paper1994, Proceedings of the 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 19/09/1994, p.259-266Publication Recombination activity of iron-related complexes in silicon studied with microwave and light-induced absorption techniques
Proceedings paper1994, Proceedings of the 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 19/09/1994, p.197-200Publication The dilute HCl integrated pre-gate clean