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Browsing by Author "Ji, Z."

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    A single device based Voltage Step Stress (VSS) technique for fast reliability screening

    Ji, Z.
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    Zhang, J. F.
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    Zhang, W. D.
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    Zhang, X.
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    Kaczer, Ben  
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    De Gendt, Stefan  
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    Groeseneken, Guido  
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    Ren, P.
    Proceedings paper
    2014, International Reliability Physics Symposium - IRPS, 1/06/2014, p.GD.2
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    A test-proven As-grown-Generation (A-G) model for predicting NBTI under use-bias

    Ji, Z.
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    Zhang, J.F.
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    Lin, L.
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    Duan, M.
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    Zhang, W.
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    Zhang, X.
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    Gao, R.
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    Kaczer, Ben  
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    Franco, Jacopo  
    Proceedings paper
    2015, VLSI Technology Symposium, 15/06/2015, p.T36-T37
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    AC NBTI of Ge pMOSFETs: impact of energy alternating defects on lifetime prediction

    Ma, J.
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    Zhang, W.
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    Zhang, J.F.
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    Ji, Z.
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    Benbakhti, B.
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    Franco, Jacopo  
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    Mitard, Jerome  
    Proceedings paper
    2015, IEEE Symposium on VLSI Technology, 15/06/2015, p.T34-T35
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    An assessment of the mobility degradation induced by remote charge scattering

    Ji, Z.
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    Zhang, J.F.
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    Zhang, W.
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    Groeseneken, Guido  
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    Pantisano, Luigi
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    De Gendt, Stefan  
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    Heyns, Marc  
    Journal article
    2009, Applied Physics Letters, (95) 26, p.263502
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    An investigation of field reduction effect on NBTI parameter characterization and lifetime prediction using a constant field stress method

    Zhou, L.
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    Bo, T.
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    Ji, Z.
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    Yang, H.
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    Xu, H.
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    Liu, Q.
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    Simoen, Eddy  
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    Wang, X.
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    Ma, X.
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    Li, Y.
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    Yin, H.
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    Du, A.
    Journal article
    2020, IEEE Transactions on Device and Materials Reliability, (20) 1, p.92-96
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    Defect loss: a new concept for reliability of MOSFETs

    Duan, M.
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    Zhang, J. F.
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    Ji, Z.
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    Zhang, W.
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    Kaczer, Ben  
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    De Gendt, Stefan  
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    Groeseneken, Guido  
    Journal article
    2012, IEEE Electron Device Letters, (33) 4, p.480-482
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    Development of a technique for characterizing bias temperature unstability-induced device-to-device variation at SRAM-relevant conditions

    Duan, M.
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    Zhang, J. F.
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    Ji, Z.
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    Zhang, W. D.
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    Kaczer, Ben  
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    Schram, Tom  
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    Ritzenthaler, Romain  
    Journal article
    2014, IEEE Transactions on Electron Devices, (61) 9, p.3081-3089
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    Dominant layer for stress-induced positive charges in Hf-based gate stacks

    Zhang, Jian F.
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    Chang, M.H.
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    Ji, Z.
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    Lin, L.
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    Ferain, Isabelle
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    Groeseneken, Guido  
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    Pantisano, Luigi
    Journal article
    2008, IEEE Electron Device Letters, (29) 12, p.1360-1363
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    Energy distribution of positive charges in high-k dielectric

    Hatta, S. W. M.
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    Ji, Z.
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    Zhang, J. F.
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    Zhang, W.D.
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    Soin, N.
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    Kaczer, Ben  
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    De Gendt, Stefan  
    Journal article
    2014, Microelectronics Reliability, (54) 9_10, p.2329-2333
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    Hot carrier aging and its variation under use-bias: kinetics, prediction, impact on Vdd and SRAM

    Duan, M.
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    Zhang, J. F.
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    Manut, A.
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    Ji, Z.
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    Zhang, W.
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    Asenov, A.
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    Gerrer, L.
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    Reid, D.
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    Razaidi, H.
    Proceedings paper
    2015, IEEE International Electron Devices Meeting - IEDM, 7/12/2015, p.547-550
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    Identify the critical regions and switching/failure mechanisms in non-filamentary RRAM ( a-VMCO) by RTN and CVS techniques for memory window improvement

    Ma, Jigang
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    Chai, Zheng
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    Zhang, Weidong
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    Govoreanu, Bogdan  
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    Zhang, Jiang F.
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    Ji, Z.
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    Benbakhti, B.
    Proceedings paper
    2016, IEEE International Electron Devices Meeting - IEDM, 3/12/2016, p.564-567
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    Insights into the effect of TiN thickness scaling on DC and AC NBTI characteristics in replacement metal gate pMOSFETs

    Zhou, L.
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    Liu, Q.
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    Yang, H.
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    Ji, Z.
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    Xu, H.
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    Tang, B.
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    Simoen, Eddy  
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    Jiang, H.
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    Luo, Y.
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    Wang, X.
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    Ma, X.
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    Li, Y.
    Journal article
    2020, IEEE Transactions on Device and Materials Reliability, (20) 3, p.498-505
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    Interaction between hot carrier aging and PBTI degradation in nMOSFETs: characterization, modelling and lifetime prediction

    Meng, D.
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    Zhang, J. F.
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    Zhang, J. C.
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    Zhang, W.
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    Ji, Z.
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    Benbakhti, B.
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    Zheng, X. F.
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    Hao, Y.
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    Vigar, D.
    Proceedings paper
    2017, IEEE International Reliability Physics Symposium - IRPS, 2/04/2017, p.XT-5.1-XT-5.7
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    Interface states beyond band gap and their impact on charge carrier mobility in MOSFETs

    Ji, Z.
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    Zhang, J. F.
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    Zhang, W. D.
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    Kaczer, Ben  
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    De Gendt, Stefan  
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    Groeseneken, Guido  
    Journal article
    2012, IEEE Transactions on Electron Devices, (59) 3, p.783-790
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    Investigation of preexisting and generated defects in nonfilamentary a-Si/TiO2 RRAM and their impacts on RTN amplitude distribution

    Ma, Jigang
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    Chai, Zheng
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    Zhang, Wei Dong
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    Zhang, J. F.
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    Ji, Z.
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    Benbakhti, Brahim
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    Govoreanu, Bogdan  
    Journal article
    2018, IEEE Transactions on Electron Devices, (65) 3, p.970-977
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    Key issues and techniques for characterizing time-dependent device-to-device variation of SRAM

    Duan, M.
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    Zhang, J. F.
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    Ji, Z.
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    Ma, J. G.
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    Zhang, W.
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    Kaczer, Ben  
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    Schram, Tom  
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    Ritzenthaler, Romain  
    Proceedings paper
    2013, International Electron Devices Meeting - IEDM, 9/12/2013, p.774-777
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    Negative bias temperature instability lifetime prediction: problems and solutions

    Ji, Z.
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    Hatta, S. F. W. M.
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    Zhang, J. F.
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    Ma, G. M.
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    Zhang, W.
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    Soin, N.
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    Kaczer, Ben  
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    De Gendt, Stefan  
    Proceedings paper
    2013, International Electron Devices Meeting - IEDM, 9/12/2013, p.413-416
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    New insights into defect loss, slowdown, and device lifetime enhancement

    Duan, M.
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    Zhang, J. F.
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    Ji, Z.
    ;
    Zhang, W. D.
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    Kaczer, Ben  
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    De Gendt, Stefan  
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    Groeseneken, Guido  
    Journal article
    2013, IEEE Transactions on Electron Devices, (60) 1, p.413-419
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    New insights into defect loss, slowdown, and device lifetime enhancement

    Duan, M.
    ;
    Zhang, J. F.
    ;
    Ji, Z.
    ;
    Zhang, W. D.
    ;
    Kaczer, Ben  
    ;
    De Gendt, Stefan  
    ;
    Groeseneken, Guido  
    Journal article
    2013, IEEE Transactions on Electron Devices, (60) 1, p.413-418
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    On the activation and passivation of precursors for process-induced positive charges in Hf-dielectric stacks

    Chang, M.H.
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    Zhao, C.Z.
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    Ji, Z.
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    Zhang, J.F.
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    Groeseneken, Guido  
    ;
    Pantisano, Luigi
    ;
    De Gendt, Stefan  
    Journal article
    2009, Journal of Applied Physics, (105) 5, p.54505
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