Browsing by Author "Ji, Z."
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Publication A single device based Voltage Step Stress (VSS) technique for fast reliability screening
;Ji, Z. ;Zhang, J. F. ;Zhang, W. D. ;Zhang, X.; ; ; Ren, P.Proceedings paper2014, International Reliability Physics Symposium - IRPS, 1/06/2014, p.GD.2Publication A test-proven As-grown-Generation (A-G) model for predicting NBTI under use-bias
Proceedings paper2015, VLSI Technology Symposium, 15/06/2015, p.T36-T37Publication AC NBTI of Ge pMOSFETs: impact of energy alternating defects on lifetime prediction
Proceedings paper2015, IEEE Symposium on VLSI Technology, 15/06/2015, p.T34-T35Publication An assessment of the mobility degradation induced by remote charge scattering
;Ji, Z. ;Zhang, J.F. ;Zhang, W.; ;Pantisano, Luigi; Journal article2009, Applied Physics Letters, (95) 26, p.263502Publication An investigation of field reduction effect on NBTI parameter characterization and lifetime prediction using a constant field stress method
;Zhou, L. ;Bo, T. ;Ji, Z. ;Yang, H. ;Xu, H. ;Liu, Q.; ;Wang, X. ;Ma, X. ;Li, Y. ;Yin, H.Du, A.Journal article2020, IEEE Transactions on Device and Materials Reliability, (20) 1, p.92-96Publication Defect loss: a new concept for reliability of MOSFETs
Journal article2012, IEEE Electron Device Letters, (33) 4, p.480-482Publication Development of a technique for characterizing bias temperature unstability-induced device-to-device variation at SRAM-relevant conditions
Journal article2014, IEEE Transactions on Electron Devices, (61) 9, p.3081-3089Publication Dominant layer for stress-induced positive charges in Hf-based gate stacks
;Zhang, Jian F. ;Chang, M.H. ;Ji, Z. ;Lin, L. ;Ferain, Isabelle; Pantisano, LuigiJournal article2008, IEEE Electron Device Letters, (29) 12, p.1360-1363Publication Energy distribution of positive charges in high-k dielectric
Journal article2014, Microelectronics Reliability, (54) 9_10, p.2329-2333Publication Hot carrier aging and its variation under use-bias: kinetics, prediction, impact on Vdd and SRAM
;Duan, M. ;Zhang, J. F. ;Manut, A. ;Ji, Z. ;Zhang, W. ;Asenov, A. ;Gerrer, L. ;Reid, D.Razaidi, H.Proceedings paper2015, IEEE International Electron Devices Meeting - IEDM, 7/12/2015, p.547-550Publication Identify the critical regions and switching/failure mechanisms in non-filamentary RRAM ( a-VMCO) by RTN and CVS techniques for memory window improvement
Proceedings paper2016, IEEE International Electron Devices Meeting - IEDM, 3/12/2016, p.564-567Publication Insights into the effect of TiN thickness scaling on DC and AC NBTI characteristics in replacement metal gate pMOSFETs
;Zhou, L. ;Liu, Q. ;Yang, H. ;Ji, Z. ;Xu, H. ;Tang, B.; ;Jiang, H. ;Luo, Y. ;Wang, X. ;Ma, X.Li, Y.Journal article2020, IEEE Transactions on Device and Materials Reliability, (20) 3, p.498-505Publication Interaction between hot carrier aging and PBTI degradation in nMOSFETs: characterization, modelling and lifetime prediction
;Meng, D. ;Zhang, J. F. ;Zhang, J. C. ;Zhang, W. ;Ji, Z. ;Benbakhti, B. ;Zheng, X. F. ;Hao, Y.Vigar, D.Proceedings paper2017, IEEE International Reliability Physics Symposium - IRPS, 2/04/2017, p.XT-5.1-XT-5.7Publication Interface states beyond band gap and their impact on charge carrier mobility in MOSFETs
Journal article2012, IEEE Transactions on Electron Devices, (59) 3, p.783-790Publication Investigation of preexisting and generated defects in nonfilamentary a-Si/TiO2 RRAM and their impacts on RTN amplitude distribution
;Ma, Jigang ;Chai, Zheng ;Zhang, Wei Dong ;Zhang, J. F. ;Ji, Z. ;Benbakhti, BrahimJournal article2018, IEEE Transactions on Electron Devices, (65) 3, p.970-977Publication Key issues and techniques for characterizing time-dependent device-to-device variation of SRAM
;Duan, M. ;Zhang, J. F. ;Ji, Z. ;Ma, J. G. ;Zhang, W.; ; Proceedings paper2013, International Electron Devices Meeting - IEDM, 9/12/2013, p.774-777Publication Negative bias temperature instability lifetime prediction: problems and solutions
;Ji, Z. ;Hatta, S. F. W. M. ;Zhang, J. F. ;Ma, G. M. ;Zhang, W. ;Soin, N.; Proceedings paper2013, International Electron Devices Meeting - IEDM, 9/12/2013, p.413-416Publication New insights into defect loss, slowdown, and device lifetime enhancement
Journal article2013, IEEE Transactions on Electron Devices, (60) 1, p.413-419Publication New insights into defect loss, slowdown, and device lifetime enhancement
Journal article2013, IEEE Transactions on Electron Devices, (60) 1, p.413-418Publication On the activation and passivation of precursors for process-induced positive charges in Hf-dielectric stacks
;Chang, M.H. ;Zhao, C.Z. ;Ji, Z. ;Zhang, J.F.; ;Pantisano, LuigiJournal article2009, Journal of Applied Physics, (105) 5, p.54505