Browsing by Author "Kmieciak, Malgorzata"
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Publication CMOS integration of dual work function phase controlled Ni FUSI with simultaneous integration of nMOS (NiSi) and pMOS (Ni-rich silicide) gates on HfSiON
Proceedings paper2005-12, Technical Digest International Electron Devices Meeting - IEDM, 5/12/2005, p.661-664Publication Dopant profiling in NixSi1-x gates with SIMS
Proceedings paper2005, USJ - The 8th Int. Workshop on the Fabrication, Characterization and Modeling of Ultra Shallow Junctions in Semiconductors, 5/06/2005Publication Influence of activation annealing and silicidation process on dopant redistribution and pile-up at the NixSiy/SiO2 interface
Proceedings paper2005-05, Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment, 16/05/2005, p.241-248Publication Investigation of Ni fully silicided gates for sub-45 nm CMOS technologies
Journal article2004-08, Microelectronic Engineering, 76, p.349-353Publication Materials issues of Ni fully silicided (FUSI) gates for CMOS applications
Proceedings paper2005-05, Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment, 16/05/2005, p.225-232Publication Mechanisms of arsenic segregation to the Ni2Si/SiO2 interface during Ni2Si formation
Journal article2005, Applied Physics Letters, (87) 18, p.181910-1-181910-3Publication Ni fully silicided gates for 45 nm CMOS applications
Journal article2005-08, Microelectronic Engineering, 82, p.441-448Publication Ni-based silicides for 45 nm CMOS and beyond
Journal article2004, Materials Science and Engineering B, 114-115, p.29-41Publication Scalability of Ni FUSI gate processes: phase and Vt control to 30 nm gate lengths
Proceedings paper2005, Symposium on VLSI Technology. Digest of Technical Papers, 12/06/2005, p.72-73Publication Silicides for advanced CMOS devices
Proceedings paper2005, Microscopy of Semiconducting Materials. Proceedings of the 14th Conference, 11/04/2005, p.379-388