Browsing by Author "Kocsis, Michael"
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Publication A methodology for the characterization of topography induced immersion bubble defects
Proceedings paper2005, Optical Microlithography XVIII, 27/02/2005, p.154-163Publication Advanced wafer surface cleaning technology
Oral presentation2004, SEMICON Korea 2004 STS, S5: Contamination-free Manufacturing SeminarPublication Characterizing and modeling electrical response to light for metal based EUV photoresists
Proceedings paper2016, Advances in Patterning Materials and Processes XXXIII, 21/02/2016, p.977906Publication Compact 2D OPC modeling of a metal oxide EUV resist for a 7nm node BEOL layer
Proceedings paper2017, Extreme Ultraviolet (EUV) Lithography VIII, 26/02/2017, p.101431EPublication Continued Optimization of Point-Of-Use Filtration for Metal Oxide Photoresists to Reduce Defect Density
Proceedings paper2023, Conference on Advances in Patterning Materials and Processes XL, FEB 27-MAR 01, 2023, p.Art. 124980APublication Demonstration of an N7 integrated fab process for metal oxide EUV photoresist
Proceedings paper2016, Extreme Ultraviolet (EUV) Lithography VII, 21/02/2016, p.97760BPublication Experimental investigation of fabrication process-, transportation-, storage, and handling-induced contamination of 157-nm reticles and vacuum-UV cleaning
Proceedings paper2004, Optical Microlithography XVII, 22/02/2004, p.487-503Publication Hard pellicle investigation for 157 nm lithography: impact on overlay
Proceedings paper2004, 20th European Mask Conference on Mask Technology for Integrated Circuits and Microcomponents, 12/01/2004, p.1-11Publication Initial assessment of the impact of a hard pellicle on imaging using a 193 nm step-and-scan system
Journal article2004, Journal of Microlithography, Microfabrication and Microsystems, (3) 2, p.239-262Publication Initial assessment of the impact of the use of a hard pellicle on imaging
Proceedings paper2003, 4th International Symposium on 157nm Lithography, 25/08/2003Publication Initial assessment of the lithographic impact of the use of a hard pellicle on wafer distortion
Proceedings paper2004, Optical Microlithography XVII, 22/02/2004, p.1679-1688Publication Initial assessment of the lithographic impact of the use of hard pellicles : an overview
Proceedings paper2004, Optical Microlithography XVII, 22/02/2004, p.116-123Publication Innovative metrology for wafer edge defectivity in immersion lithography
Proceedings paper2007, Metrology, Inspection and Process Control for Microlithography XXI, 25/02/2007, p.65180TPublication Integrated fab process for metal oxide EUV photoresist
Proceedings paper2015, Advances in Patterning Materials and Processes XXXII, 22/02/2015, p.94250SPublication Measurement and evaluation of water uptake by resists, top coats and stacks and correlation with watermark defects
Proceedings paper2007, Advances in Resist Materials and Processing Technology XXIV, 25/02/2007, p.65190EPublication Metal oxide EUV photoresist performance for N7 relevant patterns and processes
Proceedings paper2016, Advances in Patterning Materials and Processes XXXIII, 21/02/2016, p.977904Publication Optical path and image performane monitoring of a full-field 157-nm scanner
Proceedings paper2004, Optical Microlithography XVII, 22/02/2004, p.91-98Publication Studies of the defectivity formation mechanismes between the top coats and the resists in immersion lithography
Proceedings paper2005, 2nd International Symposium on Immersion Lithography, 12/09/2005Publication The importance of dynamic contact angles in immersion lithography and how to measure them
Oral presentation2005, 2nd International Symposium on Immersion Lithography