Browsing by Author "Meersschaut, Johan"
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Publication A new method for the determination of surface chemistry of structured surfaces at the microscale using RBS in a tomographic mode
Oral presentation2020, UKNIBC Virtual Users Meeting 2020Publication A scheme to correct for inaccuracies in the compositional analysis of SixGe1-x by Atom Probe Tomography
Journal article2021, Microscopy and Microanalysis, (27) S1, p.178-179Publication A study of blister formation in ALD Al2O3 grown on silicon
; ; ; ; Tanaku, ShujiProceedings paper2012, 38th IEEE Photovoltaic Specialists Conference - PVSC, 3/06/2012, p.1135-1138Publication A Study of SiCN Wafer-to-Wafer Bonding and Impact of Wafer Warpage
; ; ; ; Publication Advanced mass discrimination in recoil spectrometry
Oral presentation2016, European Conference on Accelerators in Applied Research and Technology - ECAARTPublication Advanced metrology for beyond silicon semiconductor device structures
Proceedings paper2015, Frontiers of Characterization and Metrology for Nanoelectronics - FCMN, 14/04/2015, p.220-223Publication Advances in metrology for complex epitaxial systems embedded in small volums
Meeting abstract2015-05, 9th International Conference on Silicon Epitaxy and Heterostructures - ICSI9, 18/05/2015, p.133-134Publication Al2O3/InGaAs metal-oxide-semiconductor interface properties: impact of Gd2O3 and Sc2O3 interfacial layers by atomic layer deposition
Journal article2014, ECS Journal of Solid State Science and Technology, (3) 11, p.N133-N144Publication ALD barrier deposition on porous low-k dielectric materials for interconnects
Proceedings paper2011-10, Atomic Layer Deposition Applications 7, 9/10/2011, p.25-32Publication Alternative high-k dielectrics for semiconductor applications
Oral presentation2008, 15th Workshop on Dielectrics in Microelectronics - WODIMPublication Alternative high-k dielectrics for semiconductor applications
Journal article2009, Journal of Vacuum Science and Technology B, (27) 1, p.209-213Publication Area-Selective Atomic Layer Deposition of Ru Using Carbonyl-Based Precursor and Oxygen Co-Reactant: Understanding Defect Formation Mechanisms
Journal article2024, NANOMATERIALS, (14) 14, p.Art. 1212Publication Atomic layer deposition of 2D transition metal dichalogenides
Proceedings paper2015-10, International Workshop 'Atomic Layer Deposition: Russia 2015', 21/09/2015, p.16-17Publication Atomic layer deposition of Gd2O3 and Sc2O3 on In0.53Ga0.47As: Interfacial layer engineering
Meeting abstract2014, 12th International Baltic Conference on Atomic Layer Deposition, 12/05/2014Publication Atomic layer deposition of nitrogen doped Al-phosphate coatings for Li-ion battery applications
Journal article2020, ACS Applied Materials & Interfaces, (12) 23, p.25949-25960Publication Atomic layer deposition of Ru thin films using the zero-valence precursor EBECH Ru
Oral presentation2014, 1st Belux Workshop on Coating, Materials, Surfaces and InterfacesPublication Atomic layer deposition of ruthenium thin films from (ethylbenzyl) (1-ethyl-1,4-cyclohexadienyl) Ru: process characteristics, surface chemistry, and film properties
Journal article2017, Chemistry of Materials, (29) 11, p.4654-4666Publication Atomic layer deposition of TiO2 on surface modified nanoporous low-k films
Journal article2013, Langmuir, (29) 39, p.12284-12289Publication BEOLC compatiblehigh tunnel magneto resistance perpendicula magnetic tunnel junctions using a sacrificial Mg layer as CoFeB free layer cap
Journal article2015, Applied Physics Letters, (106) 26, p.262407Publication Calibration of PIXE yields using binary thin films on Si
Journal article2014, Nuclear Instruments and Methods in Physics Research B, 331, p.65-68