Browsing by Author "Meersschaut, Johan"
- Results per page
- Sort Options
Publication 3D-DRAM Si/SiGe superlattices: inspection strategies and evaluation
Proceedings paper2025, 2025 Conference on Metrology Inspection and Process Control-Annual, 2025-02-24, p.1342612-1Publication A new method for the determination of surface chemistry of structured surfaces at the microscale using RBS in a tomographic mode
Oral presentation2020, UKNIBC Virtual Users Meeting 2020Publication A scheme to correct for inaccuracies in the compositional analysis of SixGe1-x by Atom Probe Tomography
Journal article2021, Microscopy and Microanalysis, (27) S1, p.178-179Publication A study of blister formation in ALD Al2O3 grown on silicon
; ; ; ; Tanaku, ShujiProceedings paper2012, 38th IEEE Photovoltaic Specialists Conference - PVSC, 3/06/2012, p.1135-1138Publication A Study of SiCN Wafer-to-Wafer Bonding and Impact of Wafer Warpage
; ; ; ; Publication Advanced mass discrimination in recoil spectrometry
Oral presentation2016, European Conference on Accelerators in Applied Research and Technology - ECAARTPublication Advanced metrology for beyond silicon semiconductor device structures
Proceedings paper2015, Frontiers of Characterization and Metrology for Nanoelectronics - FCMN, 14/04/2015, p.220-223Publication Advances in metrology for complex epitaxial systems embedded in small volums
Meeting abstract2015-05, 9th International Conference on Silicon Epitaxy and Heterostructures - ICSI9, 18/05/2015, p.133-134Publication Al2O3/InGaAs metal-oxide-semiconductor interface properties: impact of Gd2O3 and Sc2O3 interfacial layers by atomic layer deposition
Journal article2014, ECS Journal of Solid State Science and Technology, (3) 11, p.N133-N144Publication ALD barrier deposition on porous low-k dielectric materials for interconnects
Proceedings paper2011-10, Atomic Layer Deposition Applications 7, 9/10/2011, p.25-32Publication Alternative high-k dielectrics for semiconductor applications
Journal article2009, Journal of Vacuum Science and Technology B, (27) 1, p.209-213Publication Alternative high-k dielectrics for semiconductor applications
Oral presentation2008, 15th Workshop on Dielectrics in Microelectronics - WODIMPublication Area-Selective Atomic Layer Deposition of Ru Using Carbonyl-Based Precursor and Oxygen Co-Reactant: Understanding Defect Formation Mechanisms
Journal article2024, NANOMATERIALS, (14) 14, p.Art. 1212Publication Atomic layer deposition of 2D transition metal dichalogenides
Proceedings paper2015-10, International Workshop 'Atomic Layer Deposition: Russia 2015', 21/09/2015, p.16-17Publication Atomic layer deposition of aluminum phosphate layers using tris(dimethylamino)phosphine as P-precursor
Journal article2025-MAR, JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, (43) 2, p.022409Publication Atomic Layer Deposition of Boron-Containing Layers Using a Combined Trimethylborate- and Water-Based Plasma
Publication Atomic layer deposition of Gd2O3 and Sc2O3 on In0.53Ga0.47As: Interfacial layer engineering
Meeting abstract2014, 12th International Baltic Conference on Atomic Layer Deposition, 12/05/2014Publication Atomic Layer Deposition of Lithium Borate and Lithium Borophosphate for Lithium-Ion Batteries
Journal article2025, CHEMISTRY OF MATERIALS, (37) 2, p.687-696Publication Atomic layer deposition of nitrogen doped Al-phosphate coatings for Li-ion battery applications
Journal article2020, ACS Applied Materials & Interfaces, (12) 23, p.25949-25960Publication Atomic layer deposition of Ru thin films using the zero-valence precursor EBECH Ru
Oral presentation2014, 1st Belux Workshop on Coating, Materials, Surfaces and Interfaces