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Browsing by Author "Nakajima, K."

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    Advanced characterization of high-K materials: a nuclear approach

    Brijs, Bert
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    Huyghebaert, Cedric  
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    Nauwelaerts, Sophie
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    Caymax, Matty  
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    Vandervorst, Wilfried  
    Journal article
    2002, Nuclear Instruments & Methods in Physics Research B, 190, p.505-509
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    Advanced RBS analysis of thin films in micro-electronics

    Brijs, Bert
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    Deleu, Jeroen
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    Huyghebaert, Cedric  
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    Nauwelaerts, Sophie
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    Nakajima, K.
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    Kimura, K.
    Proceedings paper
    2001, Application of Accelerators in Research and Industry: Sixteenth International Conference; Denton, TX, USA, 1-5 Nov 2000., p.470-475
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    Characterization of ultra thin layers by Rutherford backscattering spectrometry

    Brijs, Bert
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    Deleu, Jeroen
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    Conard, Thierry  
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    Li, H.
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    Loo, Roger  
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    Caymax, Matty  
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    Nakajima, K.
    Proceedings paper
    1999, Analytical and Diagnostic Techniques for Semiconductor Materials, Devices, and Processes, 16/09/1999, p.160-169
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    Characterization of ultra thin oxynitrides, a general approach

    Brijs, Bert
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    Deleu, Jeroen
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    Conard, Thierry  
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    De Witte, Hilde
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    Vandervorst, Wilfried  
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    Nakajima, K.
    Oral presentation
    1999, IBA-14-ECAART-6; July 1999; Dresden, Germany.
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    Characterization of ultra thin oxynitrides: a general approach

    Brijs, Bert
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    Deleu, Jeroen
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    Conard, Thierry  
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    De Witte, Hilde
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    Vandervorst, Wilfried  
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    Nakajima, K.
    Journal article
    2000, Nuclear Instruments and Methods B, 161-163, p.429-434
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    Cluster effect on projected range of 30 keV C60+ in silicon

    Morita, Y.
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    Nakajima, K.
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    Suzuki, M.
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    Saitoh, Y.
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    Vandervorst, Wilfried  
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    Kimura, K.
    Journal article
    2011, Nuclear Instruments and Methods in Physics Research B, (269) 19, p.2080-2083
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    Comparative growth kinetics of SiGe in a commercial reduced pressure chemical vapour deposition EPI reactor and anomalies during growth of thin Si layers on SiGe

    Caymax, Matty  
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    Loo, Roger  
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    Brijs, Bert
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    Vandervorst, Wilfried  
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    Howard, Dave
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    Kimura, K.
    Proceedings paper
    1998, Epitaxy and Applications of Si-Based Heterostructures, 13/04/1998, p.339-344
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    Does NIST database provide reliable effective attenuation lenght for XPS analysis

    Nakajima, K.
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    Kimura, Kenji
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    Conard, Thierry  
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    Vandervorst, Wilfried  
    Oral presentation
    2007, 6th International Symposium on Atomic Level Characterizations - ALC
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    EXLE-SIMS: dramatically enhanced accuracy for dose loss metrology

    Vandervorst, Wilfried  
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    Vos, Rita  
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    Salima, A.J.
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    Merkulov, A.
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    Nakajima, K.
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    Kimura, K.
    Proceedings paper
    2008, 17th International Conference in Ion Implantation Technology - IIT, 8/06/2008, p.109-112
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    Quantification and depth profiling of a ZrO2 (2nm)/A1203 (1nm) layer with NRA, RBS, HRBS, HERD

    Brijs, Bert
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    Huyghebaert, Cedric  
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    Nauwelaerts, Sophie
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    Caymax, Matty  
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    Vandervorst, Wilfried  
    Oral presentation
    2001, 15th International Conference on Ion Beam Analysis (IBA); July 2001; Cairns, Australia.
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    Recent developments in nuclear methods in support of semiconductor characterization

    Brijs, Bert
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    Bender, Hugo  
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    Huyghebaert, Cedric  
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    Janssens, Tom
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    Vandervorst, Wilfried  
    Proceedings paper
    2003, Analytical Techniques for Semiconductor Materials and Processes, 27/04/2003, p.50-62
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    Removal of small (<100-nm) particles and metal contamination in single-wafer cleaning tool

    Eitoku, Atsuro
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    Snow, Jim
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    Vos, Rita  
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    Sato, M.
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    Hirae, S.
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    Nakajima, K.
    ;
    Nonomura, M.
    ;
    Imai, M.
    Proceedings paper
    2003, Ultra Clean Processing of Silicon Surfaces 2002 - UCPSS, 16/09/2002, p.157-161

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