Browsing by Author "Nakajima, K."
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Publication Advanced characterization of high-K materials: a nuclear approach
Journal article2002, Nuclear Instruments & Methods in Physics Research B, 190, p.505-509Publication Advanced RBS analysis of thin films in micro-electronics
Proceedings paper2001, Application of Accelerators in Research and Industry: Sixteenth International Conference; Denton, TX, USA, 1-5 Nov 2000., p.470-475Publication Characterization of ultra thin layers by Rutherford backscattering spectrometry
Proceedings paper1999, Analytical and Diagnostic Techniques for Semiconductor Materials, Devices, and Processes, 16/09/1999, p.160-169Publication Characterization of ultra thin oxynitrides, a general approach
Oral presentation1999, IBA-14-ECAART-6; July 1999; Dresden, Germany.Publication Characterization of ultra thin oxynitrides: a general approach
Journal article2000, Nuclear Instruments and Methods B, 161-163, p.429-434Publication Cluster effect on projected range of 30 keV C60+ in silicon
Journal article2011, Nuclear Instruments and Methods in Physics Research B, (269) 19, p.2080-2083Publication Comparative growth kinetics of SiGe in a commercial reduced pressure chemical vapour deposition EPI reactor and anomalies during growth of thin Si layers on SiGe
Proceedings paper1998, Epitaxy and Applications of Si-Based Heterostructures, 13/04/1998, p.339-344Publication Does NIST database provide reliable effective attenuation lenght for XPS analysis
Oral presentation2007, 6th International Symposium on Atomic Level Characterizations - ALCPublication EXLE-SIMS: dramatically enhanced accuracy for dose loss metrology
Proceedings paper2008, 17th International Conference in Ion Implantation Technology - IIT, 8/06/2008, p.109-112Publication Quantification and depth profiling of a ZrO2 (2nm)/A1203 (1nm) layer with NRA, RBS, HRBS, HERD
Oral presentation2001, 15th International Conference on Ion Beam Analysis (IBA); July 2001; Cairns, Australia.Publication Recent developments in nuclear methods in support of semiconductor characterization
Proceedings paper2003, Analytical Techniques for Semiconductor Materials and Processes, 27/04/2003, p.50-62Publication Removal of small (<100-nm) particles and metal contamination in single-wafer cleaning tool
Proceedings paper2003, Ultra Clean Processing of Silicon Surfaces 2002 - UCPSS, 16/09/2002, p.157-161