Browsing by Author "Niroomand, Ardavan"
- Results Per Page
- Sort Options
Publication Assessment of EUV resist performance for sub-22nm hp lines and 26nm hp contacts on NXE3100
Oral presentation2012, International Symposium on Extreme Ultraviolet Lithography - EUVLPublication Design correction in extreme ultrviolet lithography
Journal article2010-10, Journal of Micro/Nanolithography MEMS and MOEMS, (9) 4, p.43001Publication EUV lithography program at IMEC
Proceedings paper2007, Emerging Lithographic Technologies XI, 27/02/2007, p.651709Publication EUV resist material performance, progress and process improvements at imec
Proceedings paper2010, International Symposium on Extreme Ultraviolet Lithography, 17/10/2010Publication EUV resist performance update on ADT and NXE:3100 scanner
Proceedings paper2011, International Symposium on Extreme Ultraviolet Lithography - EUVL, 17/10/2011Publication EUV resist process development for full field imaging
Oral presentation2007, International EUVL SymposiumPublication EUV resist process performance investigations on the NXE 3100 full field scanner
Journal article2012, Journal of Photopolymer Science and Technology, (25) 5, p.559-567Publication EUVL at IMEC: shadowing compensation and Flare mitigation
Journal article2007-11, Journal of Vacuum Science and Technology B, (25) 6Publication Feasibility of compensating for EUV field edge effects through OPC
Proceedings paper2014, Extreme Ultraviolet (EUV) Lithography V, 23/02/2014, p.90480TPublication Full chip correction of EUV design
Proceedings paper2010, Extreme Ultraviolet (EUV) Lithography, 21/02/2010, p.763615Publication Full field EUV lithography turning into reality at IMEC
Proceedings paper2007, Photomask Japan (PMJ) - Photomask and Next-Generation Lithography Mask Technology XIV, 17/04/2007, p.66070HPublication Full field EUV lithography: lessons learnt on EUV ADT imaging, EUV resist, and EUV reticles
Proceedings paper2008, SPIE Lithography Asia, 4/11/2008, p.714007Publication High-NA EUV mask pattern characterization using advanced mask CD-SEM metrology
Proceedings paper2024, 39th European Mask and Lithography Conference (EMLC), JUN 17-19, 2024, p.Art. 132730SPublication Imaging performance of the EUV alpha demo tool at IMEC
Proceedings paper2008, Emerging Lithographic Technologies XII, 24/02/2008, p.69210OPublication Implementing full field EUV lithography using the ADT
; ; ; ; Proceedings paper2008, International Symposium on Extreme Ultraviolet Lithography - EUVL, 28/09/2008Publication Progress in full field EUV lithography program at IMEC
Proceedings paper2007, International EUVL Sympsoium, 28/10/2007Publication Recent advancements in EUV resist materials and process performance
Journal article2011, Journal of Photopolymer Science and Technology, (24) 1, p.25-31Publication Resist process development for the EUV alpha demo tool at IMEC
Oral presentation2008, International Workshop on EUVLPublication Status of ArF lithography for the 130nm technology node
Proceedings paper2000, Optical Microlithography XIII, 1/03/2000, p.410Publication Status of EUV lithography at IMEC
Journal article2007, Journal of Photopolymer Science & Technology, (20) 3, p.383-292