Browsing by Author "Shickova, Adelina"

Achieving 9ps unloaded ring oscillator delay in FuSI/HfSiON with 0.8 nm EOT

Addressing key concerns for implementation of Ni FUSI into manufacturing for 45/32 nm CMOS

Bias temperature instability effects in devices with fully-silicided gate stacks, strained-Si and multiple-gate architectures

Comparison of interconnection network parameters for reconfigurable systems

Design style case study for computer nodes of a heterogeneous NoC platform

Dielectric quality and reliability of FUSI/HfSiON devices with process induced strain

NBTI reliability of Ni FUSI/HfSiON gates: effect of silicide phase

Negligible effect of process-induced strain on intrinsic NBTI behavior

Novel, effective and cost-efficient method of introducing fluorine into metal/Hf-based gate stack in MuGFET and planar SOI devices with significant BTI improvement

On the 1/f noise in pMOSFETs with embedded SiGe source/drain

On the low-frequency noise of pMOSFETs with embedded SiGe source/drain and fully silicided metal gate

Reliability issues in MuGFET nanodevices

Reliability of strained-Si devices with post-oxide-deposition strain introduction

Spatial division multiplexing: a novel approach for guaranteed throughput on NoCs

The role of nitrogen in HfSiON defect passivation

Trapping in 1nm EOT high-k / MG