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Browsing by Author "Tomczak, Yoann"

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    A Co/Ni-based perpendicular magnetic tunnel junction (p-MTJ) stack with improved reference layer for BEOL compatibility

    Tomczak, Yoann  
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    Lin, Tsann
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    Swerts, Johan  
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    Couet, Sebastien  
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    Mertens, Sofie  
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    Liu, Enlong
    Meeting abstract
    2016, MMM Intermag, 11/01/2016
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    Area selective atomic layer deposition: a bottom-up approach for patterning

    Delabie, Annelies  
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    Soethoudt, Job  
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    Tomczak, Yoann  
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    Briggs, Basoene  
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    Chan, BT  
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    Tokei, Zsolt  
    Meeting abstract
    2018, Materials for Advanced Metallization Conference - MAM, 18/03/2018, p.02K
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    Area-selective atomic layer deposition of TiN, TiO2, and HfO2 for advanced thin film patterning by delayed nucleation on plasma-treated amorphous carbon

    Stevens, Eric
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    Tomczak, Yoann  
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    Chan, BT  
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    Altamirano Sanchez, Efrain  
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    Parsons, Gregory
    Meeting abstract
    2018, 3rd Area Selective Deposition Workshop - ASD, 29/04/2018, p.24-24
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    Area-selective atomic layer deposition of TiN, TiO2, and HfO2 on Si3N4 in Sub-50 nanometer Si3N4/amorphous carbon structures

    Stevens, Eric
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    Tomczak, Yoann  
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    Chan, BT  
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    Altamirano Sanchez, Efrain  
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    Parsons, Gregory
    Meeting abstract
    2018, 18th International Conference on Atomic Layer Deposition-ALD. Featuring the 5th International Atomic Layer Etching Workshop, 29/07/2018, p.AS-TuM5
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    Area-selective atomic layer deposition of TiN, TiO2, and HfO2 on silicon ntride with inhibition on amorphous carbon

    Stevens, Eric
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    Tomczak, Yoann  
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    Chan, BT  
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    Altamirano Sanchez, Efrain  
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    Parsons, Gregory
    Journal article
    2018, Chemistry of Materials, (30) 10, p.3223-3232
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    Area-selective deposition on nanoscale metal/dielectric patterns by surface-dependent dimethylamino-trimethylsilane reaction

    Soethoudt, Job  
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    Tomczak, Yoann  
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    Delabie, Annelies  
    Meeting abstract
    2019, EuroCVD 2019 / Baltic ALD 2019, 24/06/2019
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    Assessing the prospects of atomic layer deposition for two-dimensional materials in microelectronic applications

    Groven, Benjamin  
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    Tomczak, Yoann  
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    Nalin Mehta, Ankit  
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    Bender, Hugo  
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    Zhang, Haodong
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    Schram, Tom  
    Meeting abstract
    2018, Material Science and Engineering Congress - MSE, 26/09/2018
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    BEOLC compatiblehigh tunnel magneto resistance perpendicula magnetic tunnel junctions using a sacrificial Mg layer as CoFeB free layer cap

    Swerts, Johan  
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    Mertens, Sofie  
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    Lin, Tsann
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    Couet, Sebastien  
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    Tomczak, Yoann  
    Journal article
    2015, Applied Physics Letters, (106) 26, p.262407
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    Challenges and opportunities for Atomic Layer Deposition of 2D transition metal dichalcogenides

    Delabie, Annelies  
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    Groven, Benjamin  
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    Heyne, Markus
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    Zhang, Haodong
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    Tomczak, Yoann  
    Oral presentation
    2016, Workshop on Atomic Layer Deposition for 2D Materials
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    [Co/Ni]-CoFeB hybrid free layer stack materials for high density magnetic random access memory applications

    Liu, Enlong
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    Swerts, Johan  
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    Couet, Sebastien  
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    Mertens, Sofie  
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    Tomczak, Yoann  
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    Lin, Tsann
    Journal article
    2016, Applied Physics Letters, (108) 13, p.132405
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    Diffusion-mediated growth and size-fependent nanoparticle reactivity during ruthenium atomic layer deposition on dielectric substrates

    Soethoudt, Job  
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    Grillo, Fabio
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    Marques, Esteban  
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    Van Ommen, Ruud
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    Tomczak, Yoann  
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    Nyns, Laura  
    Journal article
    2018, Advanced Materials Interfaces, (5) 24, p.1800870
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    Diffusion-mediated nucleation behaviour of ruthenium atomic layer deposition on dielectrics

    Soethoudt, Job  
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    Tomczak, Yoann  
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    Grillo, Fabio
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    Van Ommen, Ruud
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    Altamirano Sanchez, Efrain  
    Meeting abstract
    2018, Area Selective Deposition Workshop - ASD, 29/04/2018
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    Experimental observation of back-hopping with reference layer flipping by high-voltage pulse in perpendicular magnetic tunnel junctions

    Kim, Woojin  
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    Couet, Sebastien  
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    Swerts, Johan  
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    Lin, Tsann
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    Tomczak, Yoann  
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    Souriau, Laurent  
    Journal article
    2016, IEEE Transactions on Magnetics, (52) 7, p.3401004
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    Free layer effective anisotropy thickness in high TMR top and bottom pinned perpendicular magnetic tunnel junctions

    Swerts, Johan  
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    Mertens, Sofie  
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    Lin, Tsann
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    Couet, Sebastien  
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    Tomczak, Yoann  
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    Liu, Enlong
    Meeting abstract
    2015, International Conference on Magnetism - ICM, 5/07/2015, p.WE.D.2_O3
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    Growth inhibition of metal oxide ALD on advanced patterning film (APF) for tone reversal of HfO2 and TiO2 patterned structures

    Stevens, Eric
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    Tomczak, Yoann  
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    Chan, BT  
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    Altamirano Sanchez, Efrain  
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    Delabie, Annelies  
    Proceedings paper
    2017, 17th International Conference on Atomic Layer Deposition - ALD, 15/07/2017
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    Impact of sequential infiltration synthesis (SIS) on roughness and stochastic nano-failures for EUVL patterning

    Vanelderen, Pieter  
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    Blanco, Victor  
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    Mao, Ming  
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    Tomczak, Yoann  
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    De Roest, David  
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    Kissoon, Nicola
    Proceedings paper
    2019, Extreme Ultraviolet (EUV) Lithography X, 24/02/2019, p.109570S
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    Influence of the reference layer composition on the back-end-of-line compatibility of Co/Ni-based perpendicular magnetic tunnel junction stacks

    Tomczak, Yoann  
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    Lin, Tsann
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    Swerts, Johan  
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    Couet, Sebastien  
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    Mertens, Sofie  
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    Liu, Enlong
    Journal article
    2016, IEEE Transactions on Magnetics, (52) 7, p.3400604
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    Insight in growth mechanism of Ru ALD on dielectrics

    Soethoudt, Job  
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    Tomczak, Yoann  
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    Grillo, Fabio
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    Hody, Hubert  
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    Marques, Esteban  
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    Van Ommen, Ruud
    Meeting abstract
    2018, 18th International Conference on Atomic Layer Deposition - ALD, 29/07/2018
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    Insight in nucleation mechanisms of semiconducting 2D metal sulfides and application to area selective deposition

    Delabie, Annelies  
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    Tomczak, Yoann  
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    Heyne, Markus
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    Groven, Benjamin  
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    van Pelt, Thomas  
    Meeting abstract
    2017, 2nd Area Selective Deposition Workshop - ASD, 20/04/2017
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    Insight into selective surface reactions of dimethylamino-trimethylsilane for area-selective deposition of metal, ntride, and oxide

    Soethoudt, Job  
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    Tomczak, Yoann  
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    Meynaerts, Ben
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    Chan, BT  
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    Delabie, Annelies  
    Journal article
    2020, Journal of Physical Chemistry C, (124) 13, p.7163-7173
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