Browsing by Author "Tomczak, Yoann"
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Publication A Co/Ni-based perpendicular magnetic tunnel junction (p-MTJ) stack with improved reference layer for BEOL compatibility
Meeting abstract2016, MMM Intermag, 11/01/2016Publication Area selective atomic layer deposition: a bottom-up approach for patterning
Meeting abstract2018, Materials for Advanced Metallization Conference - MAM, 18/03/2018, p.02KPublication Area-selective atomic layer deposition of TiN, TiO2, and HfO2 for advanced thin film patterning by delayed nucleation on plasma-treated amorphous carbon
Meeting abstract2018, 3rd Area Selective Deposition Workshop - ASD, 29/04/2018, p.24-24Publication Area-selective atomic layer deposition of TiN, TiO2, and HfO2 on Si3N4 in Sub-50 nanometer Si3N4/amorphous carbon structures
Meeting abstract2018, 18th International Conference on Atomic Layer Deposition-ALD. Featuring the 5th International Atomic Layer Etching Workshop, 29/07/2018, p.AS-TuM5Publication Area-selective atomic layer deposition of TiN, TiO2, and HfO2 on silicon ntride with inhibition on amorphous carbon
Journal article2018, Chemistry of Materials, (30) 10, p.3223-3232Publication Area-selective deposition on nanoscale metal/dielectric patterns by surface-dependent dimethylamino-trimethylsilane reaction
Meeting abstract2019, EuroCVD 2019 / Baltic ALD 2019, 24/06/2019Publication Assessing the prospects of atomic layer deposition for two-dimensional materials in microelectronic applications
Meeting abstract2018, Material Science and Engineering Congress - MSE, 26/09/2018Publication BEOLC compatiblehigh tunnel magneto resistance perpendicula magnetic tunnel junctions using a sacrificial Mg layer as CoFeB free layer cap
Journal article2015, Applied Physics Letters, (106) 26, p.262407Publication Challenges and opportunities for Atomic Layer Deposition of 2D transition metal dichalcogenides
Oral presentation2016, Workshop on Atomic Layer Deposition for 2D MaterialsPublication [Co/Ni]-CoFeB hybrid free layer stack materials for high density magnetic random access memory applications
Journal article2016, Applied Physics Letters, (108) 13, p.132405Publication Diffusion-mediated growth and size-fependent nanoparticle reactivity during ruthenium atomic layer deposition on dielectric substrates
Journal article2018, Advanced Materials Interfaces, (5) 24, p.1800870Publication Diffusion-mediated nucleation behaviour of ruthenium atomic layer deposition on dielectrics
Meeting abstract2018, Area Selective Deposition Workshop - ASD, 29/04/2018Publication Experimental observation of back-hopping with reference layer flipping by high-voltage pulse in perpendicular magnetic tunnel junctions
Journal article2016, IEEE Transactions on Magnetics, (52) 7, p.3401004Publication Free layer effective anisotropy thickness in high TMR top and bottom pinned perpendicular magnetic tunnel junctions
Meeting abstract2015, International Conference on Magnetism - ICM, 5/07/2015, p.WE.D.2_O3Publication Growth inhibition of metal oxide ALD on advanced patterning film (APF) for tone reversal of HfO2 and TiO2 patterned structures
Proceedings paper2017, 17th International Conference on Atomic Layer Deposition - ALD, 15/07/2017Publication Impact of sequential infiltration synthesis (SIS) on roughness and stochastic nano-failures for EUVL patterning
; ; ; ; ; Kissoon, NicolaProceedings paper2019, Extreme Ultraviolet (EUV) Lithography X, 24/02/2019, p.109570SPublication Influence of the reference layer composition on the back-end-of-line compatibility of Co/Ni-based perpendicular magnetic tunnel junction stacks
Journal article2016, IEEE Transactions on Magnetics, (52) 7, p.3400604Publication Insight in growth mechanism of Ru ALD on dielectrics
Meeting abstract2018, 18th International Conference on Atomic Layer Deposition - ALD, 29/07/2018Publication Insight in nucleation mechanisms of semiconducting 2D metal sulfides and application to area selective deposition
Meeting abstract2017, 2nd Area Selective Deposition Workshop - ASD, 20/04/2017Publication Insight into selective surface reactions of dimethylamino-trimethylsilane for area-selective deposition of metal, ntride, and oxide
Journal article2020, Journal of Physical Chemistry C, (124) 13, p.7163-7173