Browsing by Author "Vinckier, Chris"
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Publication A detailed study on the growth of thin oxide layers on silicon using ozonated solutions
Journal article2000, Journal of the Electrochemical Society, (147) 3, p.1124-1129Publication A force study in brush scrubbing
Proceedings paper2005, Ultra Clean Processing of Silicon Surfaces VII: Proceedings of the 7th International Symposium, 20/09/2004, p.279-282Publication A Ge matrix removal method for metallic contamination analysis on Ge wafers using TXRF
Oral presentation2004, European Conference on X-Ray SpectrometryPublication A mechanism for the silicon oxide growth by ozonated solutions
Meeting abstract1999, Electrochemical Society Fall Meeting: 6th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 17/10/1999, p.1117Publication A mechanism for the silicon oxide growth by ozonated solutions
Proceedings paper2000, Cleaning Technology in Semiconductor Device Manufacturing. Proceedings of the 6th International Symposium, 17/10/1999, p.407-415Publication A study of the influence of typical wet chemical treatments on the germanium wafer surface
Oral presentation2004, 7th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSSPublication A study of the influence of typical wet chemical treatments on the germanium wafer surface
Proceedings paper2005, Ultra Clean Processing of Silicon Surfaces VII: Proceedings of the 7th International Symposium, 20/09/2004, p.27-30Publication A wet chemical method for the determination of thickness of SiO2 layers below the nanometer level
; ; ; Journal article1999, J. Electrochem. Soc., (146) 5, p.1873-1878Publication Aging phenomena in the removal of nano-particles from Si wafers
; ; Proceedings paper2008, Ultra Clean Processing of Semiconductor Surfaces VIII - UCPSS, 18/09/2006, p.151-154Publication Atomic layer deposition of Hf-based materials in semiconductor applications
Meeting abstract2008, 214th ECS Meeting, 12/10/2008, p.1915Publication Atomic layer deposition of HfO2 on (100) and (110) oriented silicon surfaces
Proceedings paper2007, Physics and Technology of High-K Dielectrics, 7/10/2007, p.73-77Publication Boosting the efficiency of solar cells fabricated on electromagnetic cold crucible cast multicrystalline silicon by means of hydrogen passivation
Journal article1994, Solar Energy Materials and Solar Cells, 34, p.237-241Publication Can we increase the efficiency of organic contamination removal by ozone/di-water processes by using additives
Oral presentation2002, UCPSS - Ultra Clean Processing Technology SymposiumPublication Can we increase the efficiency of organic contamination removal by ozone/Di-water processes by using additives?
Proceedings paper2003, Ultra Clean Processing of Silicon Surfaces 2002 - UCPSS, 16/09/2002, p.215-219Publication Chlorine detection and quantification in ALCVD HfO2 high-k dielectric films using total reflection X-ray fluorescence spectrometry
Meeting abstract2003, 204th Meeting of the Electrochemical Society: 2nd Int. Symp. on High Dielectric Constant Materials, 13/10/2003Publication Cleaning of nanoparticles in semiconductor manufacturing
Oral presentation2004, BePCIS Seminar on Selected Topics in NanotechnologyPublication Comparison of bulk and surface passivation properties of plasma nitrides on Si and SiGe solar cells
Publication Correlation between haze of the wafer and particle-count on wafers: a new approach to monitor nano-sized particles
Oral presentation2002, UCPSS - Ultra Clean Processing Technology SymposiumPublication Determination of degradation products in O3/DI processes
Oral presentation2001, 15th World Congress of the International Ozone Association; 10-15 September 2001; London, UK.Publication Determination of metallic contaminants on Ge wafers using direct- and droplet sandwich etch- total reflection X-ray fluorescence spectrometry
; ; ; Journal article2003-12, Spectrochim. Acta B, (58) 12, p.2093-2104