Browsing by Author "Wittebrood, Friso"
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Publication 22nm node imaging and beyond: When will EUV take over?
Proceedings paper2010, International Symposium on Extreme Ultraviolet Lithography, 18/10/2010Publication Alternative EUV mask technology for mask 3D effect compensation
Proceedings paper2014, International Symposium on Extreme Ultraviolet Lithography - EUVL, 27/10/2014Publication Alternative EUV mask technology to compensate for mask 3D effects
Proceedings paper2015, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII, 20/04/2015, p.96580IPublication Assist features: placement, impact and relevance
Proceedings paper2016, Extreme Ultraviolet (EUV) Lithography VII, 21/02/2016, p.97761SPublication Edge placement error analysis for N7 logic patterning options
Publication Experimental validation of novel EUV mask technology to reduce mask 3D effects
Proceedings paper2015, 31st European Mask and Lithography Conference, 22/06/2015, p.966109Publication Experimental validation of novel mask technology to reduce mask 3D effects
Proceedings paper2015, Photomask Technology 2015, 29/09/2015, p.96350ZPublication Experimental verification of phase induced mask 3D effects in EUV imaging
Proceedings paper2015, International Symposium on Extreme Ultraviolet Lithography - EUVL, 5/10/2015Publication Mask 3D effect mitigation by source optimization and assist feature placement
Proceedings paper2016, International Symposium on Extreme Ultraviolet Lithography - EUVL, 24/10/2016Publication NXE:3300 insertion for N7 : status and challenges
Proceedings paper2015, International Symposium on Extreme Ultraviolet Lithography - EUVL, 5/10/2015Publication Patterning options for N7 logic : Prospects and challenges for EUV
Proceedings paper2015, 31st European Mask and Lithography Conference, 22/06/2015, p.96610GPublication SAQP and EUV block patterning of BEOL metal layers on IMEC's iN7 platform
Proceedings paper2017, Extreme Ultraviolet (EUV) Lithography VIII, 27/02/2017, p.101430HPublication Single exposure EUV patterning for BEOL metal layers on the imec iN7 platform
Proceedings paper2017, Extreme Ultraviolet (EUV) Lithography VIII, 26/02/2017, p.1014318Publication Stitching for High NA: zooming in on CDU budget
Proceedings paper2023, International Conference on Extreme Ultraviolet Lithography, OCT 02-05, 2023, p.Art. 1275002Publication The imec iN7 EUV platform: M2-Block and Via patterning developments
Proceedings paper2016, International Symposium on Extreme Ultraviolet Lithography - EUVL, 24/10/2016