Browsing by author "Van Den Heuvel, Dieter"
Now showing items 1-20 of 76
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157-nm photoresist process optimization for a full-field scanner
Light, Scott; Stepanenko, Nickolay; Gronheid, Roel; Van Roey, Frieda; Van Den Heuvel, Dieter; Goethals, Mieke (2004-03) -
157nm full field imaging
Hermans, Jan; Van Roey, Frieda; Van Den Heuvel, Dieter; Goethals, Mieke; Ronse, Kurt (2003-08) -
157nm resist process performance and integration challenges on a full field scanner
Goethals, Mieke; Gronheid, Roel; List, Scott; Ercken, Monique; Van Roey, Frieda; Van Den Heuvel, Dieter; Locorotondo, Sabrina; Ronse, Kurt (2004) -
A new paradigm for in-line detection and control of patterning defects
Hunsche, Stefan; Jochemsen, Marinus; Jain, Vivek; Zhou, Xinjian; Chen, Frank; Vellanki, Venu; Spence, Chris; Halder, Sandip; Van Den Heuvel, Dieter; Truffert, Vincent (2015) -
A year of new mask defectivity insights in imec's EUVL program
Jonckheere, Rik; Van Den Heuvel, Dieter; Baudemprez, Bart; Jehoul, Christiane; Pacco, Antoine (2013) -
ABI tool performance confirmed by NXE3300 printing results
Jonckheere, Rik; Takagi, Noriaki; Watanabe, Hidehiro; Yamane, Takeshi; Van Den Heuvel, Dieter; Gallagher, Emily (2015-10) -
Additional evidence of EUV blank defects first seen by wafer printing
Jonckheere, Rik; Van Den Heuvel, Dieter; Hendrickx, Eric; Ronse, Kurt; Bret, Tristan; Hofmann, Thorsten; Magana, John; Aharonson, Israel; Meshulach, Doron (2011) -
Analysis of the effect of point-of-use filtration on microbridging defectivity
Braggin, Jennifer; Gronheid, Roel; Cheng, Shaunee; Van Den Heuvel, Dieter; Bernard, Sophie; Foubert, Philippe; Rosslee, Craig (2009) -
Capture probability of assembly defects in 14 nm half-pitch line/space DSA patterns
Pathangi Sriraman, Hari; Chan, BT; Van Look, Lieve; Vandenbroeck, Nadia; Van Den Heuvel, Dieter; Cross, Andrew; Hong, Sung Eun; Nafus, Kathleen; D'Urzo, Lucia; Gronheid, Roel (2015) -
Characterization of EUV resists for defectivity at 32nm
Montal, Ofir; Dolev, Ido; Rosenzweig, Moshe; Dotan, Kfir; Meshulach, Doron; Adan, Ofer; Levi, Shimon; Cai, Man-Ping; Bencher, Chris; Ngai, Christopher S.; Jehoul, Christiane; Van Den Heuvel, Dieter; Hendrickx, Eric (2011) -
Characterizing immersion lithography micro bridge defects using advanced features of teh SEMVision G3 STAR FIB
Van Den Heuvel, Dieter; Santoro, Gaetano; Gronheid, Roel; Braggin, Jennifer; Rosslee, Craig; Leray, Philippe; Cheng, Shaunee; Schreutelkamp, Rob; Hillel, Noam (2009) -
Closing the gap for EUV mask repair
Bret, T.; Jonckheere, Rik; Van Den Heuvel, Dieter; Baur, C.; Waiblinger, M.; Baralia, G. (2012) -
Comparison between existing inspection techniques for EUV mask defects
Van Den Heuvel, Dieter; Jonckheere, Rik; Hendrickx, Eric; Cheng, Shaunee; Ronse, Kurt; Abe, Tsukasa; Magana, John; Bret, Tristan (2010) -
Correlation of actinic blank inspection and experimental phase defect printability study on NXE3x00 EUV scanner
Jonckheere, Rik; Van Den Heuvel, Dieter; Takagi, Noriaki; Watanabe, Hidehiro; Gallagher, Emily (2015) -
Damage review on gate stack test structures after high-velocity aerosol cleaning
Wostyn, Kurt; Sano, Ken-Ichi; De Marco, Cinzia; Kenis, Karine; Van Den Heuvel, Dieter; Janssens, Tom; Bearda, Twan; Leunissen, Peter; Mertens, Paul; Eitoku, Atsuro (2007) -
Defect capture sensitivity in 14 nm half-pitch line/space DSA patterns
Pathangi Sriraman, Hari; Gronheid, Roel; Van Den Heuvel, Dieter; Rincon Delgadillo, Paulina; Chan, BT; Van Look, Lieve; Bayana, Hareen; Cao, Yi; Her, YoungJun; Lin, Guanyang; Parnell, Doni; Nafus, Kathleen; Somervell, Mark; Harukawa, Ryoto; Chikashi, Ito; Nagaswami, Venkat; D'Urzo, Lucia; Nealey, Paul (2014) -
Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow
Pathangi Sriraman, Hari; Chan, BT; Bayana, Hareen; Vandenbroeck, Nadia; Van Den Heuvel, Dieter; Van Look, Lieve; Rincon Delgadillo, Paulina; Cao, Yi; Kim, JiHoon; Lin, Guanyang; Parnell, Doni; Nafus, Kathleen; Harukawa, Ryota; Chikashi, Ito; Polli, Marco; D'Urzo, Lucia; Gronheid, Roel; Nealey, Paul (2015) -
Defect mitigation and root cause studies in imec's 14 nm half-pitch chemo-epitaxy DSA flow
Pathangi Sriraman, Hari; Chan, BT; Bayana, Hareen; Van Den Heuvel, Dieter; Van Look, Lieve; Rincon Delgadillo, Paulina; Cao, Yi; Kim, YiHoon; Lin, G.; Parnell, Doni; Nafus, Kathleen; Harukawa, Ryoto; Chikashi, Ito; Nagaswami, Venkat; D'Urzo, Lucia; Gronheid, Roel; Nealey, Paul (2015) -
Defect reduction and defect stability in imec's 14nm half pitch chemo-epitaxy DSA flow
Gronheid, Roel; Rincon Delgadillo, Paulina; Pathangi Sriraman, Hari; Van Den Heuvel, Dieter; Parnell, Doni; Chan, BT; Lee, Yu-tsung; Van Look, Lieve; Cao, Yi; Her, YoungJun; Lin, Guanyang; Harukawa, Ryoto; Nagaswami, Venkat; D'Urzo, Lucia; Somervell, Mark; Nealey, Paul (2014) -
Defect source analysis of directed self-assembly process
Rincon Delgadillo, Paulina; Suri, Mayur; Durant, Stephane; Cross, Andrew; Nagaswami, Venkat; Van Den Heuvel, Dieter; Gronheid, Roel; Nealey, Paul (2013)