Browsing by author "Van Den Heuvel, Dieter"
Now showing items 21-40 of 76
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Defect source analysis of directed self-assembly process (DSA of DSA)
Rincon Delgadillo, Paulina; Harukawa, Ryota; Suri, Mayur; Durant, Stephane; Cross, Andrew; Nagaswami, Venkat; Van Den Heuvel, Dieter; Gronheid, Roel; Nealey, Paul (2013) -
Detection of bonding voids for 3D integration
Chen, Cong; Van den Heuvel, Dieter; Beggiato, Matteo; Tunca Altintas, Bensu; Moussa, Alain; Vandooren, Anne; Baudemprez, Bart; Schobitz, Michael; Khaldi, Wassim; Bogdanowicz, Janusz; Beral, Christophe; Charley, Anne-Laure (2023) -
Detection of split design-related weak points in double patterning using PQW and bright-field defect inspection
Van Den Heuvel, Dieter; Cheng, Shaunee; Leray, Philippe; Wiaux, Vincent; Maenhoudt, Mireille; D'have, Koen; Jaenen, Patrick; Marcuccilli, Gino; Malik, Irfan; Klein, Sophie (2008) -
Dry Resist Metrology Readiness for High-NA EUVL
Lorusso, Gian; Van den Heuvel, Dieter; Zidan, Mohamed; Moussa, Alain; Beral, Christophe; Charley, Anne-Laure; De Simone, Danilo; De Silva, Anuja; Verveniotis, Elisseos; Haider, Ali; Kondo, Tsuyoshi; Shindo, Hiroyuki; Ebizuka, Yasushi; Isawa, Miki (2023) -
Ebeam based mask repair as door opener for defect free EUV masks
Waiblinger, Markus; Bret, Tristan; Jonckheere, Rik; Van Den Heuvel, Dieter (2012) -
Electrical comparison of iN7 EUV hybrid and EUV single patterning BEOL metal layers
Lariviere, Stephane; Wilson, Chris; Kutrzeba Kotowska, Bogumila; Versluijs, Janko; Decoster, Stefan; Mao, Ming; van der Veen, Marleen; Jourdan, Nicolas; El-Mekki, Zaid; Heylen, Nancy; Kesters, Els; Verdonck, Patrick; Beral, Christophe; Van Den Heuvel, Dieter; De Bisschop, Peter; Bekaert, Joost; Blanco, Victor; Ciofi, Ivan; Wan, Danny; Briggs, Basoene; Mallik, Arindam; Hendrickx, Eric; Kim, Ryan Ryoung han; McIntyre, Greg; Ronse, Kurt; Boemmels, Juergen; Tokei, Zsolt; Mocuta, Dan (2018) -
EUV Lithography in pre-production mode
Hendrickx, Eric; Hermans, Jan; Jonckheere, Rik; Van Den Heuvel, Dieter; Lorusso, Gian; Foubert, Philippe; De Bisschop, Peter; Vandenberghe, Geert; Ronse, Kurt (2012) -
EUV mask defectivity study by existing DUV tools and new EBEAM technology
Mangan, Shmoolik; Jonckheere, Rik; Van Den Heuvel, Dieter; Rozentsvige, Moshe; Kudriashov, Vladislav; Shoval, Lior; Santoro, Gaetano; Englard, Ilan (2010) -
EUV mask defectivity: status and mitigation towards HVM
Jonckheere, Rik; Van Den Heuvel, Dieter; Lamantia, Matthew; Baudemprez, Bart; Hendrickx, Eric; Ronse, Kurt (2010) -
EUV mask repair using a combination of focused-electron-beam-induced processing and vacuum Atomic Force Microscopy
Bret, Tristan; Baralia, Gabriel; Baur, Christof; Budach, Michael; Hofmann, Thorsten; Edinger, Klaus; Magana, John; Jonckheere, Rik; Van Den Heuvel, Dieter (2011) -
EUV process sensitivities and optimizations for track processing
Shite, Hideo; Bradon, Neil; Nafus, Kathleen; Kitano, Junichi; Kosugi, Hitoshi; Hermans, Jan; Hendrickx, Eric; Foubert, Philippe; Gronheid, Roel; Jehoul, Christiane; Van Den Heuvel, Dieter; Goethals, Mieke; Cheng, Shaunee (2010) -
EUV resist material performance, progress and process improvements at imec
Goethals, Mieke; Niroomand, Ardavan; Ban, Keundo; Hosokawa, Kohei; Van Roey, Frieda; Pollentier, Ivan; Jehoul, Christiane; Van Den Heuvel, Dieter; Ronse, Kurt (2010) -
EUV resist performance update on ADT and NXE:3100 scanner
Goethals, Mieke; Niroomand, Ardavan; Hosokawa, Kohei; Van Roey, Frieda; Pollentier, Ivan; Van Den Heuvel, Dieter (2011) -
EUV resist process performance investigations on the NXE 3100 full field scanner
Goethals, Mieke; Foubert, Philippe; Hosokawa, Kohei; Van Roey, Frieda; Niroomand, Ardavan; Van Den Heuvel, Dieter; Pollentier, Ivan (2012) -
EUV reticle print verification with advanced broadband optical wafer inspection and e-beam review systems
De Simone, Danilo; Sanapala, Ravikumar; Andrrew, Cross; Preil, Moshe; Qian, Jin; Sumar, Shishir; Anantha, Vidyasagar; Sah, Kaushik; Eitapence, Scott; Van Den Heuvel, Dieter; Foubert, Philippe (2017) -
EUV scanner printability evaluation of natural blank defects detected by actinic blank inspection
Takagi, Noriaki; Watanabe, Hidehiro; Van Den Heuvel, Dieter; Jonckheere, Rik; Gallagher, Emily (2015-07) -
EUV scanner printability evaluation of natural blank defects detected by actinic blank inspection
Takagi, Noriaki; Watanabe, Hidehiro; Van Den Heuvel, Dieter; Jonckheere, Rik; Gallagher, Emily (2015) -
Evidence of printing blank-related defects on EUV masks missed by blank inspection
Jonckheere, Rik; Van Den Heuvel, Dieter; Hendrickx, Eric; Ronse, Kurt; Bret, Tristan; Hofmann, Thorsten; Magana, John; Aharonson, Israel; Meshulach, Doron (2011) -
Exploring the readiness of EUV photo materials for patterning
De Simone, Danilo; Vesters, Yannick; Shehzad, Atif; Vandenberghe, Geert; Foubert, Philippe; Beral, Christophe; Van Den Heuvel, Dieter; Mao, Ming; Lazzarino, Frederic (2017) -
Further investigation of EUV process sensitivities for wafer track processing
Bradon, Neil; Nafus, Kathleen; Shite, Hideo; Kitano, J.; Kosugi, H.; Goethals, Mieke; Cheng, Shaunee; Hermans, Jan; Hendrickx, Eric; Baudemprez, Bart; Van Den Heuvel, Dieter (2010)