Browsing by author "Hoffmann, Thomas"
Now showing items 1-20 of 27
-
3D-carrier profiling in FinFETs using scanning spreading resistance microscopy
Mody, Jay; Zschaetzsch, Gerd; Koelling, Sebastian; De Keersgieter, An; Eneman, Geert; Kambham, Ajay Kumar; Drijbooms, Chris; Schulze, Andreas; Chiarella, Thomas; Horiguchi, Naoto; Hoffmann, Thomas; Eyben, Pierre; Vandervorst, Wilfried (2011) -
Achieving 9ps unloaded ring oscillator delay in FuSI/HfSiON with 0.8 nm EOT
Rothschild, Aude; Shi, Xiaoping; Everaert, Jean-Luc; Kerner, Christoph; Chiarella, Thomas; Hoffmann, Thomas; Vrancken, Christa; Shickova, Adelina; Yoshinao, H.; Mitsuhashi, Riichirou; Niwa, Masaaki; Lauwers, Anne; Veloso, Anabela; Kittl, Jorge; Absil, Philippe; Biesemans, Serge (2007) -
Achieving low VT Ni-FUSI CMOS via lanthanide incorporation in the gate stack
Veloso, Anabela; Yu, HongYu; Lauwers, Anne; Chang, Shou-Zen; Adelmann, Christoph; Onsia, Bart; Demand, Marc; Brus, Stephan; Vrancken, Christa; Singanamalla, Raghunath; Lehnen, Peer; Kittl, Jorge; Kauerauf, Thomas; Vos, Rita; O'Sullivan, Barry; Van Elshocht, Sven; Mitsuhashi, Riichirou; Whittemore, G.; Yin, K.M.; Niwa, Masaaki; Hoffmann, Thomas; Absil, Philippe; Jurczak, Gosia; Biesemans, Serge (2007-09) -
Achieving low-VT Ni-FUSI CMOS via Lanthanide incorporation in the gate stack
Veloso, Anabela; Yu, HongYu; Lauwers, Anne; Chang, Shou-Zen; Adelmann, Christoph; Onsia, Bart; Demand, Marc; Brus, Stephan; Vrancken, Christa; Singanamalla, Raghunath; Lehnen, Peer; Kittl, Jorge; Kauerauf, Thomas; Vos, Rita; O'Sullivan, Barry; Van Elshocht, Sven; Mitsuhashi, Riichirou; Whittemore, G.; Yin, K.M.; Niwa, Masaaki; Hoffmann, Thomas; Absil, Philippe; Jurczak, Gosia; Biesemans, Serge (2008) -
Addressing key concerns for implementation of Ni FUSI into manufacturing for 45/32 nm CMOS
Shickova, Adelina; Kauerauf, Thomas; Rothschild, Aude; Aoulaiche, Marc; Sahhaf, Sahar; Kaczer, Ben; Veloso, Anabela; Torregiani, Cristina; Pantisano, Luigi; Lauwers, Anne; Zahid, Mohammed; Rost, Tim; Tigelaar, H.; Pas, M.; Fretwell, J.; McCormack, J.; Hoffmann, Thomas; Kerner, Christoph; Chiarella, Thomas; Brus, Stephan; Harada, Yoshinao; Niwa, Masaaki; Kaushik, Vidya; Maes, Herman; Absil, Philippe; Groeseneken, Guido; Biesemans, Serge; Kittl, Jorge (2007) -
Advanced CMOS device technologies for 45nm node and below
Veloso, Anabela; Hoffmann, Thomas; Lauwers, Anne; Yu, HongYu; Severi, Simone; Augendre, Emmanuel; Kubicek, Stefan; Verheyen, Peter; Collaert, Nadine; Absil, Philippe; Jurczak, Gosia; Biesemans, Serge (2007) -
Advanced FinFET devices for sub-32nm technology nodes: characteristics and integration challenges
Veloso, Anabela; Collaert, Nadine; De Keersgieter, An; Witters, Liesbeth; Rooyackers, Rita; Hoffmann, Thomas; Biesemans, Serge; Jurczak, Gosia (2009) -
Assessment of OPC effectiveness using two-dimensional metrics
Wiaux, Vincent; Philipsen, Vicky; Jonckheere, Rik; Vandenberghe, Geert; Verhaegen, Staf; Hoffmann, Thomas; Ronse, Kurt; Howard, William B.; Maurer, Wilhelm; Preil, Moshe E. (2002) -
Basic aspects of the formation and activation of boron junctions using plasma immersion ion implantation
Zschaetzsch, Gerd; Vandervorst, Wilfried; Hoffmann, Thomas; Goossens, Jozefien; Everaert, Jean-Luc; del Agua Borniquel, Jose Ignacio; Poon, T. (2008) -
Conformal doping of FINFET's: a fabrication and metrology challenge
Vandervorst, Wilfried; Everaert, Jean-Luc; Rosseel, Erik; Jurczak, Gosia; Hoffmann, Thomas; Eyben, Pierre; Mody, Jay; Zschaetzsch, Gerd; Koelling, Sebastian; Gilbert, Matthieu; Poon, T.; del Agua Borniquel, Jose Ignacio; Foad, M.; Duffy, Ray; Pawlak, Bartek (2008) -
Demonstration of phase-controlled Ni-FUSI CMOSFETs employing SiON dielectrics capped with sub-monolayer ALD HfSiON for low power applications
Yu, HongYu; Chang, Shou-Zen; Veloso, Anabela; Lauwers, Anne; Delabie, Annelies; Everaert, Jean-Luc; Singanamalla, Raghunath; Kerner, Christoph; Vrancken, Christa; Brus, Stephan; Absil, Philippe; Hoffmann, Thomas; Biesemans, Serge (2007-09) -
Electrical demonstration of thermally stable Ni silicides on Si1-xCx epitaxial layers
Machkaoutsan, Vladimir; Verheyen, Peter; Bauer, M.; Zhang, Y.; Koelling, Sebastian; Franquet, Alexis; Vanormelingen, Koen; Loo, Roger; Kim, C.S.; Lauwers, Anne; Horiguchi, Naoto; Kerner, Christoph; Hoffmann, Thomas; Granneman, E.; Vandervorst, Wilfried; Absil, Philippe; Thomas, S.G. (2010) -
Hydrothermal growth of BaTiO3 on TiO2 single crystals
Lisoni, Judit; Lei, C.H.; Hoffmann, Thomas; Fuenzalida, V.M. (2002) -
Influence of the microstructure on the oxidation of Ni thin films
Lisoni, Judit; Goux, Ludovic; Hoffmann, Thomas; Díaz-Droguett, Donovan; Jurczak, Gosia (2012) -
Interim investigation of CD-SEM resist shrinkage in 193nm lithography
Hoffmann, Thomas; Storms, Greet; Vandenbroeck, Nadia; Delvaux, Christie; Ercken, Monique; Pollentier, Ivan; Ronse, Kurt; Takuji, Tada; Felten, Frank; Wong, Evelyn (2002) -
Low Vt Ni-FUSI CMOS technology using a DyO cap layer with either single or dual Ni-phases
Yu, HongYu; Chang, Shou-Zen; Veloso, Anabela; Lauwers, Anne; Adelmann, Christoph; Onsia, Bart; Van Elshocht, Sven; Singanamalla, Raghunath; Demand, Marc; Vos, Rita; Kauerauf, Thomas; Brus, Stephan; Shi, Xiaoping; Kubicek, Stefan; Vrancken, Christa; Mitsuhashi, Riichirou; Lehnen, Peer; Kittl, Jorge; Niwa, M.; Yin, K.M.; Hoffmann, Thomas; De Gendt, Stefan; Jurczak, Gosia; Absil, Philippe; Biesemans, Serge (2007) -
On the efficiency of stress techniques in gate-last n-type bulk FinFETs
Eneman, Geert; Collaert, Nadine; Veloso, Anabela; De Keersgieter, An; De Meyer, Kristin; Hoffmann, Thomas; Horiguchi, Naoto; Thean, Aaron (2012) -
OPC aware mask and wafer metrology
Maurer, Wilhelm; Wiaux, Vincent; Jonckheere, Rik; Philipsen, Vicky; Hoffmann, Thomas; Verhaegen, Staf; Ronse, Kurt; England, Jonathan G.; Howard, William B. (2002) -
Parasitic source/drain resistance reduction in N-channel SOI MuGFETs with 15nm wide fins
Dixit, Abhisek; Ferain, Isabelle; De Meyer, Kristin; Kottantharayil, Anil; Collaert, Nadine; Rooyackers, Rita; Leys, Frederik; De Keersgieter, An; Hoffmann, Thomas; Loo, Roger; Caymax, Matty; Jurczak, Gosia; Biesemans, Serge; Goodwin, Michael; Zimmerman, Paul (2005-10) -
Performance and leakage optimization in carbon and fluorine C0-implanted pMOSFETs
Pawlak, Bartek; Duffy, Ray; Hooker, Jacob; Hoffmann, Thomas; Felch, S.B.; Eyben, Pierre; Absil, Philippe; Lander, Rob (2008)