Browsing by author "Swerts, Johan"
Now showing items 1-20 of 253
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0.5 nm EOT low leakage ALD SrTiO3 on TiN MIM capacitors for DRAM applications
Menou, Nicolas; Wang, Xin Peng; Kaczer, Ben; Polspoel, Wouter; Popovici, Mihaela Ioana; Opsomer, Karl; Pawlak, Malgorzata; Knaepen, W.; Detavernier, C.; Blomberg, T.; Pierreux, D.; Swerts, Johan; Maes, Jan; Favia, Paola; Bender, Hugo; Brijs, Bert; Vandervorst, Wilfried; Van Elshocht, Sven; Wouters, Dirk; Biesemans, Serge; Kittl, Jorge (2008) -
A Co/Ni-based perpendicular magnetic tunnel junction (p-MTJ) stack with improved reference layer for BEOL compatibility
Tomczak, Yoann; Lin, Tsann; Swerts, Johan; Couet, Sebastien; Mertens, Sofie; Liu, Enlong; Kim, Woojin; Sankaran, Kiroubanand; Pourtois, Geoffrey; Tsvetanova, Diana; Souriau, Laurent; Van Elshocht, Sven; Kar, Gouri Sankar; Furnemont, Arnaud (2016) -
A combinatorial study of SiGeAsTe thin films for application as an Ovonic threshold switch selector
Devulder, Wouter; Garbin, Daniele; Clima, Sergiu; Donadio, Gabriele Luca; Fantini, Andrea; Govoreanu, Bogdan; Detavernier, Christophe; Chen, Larry; Miller, Michael; Goux, Ludovic; Van Elshocht, Sven; Swerts, Johan; Delhougne, Romain; Kar, Gouri Sankar (2022-07-01) -
A comparative study of the microstructure–dielectric properties of crystalline SrTiO3 ALD films obtained via seed layer approach
Popovici, Mihaela Ioana; Tomida, Kazuyuki; Swerts, Johan; Favia, Paola; Delabie, Annelies; Bender, Hugo; Adelmann, Christoph; Tielens, Hilde; Brijs, Bert; Kaczer, Ben; Pawlak, Malgorzata; Kim, Min-Soo; Altimime, Laith; Van Elshocht, Sven; Kittl, Jorge (2011) -
A Dy2O3-capped HfO2 dielectric and TaCx-based metals enabling low-Vt single-metal-single-dielectric gate stack
Chang, Vincent; Ragnarsson, Lars-Ake; Pourtois, Geoffrey; O'Connor, Robert; Adelmann, Christoph; Van Elshocht, Sven; Delabie, Annelies; Swerts, Johan; Van der Heyden, Nikolaas; Conard, Thierry; Cho, Hag-Ju; Akheyar, Amal; Mitsuhashi, Riichirou; Witters, Thomas; O'Sullivan, Barry; Pantisano, Luigi; Rohr, Erika; Lehnen, Peer; Kubicek, Stefan; Schram, Tom; De Gendt, Stefan; Absil, Philippe; Biesemans, Serge (2007) -
A first principles study of the oscillatory behavior of tunnel magnetoresitance: On the impact of magnetic and tunneling barrier layers and of the capping metals
Sankaran, Kiroubanand; Swerts, Johan; Couet, Sebastien; Furnemont, Arnaud; Stokbro, Kurt; Pourtois, Geoffrey (2016) -
Achieving conduction band-edge effective work functions by La2O3 capping of hafnium silicates
Ragnarsson, Lars-Ake; Chang, Vincent; Yu, HongYu; Cho, Hag-Ju; Conard, Thierry; Yin, KaiMin; Delabie, Annelies; Swerts, Johan; Schram, Tom; De Gendt, Stefan; Biesemans, Serge (2007-06) -
Advanced capacitor dielectrics: towards 2x nm DRAM
Kim, Min-Soo; Popovici, Mihaela Ioana; Swerts, Johan; Pawlak, Malgorzata; Tomida, Kazuyuki; Kaczer, Ben; Opsomer, Karl; Schaekers, Marc; Tielens, Hilde; Vrancken, Christa; Van Elshocht, Sven; Debusschere, Ingrid; Altimime, Laith; Kittl, Jorge (2011-05) -
Advanced dielectrics targeting 2X DRAM MIM capacitors
Popovici, Mihaela Ioana; Swerts, Johan; Aoulaiche, Marc; Redolfi, Augusto; Kaczer, Ben; Kim, Min-Soo; Douhard, Bastien; Delabie, Annelies; Clima, Sergiu; Jurczak, Gosia; Van Elshocht, Sven (2013) -
Al3Sc thin films as alternative interconnect metallization
Soulie, Jean-Philippe; Adelmann, Christoph; Swerts, Johan; Tokei, Zsolt (2022-03-28) -
Al3Sc thin films for advanced interconnect applications
Soulie, Jean-Philippe; Sankaran, Kiroubanand; Founta, Valeria; Opsomer, Karl; Detavernier, Christophe; Van de Vondel, Joris; Pourtois, Geoffrey; Tokei, Zsolt; Swerts, Johan; Adelmann, Christoph (2024) -
ALD and parasitic growth characteristics of the tetrakisethylmethylamino hafnium TEMAH/H2O process
Nyns, Laura; Delabie, Annelies; Swerts, Johan; Van Elshocht, Sven; De Gendt, Stefan (2010) -
ALD barrier deposition on porous low-k dielectric materials for interconnects
Van Elshocht, Sven; Delabie, Annelies; Dewilde, Sven; Meersschaut, Johan; Swerts, Johan; Tielens, Hilde; Verdonck, Patrick; Witters, Thomas; Vancoille, Eric (2011-10) -
ALD La-based oxides for Vt-tuning in high-k/metal gate stacks
Swerts, Johan; Fedorenko, Yanina; Maes, Jan; Tois, E.; Delabie, Annelies; Ragnarsson, Lars-Ake; Yu, HongYu; Nyns, Laura; Adelmann, Christoph; Van Elshocht, Sven (2007) -
ALD La2O3 cap layers on high-k gates to modify the metal gate work function
Maes, Jan; Swerts, Johan; Tois, E.; Delabie, Annelies; Adelmann, Christoph; Ragnarsson, Lars-Ake; Yu, HongYu (2007) -
ALD Ru and its applications in DRAM MIM-capacitors and interconnect
Schaekers, Marc; Swerts, Johan; Altimime, Laith; Tokei, Zsolt (2011) -
ALD strontium titanates and their characterization
Popovici, Mihaela Ioana; Van Elshocht, Sven; Tomida, Kazuyuki; Menou, Nicolas; Swerts, Johan; Pawlak, Malgorzata; Kaczer, Ben; Kim, Min-Soo; Brijs, Bert; Favia, Paola; Conard, Thierry; Franquet, Alexis; Moussa, Alain; Debusschere, Ingrid; Altimime, Laith; Kittl, Jorge (2010) -
Alternative high-k dielectrics for semiconductor applications
Van Elshocht, Sven; Adelmann, Christoph; Clima, Sergiu; Pourtois, Geoffrey; Conard, Thierry; Delabie, Annelies; Franquet, Alexis; Lehnen, Peer; Meersschaut, Johan; Menou, Nicolas; Popovici, Mihaela Ioana; Richard, Olivier; Schram, Tom; Wang, Xin Peng; Hardy, An; Dewulf, Daan; Van Bael, Marlies; Blomberg, T.; Pierreux, Dieter; Swerts, Johan; Maes, Jan; Wouters, Dirk; De Gendt, Stefan; Kittl, Jorge (2009) -
Alternative metals for advanced interconnects
Adelmann, Christoph; Wen, Liang Gong; Peter, Antony; Siew, Yong Kong; Dutta, Shibesh; Croes, Kristof; Swerts, Johan; Popovici, Mihaela Ioana; Sankaran, Kiroubanand; Pourtois, Geoffrey; Van Elshocht, Sven; Boemmels, Juergen; Tokei, Zsolt (2014-10) -
Alternative metals for advanced interconnects
Adelmann, Christoph; Wen, Liang Gong; Peter, Antony; Siew, Yong Kong; Croes, Kristof; Swerts, Johan; Popovici, Mihaela Ioana; Sankaran, Kiroubanand; Pourtois, Geoffrey; Van Elshocht, Sven; Boemmels, Juergen; Tokei, Zsolt (2014)