Browsing by author "Constantoudis, Vassilios"
Now showing items 1-15 of 15
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Challenges in LER/CDU metrology in DSA: placement error and cross-line correlations
Constantoudis, Vassilios; Kuppuswamy, V.K.M.; Gogolides, Evangelos; Vaglio Pret, Alessandro; Pathangi Sriraman, Hari; Gronheid, Roel (2016) -
Challenges in line edge roughness metrology in directed self-assembly lithography: placement errors and cross-line correlations
Constantoudis, Vassilios; Papvieros, George; Gogolides, Evangelos; Vaglio Pret, Alessandro; Pathangi Sriraman, Hari; Gronheid, Roel (2017) -
Computational nanometrology of line edge roughness: recent challenges and advances
Constantoudis, Vassilios; Papavieros, George; Lorusso, Gian; Gogolides, Evangelos (2017) -
Computational nanometrology of line edge roughness: recent challenges and advances
Constantoudis, Vassilios; Papavieros, George; Lorusso, Gian; Gogolides, Evangelos (2017) -
Computational nanometrology of line-edge roughness: noise effectd, cross-line correlations and the role of etch transfer
Constantoudis, Vassilios; Papavieros, George; Lorusso, Gian; Rutigliani, Vito; Van Roey, Frieda; Gogolides, Evangelos (2018) -
Contact edge roughness and CD uniformity in EUV: effect of photo acid generator and sensitizer
Kuppuswamy, Vijaya-Kumar Murugesan; Constantoudis, Vassilios; Gogolides, Evangelos; Vaglio Pret, Alessandro; Gronheid, Roel (2012) -
Contact edge roughness: effects of dose and PAG concentration in EUV lithography
Kuppuswamy, Vijaya Kumar Murugesan; Constantoudis, Vassilios; Gogolides, Evangelos; Vaglio Pret, Alessandro; Gronheid, Roel (2011) -
Contact-edge roughness (CER) characterization and modeling: effect of dose on CER and crtitical dimension uniformity
Kuppuswamy, Vijaya-Kumar Murugesan; Constantoudis, Vassilios; Gogolides, Evangelos; Gronheid, Roel; Vaglio Pret, Alessandro (2011) -
Critical dimension uniformity and contact edge roughness in extreme ultraviolet lithography: effect of photoacid generator, sensitizer and quencher
Murugesan Kuppuswamy, Vijaya-Kumar; Constantoudis, Vassilios; Gogolides, Evangelos; Vaglio Pret, Alessandro; Gronheid, Roel (2013) -
Deep learning nanometrology of line edge roughness
Giannatou, Eva; Constantoudis, Vassilios; Papavieros, George; Papageorgiou, Harris; Rutigliani, Vito; Lorusso, Gian; Van Roey, Frieda; Gogolides, Evangelos (2019) -
Exploration of a low-temperature PEALD technology to trim and smooth 193i photoresist
Lazzarino, Frederic; Paolillo, Sara; Antony, Peter; De Roest, David; Seong, TaeGeun; Wu, Yizhi; Decoster, Stefan; Rutigliani, Vito; Lorusso, Gian; Constantoudis, Vassilios; Van Elshocht, Sven; Piumi, Daniele; Barla, Kathy (2017) -
Line width roughness accuracy analysis during pattern transfer in self-aligned quadruple patterning process
Lorusso, Gian; Inoue, Osamu; Ohashi, Takeyoshi; Altamirano Sanchez, Efrain; Constantoudis, Vassilios; Koshihara, Shunsuke (2016) -
Need for LWR metrology standardization: the imec roughness protocol
Lorusso, Gian; Sutani, Takeyoshi; Rutigliani, Vito; Van Roey, Frieda; Moussa, Alan; Charley, Anne-Laure; Mack, Chris; Naulleau, Patrick; Perera, Chami; Constantoudis, Vassilios; Ikota, Masami; Ishimoto, Toru; Koshihara, Shunshuke (2018) -
Roughness and variability in EUV lithography: Who is to blame? (Part 1)
Vaglio Pret, Alessandro; Gronheid, Roel; Younkin, Todd; Winroth, Gustaf; Biafore, John; Anno, Yusuke; Hoshiko, Kenji; Constantoudis, Vassilios (2013) -
The need for LWR metrology standardization: the imec roughness protocol
Lorusso, Gian; Sutani, Takeyoshi; Rutigliani, Vito; Van Roey, Frieda; Moussa, Alain; Charley, Anne-Laure; Mack, Chris; Naulleau, Patrick; Constantoudis, Vassilios; Ikota, Masami; Ishimoto, Toru; Koshihara, S (2018)