Browsing by author "Ortolland, Claude"

Advanced 2D/3D simulations for laser annealed device using an atomic kinetic monte carlo approach and scanning spreading resistance microscopy (SRRM)

Noda, T.; Eyben, Pierre; Vandervorst, Wilfried; Vrancken, Christa; Rosseel, Erik; Ortolland, Claude; Clarysse, Trudo; Goossens, Jozefien; De Keersgieter, An; Felch, S.; Schreutelkamp, Rob; Absil, Philippe; Jurczak, Gosia; De Meyer, Kristin; Biesemans, Serge; Hoffmann, Thomas Y. (2008)

Advanced USJ for high-k / metal gate CMOS devices

Absil, Philippe; Ortolland, Claude; Aoulaiche, Marc; Rosseel, Erik; Verheyen, Peter; Vrancken, Christa; Horiguchi, Naoto; Noda, Tajii; Felch, Susan; Schreutelkamp, Rob; Hoffmann, Thomas Y. (2008)

Analysis of pocket profile deactivation and its impact on Vth variation for laser annealed device using an atomistic kinetic Monte Carlo approach

Noda, Taichi; Vandervorst, Wilfried; Vrancken, Christa; Ortolland, Claude; Rosseel, Erik; Absil, Philippe; Biesemans, Serge; Hoffmann, Thomas Y. (2010)

Benchmarking SOI and bulk FinFET alternatives for PLANAR CMOS scaling succession

Chiarella, Thomas; Witters, Liesbeth; Mercha, Abdelkarim; Kerner, Christoph; Rakowski, Michal; Ortolland, Claude; Ragnarsson, Lars-Ake; Parvais, Bertrand; De Keersgieter, An; Kubicek, Stefan; Redolfi, Augusto; Vrancken, Christa; Brus, Stephan; Lauwers, Anne; Absil, Philippe; Biesemans, Serge; Hoffmann, Thomas Y. (2010)

Carbon-based thermal stabilization techniques for junction and silicide engineering for high performance CMOS periphery in memory applications

Ortolland, Claude; Mathew, Suraj; Duffy, Ray; Saino, Kanta; Kim, Chul Sung; Mertens, Sofie; Horiguchi, Naoto; Vrancken, Christa; Chiarella, Thomas; Kerner, Christoph; Absil, Philippe; Lauwers, Anne; Biesemans, Serge; Hoffmann, Thomas Y. (2009)

Control of laser induced interface traps with in-line corona charge metrology

Everaert, Jean-Luc; Rosseel, Erik; Ortolland, Claude; Aoulaiche, Marc; Hoffmann, Thomas Y.; Pavelka, Tibor; Don, Eric (2008)

High-mobility Si1-xGex-channel PFETs: layout dependence and enhanced scalability, demonstrating 90% performance boost at narrow widths

Eneman, Geert; Yamaguchi, Shinpei; Ortolland, Claude; Takeoka, Shinji; Witters, Liesbeth; Chiarella, Thomas; Favia, Paola; Hikavyy, Andriy; Mitard, Jerome; Kobayashi, M.; Krom, Raymond; Bender, Hugo; Tseng, Joshua; Wang, Wei-E; Vandervorst, Wilfried; Loo, Roger; Absil, Philippe; Biesemans, Serge; Hoffmann, Thomas Y. (2010)

Influence of the process sequence and termal budget on the strain of SiC stressor layers formed by ion implantation

Rosseel, Erik; Ortolland, Claude; Hikavyy, Andriy; Schram, Tom; Falepin, Annelies; Hoffmann, Thomas Y.; Douhard, Bastien; Moussa, Alain; Vandervorst, Wilfried; Ameen, Mike; Rubin, Leonard (2010)

Influence of the process sequence and termal budget on the straion fof SiC stressor layers formed by Ion Implantation

Rosseel, Erik; Ortolland, Claude; Hikavyy, Andriy; Schram, Tom; Falepin, Annelies; Hoffmann, Thomas Y.; Vandervorst, Wilfried; Ameen, Mike; Rubin, Leonard (2010-10)

Interface/bulk trap recovery after submeltl aser anneal and the impact to NBTI reliability

Cho, Moon Ju; Aoulaiche, Marc; Degraeve, Robin; Ortolland, Claude; Kauerauf, Thomas; Kaczer, Ben; Roussel, Philippe; Hoffmann, Thomas Y.; Groeseneken, Guido (2010)

Ion-implantation-based low-cost Hk/MG process for CMOS low-power application

Ortolland, Claude; Sahhaf, Sahar; Srividya, Vidya; Degraeve, Robin; Saino, Kanta; Kim, Chul-Sung; Gilbert, Matthieu; Kauerauf, Thomas; Cho, Moon Ju; Dehan, Morin; Schram, Tom; Togo, Mitsuhiro; Horiguchi, Naoto; Groeseneken, Guido; Biesemans, Serge; Absil, Philippe; Vandervorst, Wilfried; Gealy, Dan; Hoffmann, Thomas Y. (2010)

Junction anneal sequence optimization for advanced high-k / metal gate CMOS technology

Ortolland, Claude; Ragnarsson, Lars-Ake; Kerner, Christoph; Chiarella, Thomas; Rosseel, Erik; Okuno, Yasutoshi; Favia, Paola; Richard, Olivier; Everaert, Jean-Luc; Schram, Tom; Kubicek, Stefan; Absil, Philippe; Biesemans, Serge; Schreutelkamp, Robert; Hoffmann, Thomas Y. (2009)

Laser annealed junctions: pocket profile analysis using an atomistic kinetic Monte Carlo approach

Noda, Taiji; Ortolland, Claude; Vandervorst, Wilfried; Vrancken, Christa; Rosseel, Erik; Clarysse, Trudo; Absil, Philippe; Biesemans, Serge; Hoffmann, Thomas Y. (2010)

Laser-annealed junctions with advanced CMOS gate stacks for 32nm node: perspectives on device performance and manufacturability

Ortolland, Claude; Noda, Taiji; Chiarella, Thomas; Kubicek, Stefan; Kerner, Christoph; Vandervorst, Wilfried; Opdebeeck, Ann; Vrancken, Christa; Horiguchi, Naoto; de Potter de ten Broeck, Muriel; Aoulaiche, Marc; Rosseel, Erik; Felch, S.B.; Absil, Philippe; Schreutelkamp, Rob; Biesemans, Serge; Hoffmann, Thomas Y. (2008)

Migrating from planar to FinFET for further CMOS scaling: SOI or bulk?

Chiarella, Thomas; Witters, Liesbeth; Mercha, Abdelkarim; Kerner, Christoph; Dittrich, Rok; Rakowski, Michal; Ortolland, Claude; Ragnarsson, Lars-Ake; Parvais, Bertrand; De Keersgieter, An; Kubicek, Stefan; Redolfi, Augusto; Rooyackers, Rita; Vrancken, Christa; Brus, Stephan; Lauwers, Anne; Absil, Philippe; Biesemans, Serge; Hoffmann, Thomas Y. (2009)

Migrating from planar to FinFET for further CMOS scaling: SOI or bulk?

Mitard, Jerome; Witters, Liesbeth; Mercha, Abdelkarim; Kerner, Christoph; Dittrich, Rok; Rakowski, Michal; Ortolland, Claude; Ragnarsson, Lars-Ake; Parvais, Bertrand; De Keersgieter, An; Kubicek, Stefan; Redolfi, Augusto; Rooyackers, Rita; Vrancken, Christa; Brus, Stephan; Lauwers, Anne; Absil, Philippe; Biesemans, Serge; Hoffmann, Thomas Y. (2009)

Monitoring of local and global temperature non-uniformities by means of Therma-Probe and Micro Four-Point Probe metrology

Rosseel, Erik; Petersen, Dirch; Osterberg, Frederik; Hansen, Ole; Bogdanowicz, Janusz; Clarysse, Trudo; Vandervorst, Wilfried; Ortolland, Claude; Hoffmann, Thomas Y.; Chan, Philip; Salnik, Alex; Nicolaides, Lena (2009)