Browsing by author "Kocsis, Michael"

A methodology for the characterization of topography induced immersion bubble defects

Kocsis, Michael; De Bisschop, Peter; Maenhoudt, Mireille; Kim, Young-Chang; Wells, Greg; List, Scott; DiBiase, Tony (2005)

Advanced wafer surface cleaning technology

Mertens, Paul; Vos, Rita; Vereecke, Guy; Arnauts, Sophia; Bearda, Twan; De Waele, Rita; Eitoku, Atsuro; Fyen, Wim; Geckiere, J.; Hellin, David; Holsteyns, Frank; Kesters, Els; Claes, Martine; Kenis, Karine; Kraus, Harald; Malhouitre, Stephane; Lee, Kuntack; Kocsis, Michael; Onsia, Bart; Garaud, Sylvain; Rip, Jens; Snow, Jim; Teerlinck, I.; Van Hoeymissen, Jan; Barbagini, Francesca; Xu, Kaidong; Paraschiv, Vasile; De Gendt, Stefan; Mannaert, Geert; Heyns, Marc (2004)

Characterizing and modeling electrical response to light for metal based EUV photoresists

Vaglio Pret, Alessandro; Kocsis, Michael; De Simone, Danilo; Vandenberghe, Geert; Stowers, Jason; Giglia, Angelo; De Schepper, Peter; Mani, Antonio; Biafore, John J. (2016)

Compact 2D OPC modeling of a metal oxide EUV resist for a 7nm node BEOL layer

De Simone, Danilo; Lyons, Adam; Rio, David; Lee, Sook; Delorme, Maxence; Fumar-Pici, Anita; Kocsis, Michael; De Schepper, Peter; Greer, Michael; Wallow, THomas; Stowers, Jason K; Gillijns, Werner; Bekaert, Joost (2017)

Demonstration of an N7 integrated fab process for metal oxide EUV photoresist

De Simone, Danilo; Mao, Ming; Kocsis, Michael; De Schepper, Peter; Lazzarino, Frederic; Vandenberghe, Geert; Yamashita, Fumiko; Stowers, Jason; Meyers, Steven; Grenville, Andrew; Luong, Vinh; Parnell, Doni; Clark, Benjamin L. (2016)

Experimental investigation of fabrication process-, transportation-, storage, and handling-induced contamination of 157-nm reticles and vacuum-UV cleaning

Okoroanyanwu, Uzo; Stepanenko, Nickolay; Vereecke, Guy; Eliat, Astrid; Kocsis, Michael; Kang, Young-Seog; Jonckheere, Rik; Conard, Thierry; Ronse, Kurt (2004)

Hard pellicle investigation for 157 nm lithography: impact on overlay

Bruls, R.; Uitterdijk, T.; Cicilia, O.; De Bisschop, Peter; Kocsis, Michael; Grenville, A.; Van Peski, C.; Engelstad, R.; Chang, J.; Cotte, E.; Okada, K.; Ohta, K.; Mishiro, H.; Kikugawa, S. (2004)

Initial assessment of the impact of a hard pellicle on imaging using a 193 nm step-and-scan system

De Bisschop, Peter; Kocsis, Michael; Bruls, R.; Van Peski, C.; Grenville, A. (2004)

Initial assessment of the impact of the use of a hard pellicle on imaging

De Bisschop, Peter; Bruls, Richard; Cicilia, Orlando; Uitterdijk, Tammo; Grenville, Andrew; Kocsis, Michael; Van Peski, Chris (2003)

Initial assessment of the lithographic impact of the use of a hard pellicle on wafer distortion

Kocsis, Michael; De Bisschop, Peter; Bruls, R.; Grenville, A.; Van Peski, C. (2004)

Initial assessment of the lithographic impact of the use of hard pellicles : an overview

De Bisschop, Peter; Kocsis, Michael; Bruls, R.; Grenville, A.; Van Peski, C. (2004)

Innovative metrology for wafer edge defectivity in immersion lithography

Pollentier, Ivan; Iwamoto, Fumio; Kocsis, Michael; Somanchi, Anoop; Burkeen, Frank; Vedula, Srinivas (2007)

Integrated fab process for metal oxide EUV photoresist

Grenville, Andrew; Anderson, Jeremy T.; Clark, Benjamin L.; De Schepper, Peter; Edson, Joseph; Greer, Michael; Kai, Jiang; Kocsis, Michael; Meyers, Stephen T.; Stowers, Jason K.; Telecky, Alan J.; De Simone, Danilo; Vandenberghe, Geert (2015)

Measurement and evaluation of water uptake by resists, top coats and stacks and correlation with watermark defects

Foubert, Philippe; Kocsis, Michael; Gronheid, Roel; Kishimura, Shinji; Soyano, Akimasa; Nafus, Kathleen; Stepanenko, Nickolay; De Backer, Johan; Vandenbroeck, Nadia; Ercken, Monique (2007)

Metal oxide EUV photoresist performance for N7 relevant patterns and processes

Stowers, Jason; Anderson, Jeremy; Cardineau, Brian; Clark, Benjamin; De Schepper, Peter; Edson, Joseph; Greer, Michael; Jiang, Kai; Kocsis, Michael; Meyers, Stephen; Telecky, Alan; Grenville, Andrew; De Simone, Danilo; Gillijns, Werner; Vandenberghe, Geert (2016)