Browsing by author "Teerlinck, Ivo"

A Ge matrix removal method for metallic contamination analysis on Ge wafers using TXRF

Hellin, David; Geens, Veerle; Teerlinck, Ivo; Rip, Jens; Theuwis, Antoon; De Gendt, Stefan; Vinckier, Chris (2004)

A study of the influence of typical wet chemical treatments on the germanium wafer surface

Onsia, Bart; Conard, Thierry; De Gendt, Stefan; Heyns, Marc; Hoflijk, Ilse; Mertens, Paul; Meuris, Peter; Raskin, G.; Sioncke, Sonja; Teerlinck, Ivo; Theuwis, A.; Van Steenbergen, Jan; Vinckier, Chris (2005)

Advanced cleaning and ultra-thin oxide technology

Heyns, Marc; Cornelissen, Ingrid; De Gendt, Stefan; Degraeve, Robin; Knotter, D. M.; Mertens, Paul; Mertens, S.; Meuris, Marc; Nigam, Tanya; Rotondaro, Antonio; Schaekers, Marc; Teerlinck, Ivo; Vos, Rita; Wolke, K. (1998)

Advanced cleaning for the growth of ultrathin gate oxide

Mertens, Paul; Bearda, Twan; Houssa, Michel; Loewenstein, Lee; Cornelissen, Ingrid; De Gendt, Stefan; Kenis, Karine; Teerlinck, Ivo; Vos, Rita; Meuris, Marc; Heyns, Marc (1999)

Advanced cleaning strategies for ultra-clean silicon surfaces

Heyns, Marc; Bearda, Twan; Cornelissen, Ingrid; De Gendt, Stefan; Loewenstein, Lee; Mertens, Paul; Mertens, Sofie; Meuris, Marc; Schaekers, Marc; Teerlinck, Ivo; Vos, Rita; Wolke, K. (1999)

Advances in understanding wet cleaning technology and the effect of metal contamination

Heyns, Marc; Bearda, Twan; Cornelissen, Ingrid; De Gendt, Stefan; Loewenstein, Lee; Mertens, Paul; Mertens, S.; Meuris, Marc; Schaekers, Marc; Teerlinck, Ivo; Vos, Rita; Wolke, K. (1999)

ALD High-k growth on Ge substrates

Delabie, Annelies; Brijs, Bert; Caymax, Matty; Chiarella, Thomas; Conard, Thierry; Puurunen, Riikka; Richard, Olivier; Van Steenbergen, Jan; Teerlinck, Ivo; Zhao, Chao; Heyns, Marc; Meuris, Marc (2003)

Cleaning, rinsing and drying aspects in post-Cu-CMP clean

Fyen, Wim; Vos, Rita; Teerlinck, Ivo; Vrancken, Evi; Grillaert, Joost; Meuris, Marc; Heyns, Marc (1999)

Cleaning, rinsing and drying effects in post-Cu CMP clean

Fyen, Wim; Vos, Rita; Teerlinck, Ivo; Vrancken, Evi; Grillaert, Joost; Meuris, Marc; Mertens, Paul; Heyns, Marc (2000)

Clustered single wafer wet cleaning

Mertens, Paul; Holsteyns, Frank; Vos, Rita; Vereecke, Guy; Fyen, Wim; Lauerhaas, Jeff; Xu, Kaidong; Bearda, Twan; Teerlinck, Ivo; Arnauts, Sophia; Kenis, Karine; Schmidt, Michael; Heyns, Marc (2002)

Cost-effective cleaning and high-quality thin gate oxides

Heyns, Marc; Bearda, Twan; Cornelissen, Ingrid; De Gendt, Stefan; Degraeve, Robin; Groeseneken, Guido; Kenens, Conny; Knotter, D. M.; Loewenstein, Lee; Mertens, Paul; Mertens, S.; Meuris, Marc; Nigam, Tanya; Schaekers, Marc; Teerlinck, Ivo; Vandervorst, Wilfried; Vos, Rita; Wolke, K. (1999)

Cost-effective cleaning for advanced Si-processing

Heyns, Marc; Bearda, Twan; Cornelissen, Ingrid; De Gendt, Stefan; Knotter, D. M.; Loewenstein, Lee; Lux, Marcel; Mertens, Paul; Mertens, S.; Meuris, Marc; Schaekers, Marc; Snee, Peter; Teerlinck, Ivo; Vos, Rita (1998)

Critical issues in post Cu CMP cleaning

Fyen, Wim; Vos, Rita; Teerlinck, Ivo; Lagrange, Sébastien; Lauerhaas, Jeff; Meuris, Marc; Mertens, Paul; Heyns, Marc (2000)

Cu deposition on Si surfaces from HF solutions in VLSI microfabrication

Teerlinck, Ivo; Mertens, Paul; Vos, Rita; Meuris, Marc; Heyns, Marc (1996)

Deposition of HfO2 on germanium and the impact of surface pretreatments

Van Elshocht, Sven; Brijs, Bert; Caymax, Matty; Conard, Thierry; Chiarella, Thomas; De Gendt, Stefan; De Jaeger, Brice; Kubicek, Stefan; Meuris, Marc; Onsia, Bart; Richard, Olivier; Teerlinck, Ivo; Van Steenbergen, Jan; Zhao, Chao; Heyns, Marc (2004)

Developments in cleaning technology for critical layers

Heyns, Marc; Arnauts, Sophia; Bearda, Twan; Claes, M.; Cornelissen, Ingrid; De Gendt, Stefan; Doumen, Geert; Fyen, Wim; Loewenstein, Lee; Lux, Marcel; Mertens, Paul; Mertens, S.; Meuris, Marc; Onsia, Bart; Röhr, Erika; Schaekers, Marc; Teerlinck, Ivo; Van Doorne, Patrick; Van Hoeymissen, Jan; Vereecke, Guy; Vos, Rita; Wolke, K. (2000)