Browsing by author "Vanhaelemeersch, Serge"
Now showing items 101-120 of 121
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Restoration of surface and bulk properties of ash plasma-treated porous low-k dielectrics
Le, Quoc Toan; Struyf, Herbert; Baklanov, Mikhaïl; Boullart, Werner; Kesters, Els; Van Puymbroeck, Jan; Vanhaelemeersch, Serge (2005) -
Scaling of the Cu(Al) seed layer thickness and its impact on the specific resistivity of sub-100 nm lines
Carbonell, Laure; Volders, Henny; Haider, A.; Heylen, Nancy; Richard, Olivier; Palmans, Roger; Travaly, Youssef; Tokei, Zsolt; Boelen, Pieter; Rosenfeld, A.; Mandrekar, T.; Hernandez, Jose Luis; Vanhaelemeersch, Serge (2007) -
Silicon surface cleaning after oxide spacer dry etching
Shamiryan, Denis; Baklanov, Mikhaïl; Vanhaelemeersch, Serge (2001) -
SrBi2Ta2O2 Patterning for feram applications: a dry -wet approach
Paraschiv, Vasile; Boullart, Werner; Vanhaelemeersch, Serge; Wouters, Dirk; Vecchio, Emma; Fragala, Maria-Elena; Van Autryve, Luc; Monchoix, Hervé; Casella, Patrizia; Zambrano, Raffaele (2003) -
Studies on XLK film characterization and integration in copper damascene processes
Iacopi, Francesca; Alves Donaton, Ricardo; Coenegrachts, Bart; Komiya, Takayuki; Struyf, Herbert; Lepage, Muriel; Van Aelst, Joke; Boullart, Werner; De Roest, David; Vos, Ingrid; Baklanov, Mikhaïl; Vereecke, Guy; Van Hove, Marleen; Stucchi, Michele; Tokei, Zsolt; Meynen, Herman; Bremmer, J. N.; Vanhaelemeersch, Serge; Maex, Karen (2001) -
Surface characterization of a low dielectric constant polymer-SiLK polymer, and investigation of its interface with Cu
Rajagopal, A.; Grégoire, C.; Lemaire, J. J.; Pireaux, J. J.; Baklanov, Mikhaïl; Vanhaelemeersch, Serge; Maex, Karen; Waeterloos, Joost (1999) -
Surface modification of porous low-k dielectrics
Le, Quoc Toan; Struyf, Herbert; Brongersma, Sywert; Conard, Thierry; Boullart, Werner; Vanhaelemeersch, Serge; Maex, Karen (2003) -
Surface processes occuring on TiSi2 and CoSi2 in fluorine-based plasmas: afterglow of NF3 plasma
Baklanov, Mikhaïl; Vanhaelemeersch, Serge; Storm, Wolfgang; Vandervorst, Wilfried; Maex, Karen (1998) -
Surface processes occurring on TiSi2 and CoSi2 in fluorine-based plasmas. Reactive ion etching in CF4/CHF3 plasmas
Baklanov, Mikhaïl; Vanhaelemeersch, Serge; Storm, Wolfgang; Kim, Young-Chang; Vandervorst, Wilfried; Maex, Karen (1997) -
The effect of plasma damage and different annealing ambients on the generation of latent interface states
Creusen, Martin; Lee, Hean-Cheal; Vanhaelemeersch, Serge; Groeseneken, Guido (1998) -
The etchback approach: enlarged process window for MuGFET gate etching
Degroote, Bart; Collaert, Nadine; Rooyackers, Rita; Baklanov, Mikhaïl; Boullart, Werner; Kunnen, Eddy; Jurczak, Gosia; Vanhaelemeersch, Serge (2005) -
The etching behavior of tungsten (w) with respect to the orientation of the grain boudnary and masking layers
Vanhaelemeersch, Serge; Van den hove, Luc; Lee, Hean-Cheal (1997) -
The etching behavior of tungsten (W) with respect to the orientation of the grain boundary and masking layers
Lee, Hean-Cheal; Vanhaelemeersch, Serge (1998) -
The formation and removal of residue formed during TiN fluorocarbon plasma etching
Kim, Young-Chang; Conard, Thierry; Vanhaeren, Danielle; Baklanov, Mikhaïl; Vanhaelemeersch, Serge; Vandervorst, Wilfried; Maex, Karen (1998) -
The integration of a low-k material with high organic content in a non-etchback process
Waeterloos, Joost; Meynen, Herman; Coenegrachts, Bart; Vanhaelemeersch, Serge; Grillaert, Joost; Van den hove, Luc (1996) -
The optimization of the cleaning process to remove residual bonds of SiC and Si-F after fluorocarbon plasma etch on the silicon surface
Kim, Young-Chang; Baklanov, Mikhaïl; Conard, Thierry; Vanhaelemeersch, Serge; Vandervorst, Wilfried (1998) -
The optimization of the cleaning process to remove residual bonds of SiC and Si-F after fluorocarbon plasma etch on the silicon surface
Kim, Young-Chang; Baklanov, Mikhaïl; Conard, Thierry; Vanhaelemeersch, Serge; Vandervorst, Wilfried (1999) -
The role of additives and deposition parameters in Cu plating of high aspect ratio vias
Ko, Ted; Radisic, Alex; Armini, Silvia; Vereecken, Philippe; Drijbooms, Chris; Bender, Hugo; Sun, S.P.; Wann, C.; Yu, C.H.; Leunissen, Peter; Ruythooren, Wouter; Vanhaelemeersch, Serge (2009-10) -
ToF-SIMS and XPS characterization of plasma etch residues on cobalt silicide surfaces
Storm, Wolfgang; Vandervorst, Wilfried; Vanhaelemeersch, Serge; Baklanov, Mikhaïl; Maex, Karen; Poleunis, C.; Bertrand, P. (1997) -
Unusual modification of CuCl or CuBr films by He plasma exposure resulting in nanowire formation
Dictus, Dries; Baklanov, Mikhaïl; Pikulev, Vitaly; De Gendt, Stefan; Vinckier, Chris; Boullart, Werner; Vanhaelemeersch, Serge (2010)