Browsing by imec author "bc3cb474dd21d65228e64d93fa04290a9e1a3b37"
Now showing items 1-18 of 18
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Actinic inspection of the EUV optical parameters of lithographic materials with lab-based radiometry and reflectometry
Dorney, Kevin; Kissoon, Nicola; Holzmeier, Fabian; Witting Larsen, Esben; Singh, Dhirendra; Arvind, Shikhar; Santra, Sayantani; Fallica, Roberto; Makhotkin, Igor; Philipsen, Vicky; De Gendt, Stefan; Fleischmann, Claudia; van der Heide, Paul; Petersen, John (2023-04-28) -
Adhesion and collapse of extreme ultraviolet photoresists and the role of underlayers
Fallica, Roberto; Chen, Steven; De Simone, Danilo; Suh, Hyo Seon (2022) -
Effect of molecular weight on the EUV-printability of main chain scission type polymers
Rathore, Ashish; Pollentier, Ivan; Singh, Harpreet; Fallica, Roberto; De Simone, Danilo; De Gendt, Stefan (2020) -
EUV based multi-patterning schemes for advanced DRAM nodes
Das, Sayantan; Sah, Kaushik; Fallica, Roberto; Chen, Zhijin; Halder, Sandip; Cross, Andrew; De Simone, Danilo; Treska, Fergo; Leray, Philippe; Kim, Ryan Ryoung han; Maguire, Ethan; Wei, Chih-, I; Fenger, Germain; Lafferty, Neal; Lee, Jeonghoon (2022) -
Evolution of Secondary Electrons Emission During EUV Exposure in Photoresists
Fallica, Roberto; Nannarone, Stefano; Mahne, Nicola; Malvezzi, Andrea Marco; Berti, Andrea; De Simone, Danilo (2021) -
Extending EUV lithography for DRAM applications
Rispens, Gijsbert; Van Lare, C.; Oorschot, D.; Hoefnagels, R.; Liu, S.; Van Mierlo, W.; Zuurbier, N.; Dardani, Z.; Wang, Z.; Maslow, M.; Finders, J.; Fallica, Roberto; Frommhold, Andreas; Hendrickx, Eric; Niroomand, A.; Light, S. (2020) -
Functional underlayers for dose reduction and collapse mitigation in EUV lithography: a factorial analysis
Fallica, Roberto; Huang, Weizhong; Suh, Hyo Seon; De Simone, Danilo; Guerrero, Douglas J.; Kato, Kodai (2023) -
Limitation of EUV single exposure on DRAM applications: learning and challenges
Liu, Shih-hsiang; Dardani, Zoi; Zuurbier, Nadia; Dhagat, Parul; Wang, Erik; Fallica, Roberto (2022-06-15) -
Mean free path of electrons in EUV photoresist in the energy range 20 to 450 eV
Fallica, Roberto; Mahne, Nicola; Conard, Thierry; Vanleenhove, Anja; Nannarone, Stefano (2023) -
Mean Free Path of Electrons in Organic Photoresists for Extreme Ultraviolet Lithography in the Kinetic Energy Range 20-450 eV
Fallica, Roberto; Mahne, Nicola; Conard, Thierry; Vanleenhove, Anja; de Simone, Danilo; Nannarone, Stefano (2023) -
Scaled-down deposited underlayers for EUV lithography
Gupta, Mihir; Afonso, Joao Antunes; Bezard, Philippe; Vallat, Remi; Fallica, Roberto; Suh, Hyo Seon; Halder, Sandip; De Simone, Danilo; Liu, Zecheng; Ran, Fanyong; Fukuda, Hideaki; Sun, Yiting; De Roest, David; Piumi, Daniele (2023) -
Scaling and readiness of underlayers for high-NA EUV lithography
Fallica, Roberto; De Simone, Danilo; Chen, Steven; Safdar, Muhammad; Suh, Hyo Seon (2022) -
Scaling and readiness of underlayers for high-numerical aperture extreme ultraviolet lithography
Fallica, Roberto; De Simone, Danilo; Chen, Steven; Safdar, Muhammad; Suh, Hyo Seon (2022) -
Secondary electron distribution and photosensitivity performance of resists for extreme ultraviolet (EUV)
Rezvani, Javid; Tchoudinov, Georghii; Nannarone, Stefano; Fallica, Roberto (2022-03-17) -
Single Mask Solution to Pattern BLP and SNLP using 0.33NA EUV for Next Generation DRAM Manufacturing
Sah, Kaushik; Cross, Andrew; Das, Sayantan; Fallica, Roberto; Lee, Jeonghoon; Kim, Ryan Ryoung han; Halder, Sandip; Maguire, Ethan; Armeanu, Ana-Maria; Sears, Monica; Lafferty, Neal; Liubich, Vlad; Wei, Chih-, I; Fenger, Germain (2022) -
Staggered pillar patterning using 0.33NA EUV lithography
De Simone, Danilo; Blanc, Romuald; Van de Kerkhove, Jeroen; Tamaddon, Amir-Hossein; Fallica, Roberto; Van Look, Lieve; Rassoul, Nouredine; Lazzarino, Frederic; Vandenbroeck, Nadia; Vanelderen, Pieter; Lorusso, Gian; Van Roey, Frieda; Charley, Anne-Laure; Vandenberghe, Geert; Ronse, Kurt; Lee, Kilyoung; Lee, Junghyung; Park, Sarohan; Lim, Chang-Moon; Park, Chan-Ha (2019) -
The hidden energy tail of low energy electrons in EUV lithography
Fallica, Roberto; Rezvani, Seyed Javid; Nannarone, Stefano; Borisov, Sergei; De Simone, Danilo; Babin, Sergey; Lorusso, Gian; Vandenberghe, Geert (2019) -
The interface study of photoresist/underlayer using hybrid x-ray reflectivity and x-ray standing wave approach
Tiwari, Atul; Fallica, Roberto; Ackermann, Marcelo D.; Makhotkin, Igor A. (2024)