Browsing by author "Piumi, Daniele"
Now showing items 1-20 of 23
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A million wafer, virtual fabrication approach to determine process capability requirements for an industry-standard 5nm BEOL two-level metal flow
Clark, William; Juncker, Aurelie; Paladugu, E.; Fried, David; Wilson, Chris; Pourtois, Geoffrey; Gallagher, Emily; de Jamblinne de Meux, Albert; Piumi, Daniele; Boemmels, Juergen; Tokei, Zsolt; Mocuta, Dan (2016) -
A wafer-scaled III-V vertical FET fabrication by means of plasma etching
Milenin, Alexey; Veloso, Anabela; Collaert, Nadine; Piumi, Daniele (2018) -
Challenges for line width / line edge roughness (LWR/lER) improvement in Directed Self-Assembly (DSA) advanced patterning
Chan, BT; Pathangi Sriraman, Hari; Singh, Arjun; El Otell, Ziad; Gronheid, Roel; de Marneffe, Jean-Francois; Piumi, Daniele (2015) -
Characterization of optical end-point detection for via reveal processing
Rassoul, Nouredine; Jourdain, Anne; Tutunjyan, Nina; De Vos, Joeri; Sardo, Stefano; Piumi, Daniele; Miller, Andy; Beyne, Eric; Walsby, Edward; Ashraf, Huma; Thomas, Dave (2018) -
Direct metal etch evaluation for advanced interconnect
Paolillo, Sara; Lazzarino, Frederic; Rassoul, Nouredine; Wan, Danny; Piumi, Daniele; Tokei, Zsolt (2017) -
Direct metal etch for advanced interconnect
Paolillo, Sara; Wan, Danny; Lazzarino, Frederic; Rassoul, Nouredine; Piumi, Daniele; Tokei, Zsolt (2018) -
Direct metal nanowire patterning using ion beam etch
Kundu, Shreya; Dutta, Shibesh; Gupta, Anshul; Jamieson, Geraldine; Piumi, Daniele; Boemmels, Juergen; Wilson, Chris; Tokei, Zsolt; Adelmann, Christoph (2017) -
Etch challenges for chemo-expitaxy Directed Self-Assembly (DSA) LiNe flow in Fin patterning
Chan, BT; Sayan, Safak; Marzook, Taisir; Altamirano Sanchez, Efrain; Gronheid, Roel; de Marneffe, Jean-Francois; Piumi, Daniele (2016) -
Etch process modules development and integration in 3D SOC applications
Tutunjyan, Nina; Sardo, Stefano; De Vos, Joeri; Van Huylenbroeck, Stefaan; Jourdain, Anne; Peng, Lan; Inoue, Fumihiro; Rassoul, Nouredine; Beyer, Gerald; Beyne, Eric; Miller, Andy; Piumi, Daniele; Walsby, Edward; Ansell, Oliver; Ashraf, Huma; Thomas, Dave (2017) -
Etch process modules development and integration in 3D-SOC applications
Tutunjyan, Nina; Sardo, Stefano; De Vos, Joeri; Van Huylenbroeck, Stefaan; Jourdain, Anne; Peng, Lan; Inoue, Fumihiro; Rassoul, Nouredine; Beyer, Gerald; Beyne, Eric; Miller, Andy; Piumi, Daniele (2018) -
Exploration of a low-temperature PEALD technology to trim and smooth 193i photoresist
Lazzarino, Frederic; Paolillo, Sara; Antony, Peter; De Roest, David; Seong, TaeGeun; Wu, Yizhi; Decoster, Stefan; Rutigliani, Vito; Lorusso, Gian; Constantoudis, Vassilios; Van Elshocht, Sven; Piumi, Daniele; Barla, Kathy (2017) -
III-V fin patterning in SADP scheme
Milenin, Alexey; Camerotto, Elisabeth; Sun, Noel; Boccardi, Guillaume; Vertommen, Johan; Piumi, Daniele (2016) -
Impact of sequential infiltration synthesis (SIS) on roughness and stochastic nano-failures for EUVL patterning
Vanelderen, Pieter; Blanco, Victor; Mao, Ming; Tomczak, Yoann; De Roest, David; Kissoon, Nicola; Rincon Delgadillo, Paulina; Rispens, Gijsbert; Schiffelers, Guido; Pathak, Abhinav; Lazzarino, Frederic; De Simone, Danilo; De Poortere, Etienne; Mc Manus, Moyra; Piumi, Daniele; Hendrickx, Eric; Vandenberghe, Geert (2019) -
Magnetic tunnel junctions etch and encapsulation process optimization for high-density STT-MRAM applications
Souriau, Laurent; Radisic, Dunja; Kundu, Shreya; Paraschiv, Vasile; Yamashita, Fumiko; Fujimoto, Kiwamu; Tahara, Shigeru; Maeda, K.; Kim, Woojin; Rao, Siddharth; Donadio, Gabriele Luca; Crotti, Davide; Tsvetanova, Diana; Swerts, Johan; Mertens, Sofie; Lin, Tsann; Couet, Sebastien; Piumi, Daniele; Kar, Gouri Sankar; Furnemont, Arnaud (2016) -
Pattern transfer challenges of the Sequential Infiltration Synthesis (SIS) of of Directed Self-Assembly (DSA) for line/space applications
Chan, BT; Singh, Arjun; Luong, Vinh; Parnell, Doni; Yamashita, Fumiko; Gronheid, Roel; de Marneffe, Jean-Francois; Piumi, Daniele (2016) -
Patterning challenges for ultimate CMOS and beyond CMOS nano-fabrication
de Marneffe, Jean-Francois; Altamirano Sanchez, Efrain; Lazzarino, Frederic; Piumi, Daniele (2017) -
Patterning challenges in advanced device architectures: FinFETs to nanowire
Horiguchi, Naoto; Milenin, Alexey; Tao, Zheng; Hody, Hubert; Altamirano Sanchez, Efrain; Veloso, Anabela; Witters, Liesbeth; Waldron, Niamh; Ragnarsson, Lars-Ake; Kim, Min-Soo; Kikuchi, Yoshiaki; Mertens, Hans; Raghavan, Praveen; Piumi, Daniele; Collaert, Nadine; Barla, Kathy; Thean, Aaron (2016) -
Practical steps towards wafer-scaled III-V vertical FETs fabrication
Milenin, Alexey; Veloso, Anabela; Collaert, Nadine; Piumi, Daniele (2017) -
Process window study of SAQP gratings used to pattern a dual damascene structure at 7nm technology node
Decoster, Stefan; Paolillo, Sara; Kesters, Els; Briggs, Basoene; van der Veen, Marleen; Lazzarino, Frederic; Piumi, Daniele; Yamashita, Fumiko; Demand, Marc; Kumar, Kaushik (2016) -
RIE dynamics for extreme wafer thinning applications
Rassoul, Nouredine; Jourdain, Anne; Tutunjyan, Nina; De Vos, Joeri; Sardo, Stefano; Inoue, Fumihiro; Piumi, Daniele; Miller, Andy; Beyne, Eric; Walsby, Edward; Jash Patel, Patel; Oliver, Ansell; Huma, Ashraf; Janet, Hopkins; Dave, Thomas (2017)