Browsing by author "Van Driessche, Veerle"

100-nm generation contact patterning by low temperature 193-nm resist reflow process

Van Driessche, Veerle; Lucas, Kevin; Van Roey, Frieda; Grozev, Grozdan; Tzviatkov, Plamen (2002)

Characterization and optimization of positive tone DUV resists on TiN substrates

Zandbergen, Peter; Gehoel-van Ansem, W.; Vandenberghe, Geert; Van Driessche, Veerle; Vloeberghs, H. (1997)

DUV Lithography for 0.35 µm CMOS Processing

Van Driessche, Veerle; Goethals, Mieke; Op de Beeck, Maaike; Ronse, Kurt; Van den hove, Luc (1994)

DUV lithography for 0.35 μm CMOS processing

Van Driessche, Veerle; Goethals, Mieke; Op de Beeck, Maaike; Ronse, Kurt; Van den hove, Luc (1995)

Electron beam / DUV intra-level mix-and-match lithography for random logic 0.25 μm CMOS

Jonckheere, Rik; Tritchkov, Alexander; Van Driessche, Veerle; Van den hove, Luc (1995)

Feasibility of 250 nm gate patterning using i-line with OPC

Van Driessche, Veerle; Finders, Jo; Tritchkov, Alexander; Ronse, Kurt; Van den hove, Luc; Tzviatkov, Plamen (1998)

III-V/III-N technologies for next generation high-capacity wireless communication

Collaert, Nadine; Alian, AliReza; Banerjee, Aritra; Boccardi, Guillaume; Cardinael, Pieter; Chauhan, Vikas; Desset, Claude; ElKashlan, Rana Y.; Khaled, Ahmad; Ingels, Mark; Kunert, Bernardette; Mols, Yves; O'Sullivan, Barry; Peralagu, Uthayasankaran; Pinho, Nelson; Rodriguez, Raul; Sibaja-Hernandez, Arturo; Sinha, Siddhartha; Sun, Xiao; Vais, Abhitosh; Vermeersch, Bjorn; Yadav, Sachin; Yan, Dongyang; Yu, Hao; Zhang, Yang; Zhao, Ming; Van Driessche, Veerle; Gramegna, Giuseppe; Wambacq, Piet; Parvais, Bertrand; Peeters, Michael (2022)

Impact of SEM accuracy on the CD control during gate patterning process of 0.25μm and sub-0.25μm generations

Finders, Jo; Ronse, Kurt; Van den hove, Luc; Van Driessche, Veerle; Tzviatkov, Plamen (1997)

Introducing 193 nm lithography

Pollers, Ingrid; Jaenen, Patrick; Van Roey, Frieda; Goethals, Mieke; Ronse, Kurt; Davies, G.; Heskamp, B.; Bakker, H.; McCoo, E.; Mulkens, J.; Stoeldraijer, J.; Sytsma, J.; Van der Vleuten, B.; Vleeming, Bert; Tzviatkov, Plamen; Van Driessche, Veerle; Slater, S. (1998)

Lithographic performance of 193 nm single and bi-layer materials

Goethals, Mieke; Pollers, Ingrid; Van Roey, Frieda; Sugihara, Takashi; Ronse, Kurt; Van Driessche, Veerle; Tzviatkov, Plamen; Medina, A.; Gabor, A.; Blakeney, A.; Steinhausler, T.; Biafore, J.; Slater, S.; Nalamasu, O.; Houlihan, F.; Kometani, J.; Timko, A.; Cirelli, R. (1998)