Browsing by author "Finders, Jo"

22nm node imaging and beyond: a comparison of EUV and ArFi double patterning

van Setten, Eelco; Mouraille, O.; Wittebrood, F.; Dusa, Mircea; van Ingen-Schenau, Koen; Finders, Jo; Feenstra, Kees; Bekaert, Joost; Laenens, Bart; Philipsen, Vicky; Ercken, Monique; Hendrickx, Eric; Vandenberghe, Geert (2010)

22nm node imaging and beyond: When will EUV take over?

van Setten, Eelco; Mouraille, Orion; Wittebrood, Friso; Dusa, Mircea; van Ingen-Schenau, Koen; Finders, Jo; Feenstra, Kees; Bekaert, Joost; Laenens, Bart; Philipsen, Vicky; Ercken, Monique; Hendrickx, Eric; Vandenberghe, Geert (2010)

Applying dipole illumination to characterize the imaging performance of 193nm photoresists for the 100nm node

Vleeming, Bert; Heskamp, B.; Finders, Jo; Jaenen, Patrick (2000)

Arf solutions for low-k1 back-end imaging

Wiaux, Vincent; Montgomery, Patrick; Vandenberghe, Geert; Monnoyer, Philippe; Ronse, Kurt; Conley,; Litt,; Lucas,; Finders, Jo; Socha,; Van Den Broeke, (2003)

CD control comparison of step & repeat versus step & scan DUV lithography for sub-0.25 μm gate printing

Ronse, Kurt; Maenhoudt, Mireille; Marschner, Thomas; Van den hove, Luc; Streefkerk, B.; Finders, Jo; van Schoot, J.; Luehrmann, P.; Minvielle, A. (1998)

Critical assessment of error budget components in double patterning immersion lithography

Hepp, Birgitt; Finders, Jo; Dusa, Mircea; Vleeming, Bert; Megens, henry; Maenhoudt, Mireille; Cheng, Shaunee; Vandeweyer, Tom (2008)

Delay Times in Lattice Matched InGaAs/InP HEMT's with Gatelengths between 80 and 250 nm

Finders, Jo; Baeyens, Yves; Schreurs, Dominique; Van Hove, Marleen; De Raedt, Walter; Nauwelaers, Bart; Van Rossum, Marc (1995)

Dense lines created by spacer DPT scheme: process control by local dose adjustment using advanced scanner control

Finders, Jo; Dusa, Mircea; Vleeming, Bert; Fliervoet, Timon; Hepp, Birgitt; Megens, henry; Groenendijk, Remco; Quaedackers, John; Mos, Evert; Leewis, Christian; Bornebroek, Frank; Maenhoudt, Mireille; Leblans, Marc; Vandeweyer, Tom; Murdoch, Gayle; Altamirano Sanchez, Efrain (2009)

Design split and double exposure for contact hole printing at 0.40 k1 and beyond

Köhler, Carsten; van Praagh, Judith; Finders, Jo; Wiaux, Vincent; Vandenberghe, Geert (2004)

Double dipole lithography for 65-nm node and beyond: a technology readiness review

Hsu, Stephen; Eurlings, Mark; Hendrickx, Eric; Van Den Broeke, Douglas J.; Chiou, Tsann-Bim; Fung Chen, J.; Laidig, Thomas L.; Shi, Xuelong; Finders, Jo (2004-08)

Double patterning for 32-nm and below: an update

Finders, Jo; Dusa, Mircea; Vleeming, Bert; Hepp, Birgitt; Megens, Henry; Maenhoudt, Mireille; Cheng, Shaunee; Vandeweyer, Tom (2008)

Double patterning lithography for 32 nm: critical dimensions uniformity and overlay control considerations

Finders, Jo; Dusa, Mircea; Vleeming, Bert; Hepp, Birgitt; Maenhoudt, Mireille; Cheng, Shaunee; Vandeweyer, Tom (2009)

Edge placement error analysis for N7 logic patterning options

van Setten, Eelco; Psara, Eleni; Wittebrood, Friso; Oorschot, Dorothe; van Dijk, Joep; Schiffelers, Guido; Finders, Jo; Dusa, Mircea; Philipsen, Vicky; Hendrickx, Eric (2015)

Evaluation of local CD and placement distribution on EUV mask and its impact on wafer

Vaenkatesan, Vidya; Van Adrichem, Paul; Kooiman, Marleen; Kubis, Michael; Van Look, Lieve; Frommhold, Andreas; Gallagher, Emily; Nam, DS; Mulkens, Jan; Finders, Jo; Rispens, Gijsbert (2019)

Experimental verification of phase induced mask 3D effects in EUV imaging

Wittebrood, Friso; de Winter, Laurens; Last, Thorsten; Van Look, Lieve; Philipsen, Vicky; Finders, Jo; Schiffelers, Guido; Hendrickx, Eric (2015)

Feasibility of 250 nm gate patterning using i-line with OPC

Van Driessche, Veerle; Finders, Jo; Tritchkov, Alexander; Ronse, Kurt; Van den hove, Luc; Tzviatkov, Plamen (1998)

Freeform illumination sources: an experimental study of source-mask optimization for 22nm SRAM cells

Bekaert, Joost; Laenens, Bart; Verhaegen, Staf; Van Look, Lieve; Trivkovic, Darko; Lazzarino, Frederic; Vandenberghe, Geert; Van Adrichem, Paul; Socha, Robert; Baron, S.; Tsai, M.-C.; Ning, K.; Hsu, S.; Liu, H.Y.; Mulder, M.; Bouma, A.; van der Heijden, E.; Mouraille, O.; Schreel, K.; Finders, Jo; Dusa, Mircea; Zimmerman, J.; Graeupner, Paul; Neumann, J.T.; Hennerkes, C. (2010)