Browsing by author "Finders, Jo"
Now showing items 21-40 of 42
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Impact of SEM accuracy on the CD control during gate patterning process of 0.25μm and sub-0.25μm generations
Finders, Jo; Ronse, Kurt; Van den hove, Luc; Van Driessche, Veerle; Tzviatkov, Plamen (1997) -
InP HEMT technology for low noise MMIC applications
van der Zanden, Koen; Van Hove, Marleen; Finders, Jo; De Raedt, Walter; Van Rossum, Marc; Baeyens, Yves; Schreurs, Dominique (1996) -
InP-based HEMT technology for MMIC applications
Van Hove, Marleen; Finders, Jo; van der Zanden, Koen; De Raedt, Walter; Van Rossum, Marc; Baeyens, Yves; Schreurs, Dominique; Nauwelaers, Bart; Zeng, A.; Jackson, M. K. (1995) -
Investigation of passivation effects in InP HEMT layers
Van Hove, Marleen; Finders, Jo; van der Zanden, Koen; Geurts, J.; Van Rossum, Marc (1996) -
KrF lithography for 130nm
Finders, Jo; van Schoot, J.; Vanoppen, Peter; Dusa, M.; Socha, B.; Vandenberghe, Geert; Ronse, Kurt (2000) -
Litho and patterning challenges for memory and logic applications at the 22nm node
Finders, Jo; Dusa, Mircea; Nikolsky, Peter; Van Dommelen, Youri; Watso, Robert; Vandeweyer, Tom; Bekaert, Joost; Laenens, Bart; Van Look, Lieve (2010) -
Mask 3D effect mitigation by source optimization and assist feature placement
Van Look, Lieve; Mochi, Iacopo; Philipsen, Vicky; Gallagher, Emily; Hendrickx, Eric; McIntyre, Greg; Wittebrood, Friso; Lyakhova, Kateryna; de Winter, Laurens; Last, Thorsten; Fliervoet, Timon; Schiffelers, Guido; Finders, Jo; Van Adrichem, Paul; Lyons, Adam; Laenens, Bart; Liddle, Jack; Neumann, Jens Timo (2016) -
Material and process related limitations of In P HEMT performance
Van Hove, Marleen; Finders, Jo; van der Zanden, Koen; De Raedt, Walter; Van Rossum, Marc; Baeyens, Yves; Schreurs, Dominique; Menozzi, R. (1997) -
NA/sigma optimisation strategies for an advanced DUV stepper applied to 0.25 mm and sub-0.25 mm critical levels
Op de Beeck, Maaike; Ronse, Kurt; Ghandehari, Kouros; Jaenen, Patrick; Botermans, Harry; Finders, Jo; Lilygren, John; Baker, Daniel; Vandenberghe, Geert; De Bisschop, Peter; Maenhoudt, Mireille; Van den hove, Luc (1997) -
Optical solutions for contact hole lithography at the 90nm node and beyond
Köhler, C.; Elbattay, K.; Hansen, S.; Finders, Jo; Socha, R.; van den Broeke, D.; Wiaux, Vincent; Vandenberghe, Geert; Gräupner, P. (2002) -
Optimisation methodology towards a manufacturable 0.3 μm poly-gate process using i-line lithography
Finders, Jo; Bruggeman, B.; Ronse, Kurt; Van den hove, Luc; Tzviatkov, Plamen; Dusa, M. (1996) -
Optimizing i-line lithography for 0.3-μm poly-gate manufacturing
Finders, Jo; Tzviatkov, Plamen; Ronse, Kurt; Van den hove, Luc (1997) -
Pattern displacement induced by lens aberrations
Hendrickx, Eric; Vandenberghe, Geert; Ronse, Kurt; Colina, Alberto; van der Hoff, Alex; Dusa, Mircea; Finders, Jo (2002) -
Pitch doubling through dual-patterning lithography challenges in integration and litho budgets
Dusa, Mircea; Quaedackers, John; Larsen, Olaf F.A.; Meessen, J.; van der Heijden, Eddy; Dicker, Gerald; Wismans, Onno; de Haas, Paul; van Ingen Schenau, Koen; Finders, Jo; Vleeming, Bert; Storms, Greet; Jaenen, Patrick; Cheng, Shaunee; Maenhoudt, Mireille (2007) -
Proximity effects correction for advanced optical lithography processes
Tritchkov, Alexander; Finders, Jo; Randall, John; Ronse, Kurt; Van den hove, Luc (1998) -
Qualification of electrical linewidth measurements (ELM) as a metrology tool for 0.18μm and below
Marschner, Thomas; Pollentier, Ivan; Baerts, Christina; Boltz, Ingo; Ronse, Kurt; Van den hove, Luc; Finders, Jo; Gangala, Hareen K; Capodieci, Luigi (1998) -
SEM proximity effect for poly gate patterns
Finders, Jo; Potoms, Goedele; Ronse, Kurt; Van den hove, Luc; Van Driessche, Veerle; Tzviatkov, Plamen; Bruggeman, B.; Caligiore, A. (1997) -
Separable models for computational lithography
Liu, Hua-Yu; Zhao, Q.; Chen, J.F.; Jiang, J.; Socha, B.; Van Setten, E.; Engelen, A.; Meessen, J.; Crouse, M.M.; Feng, M.; Shao, W.; Cao, H.; Cao, Y.; Van Look, Lieve; Bekaert, Joost; Vandenberghe, Geert; Finders, Jo (2008) -
Spacer self aligned double patterning: process control
Vandeweyer, Tom; Altamirano Sanchez, Efrain; Vangoidsenhoven, Diziana; Murdoch, Gayle; Groenendijk, Remco; Hepp, Birgitt; Mos, Evert; Finders, Jo; Vleeming, Bert; Dusa, Mircea; Maenhoudt, Mireille (2009) -
Status of ArF lithography for the 130nm technology node
Ronse, Kurt; Vandenberghe, Geert; Jaenen, Patrick; Delvaux, Christie; Vangoidsenhoven, Diziana; Van Roey, Frieda; Pollers, Ingrid; Maenhoudt, Mireille; Goethals, Mieke; Pollentier, Ivan; Vleeming, Bert; van Ingen Schenau, K.; Heskamp, B.; Davies, G.; Finders, Jo; Niroomand, Ardavan (2000)